Abstract: A distance between the first circuit and the second circuit is a first distance, a distance between the first circuit and the temperature detection circuit is a second distance longer than the first distance, and a distance between the second circuit and the temperature detection circuit is a third distance longer than the first distance.

Abstract: A projection exposure apparatus that exposes a substrate with a liquid interposed between a surface of the substrate and an optical element on the substrate side of a projection optical system; includes liquid supply and discharge mechanisms, which supply the liquid via a liquid supply tube as they recover the liquid via a liquid recovery tube, and an adhesion preventing mechanism that prevents an adhesion of impurities on member forming a flow path for the liquid.

Abstract: A projection exposure apparatus that exposes a substrate with a liquid interposed between a surface of the substrate and an optical element on the substrate side of a projection optical system; includes liquid supply and discharge mechanisms, which supply the liquid via a liquid supply tube as they recover the liquid via a liquid recovery tube, and an adhesion preventing mechanism that prevents an adhesion of impurities on member forming a flow path for the liquid.

Abstract: An optical low pass filter includes: a light transmitting member (41); and a refractive index distribution generation means (42) that generates a refractive index distribution cyclically changing within the plane of the light transmitting member (41). The refractive index distribution generation means includes a piezoelectric element, for example, and generates the refractive index distribution by generating the compressional wave in the light transmitting member (41) with a high frequency voltage being applied to the piezoelectric element.

Abstract: An optical low pass filter includes: a light transmitting member (41); and a refractive index distribution generation means (42) that generates a refractive index distribution cyclically changing within the plane of the light transmitting member (41). The refractive index distribution generation means includes a piezoelectric element, for example, and generates the refractive index distribution by generating the compressional wave in the light transmitting member (41) with a high frequency voltage being applied to the piezoelectric element.

Abstract: A projection exposure apparatus that exposes a substrate with a liquid interposed between a surface of the substrate and an optical element on the substrate side of a projection optical system; includes liquid supply and discharge mechanisms, which supply the liquid via a liquid supply tube as they recover the liquid via a liquid recovery tube, and an adhesion preventing mechanism that prevents an adhesion of impurities on member forming a flow path for the liquid.

Abstract: An optical member for photolithography made of a calcium fluoride crystal exhibits an internal transmittance of 99.5%/cm or greater with respect to light having a specific wavelength of 185 nm or shorter.

Abstract: An optical member for transmitting light of a wavelength less than about 200 nm including crystalline calcium fluoride with a potassium content less than about 0.5 ppm, wherein a degradation in a transmissivity of the optical member after an irradiation for a fixed period of time with the light of the wavelength of less than about 200 nm is less than about 5% of a transmissivity of the optical member before the irradiation.

Abstract: An optical member for transmitting light of a wavelength less than about 200 nm including crystalline calcium fluoride with a potassium content less than about 0.5 ppm, wherein a degradation in a transmissivity of the optical member after an irradiation for a fixed period of time with the light of the wavelength of less than about 200 nm is less than about 5% of a transmissivity of the optical member before the irradiation.

Abstract: An optical member for transmitting light of a wavelength less than about 200 nm including crystalline calcium fluoride with a potassium content less than about 0.5 ppm, wherein a degradation in a transmissivity of the optical member after an irradiation for a fixed period of time with the light of the wavelength of less than about 200 nm is less than about 5% of a transmissivity of the optical member before the irradiation.

Abstract: An optical member is provided for use in an image-focusing optical system for guiding light having a wavelength shorter than about 300 nm. The optical member includes a calcium fluoride crystal having a sodium concentration of less than about 0.2 ppm.

Abstract: A projection exposure apparatus capable of projecting and exposing mask pattern images onto a substrate by means of a optical projection system, the apparatus includes an optical illumination system capable of illuminating a mask utilizing an excimer laser illuminating light source in a wavelength range of 230 nm or less, and an optical projection system including optical members that include a calcium fluoride crystal with a total alkaline earth metal impurity content of 1.times.10.sup.18 atom/cm.sup.3 or less, and which projects images of the mask pattern onto a substrate. The calcium fluoride crystal is manufactured by a method including the steps of adding a fluorinating agent to a powdered calcium fluoride forming a mixture, placing the mixture in a growing crucible inside a vacuum furnace, and evacuating the vacuum furnace.