Patents by Inventor Masaki Takeguchi

Masaki Takeguchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6573501
    Abstract: A holography electron microscope permitting electron holography without limitations on the magnification. An electron biprism is mounted between a system of intermediate lenses and a system of projector lenses. The objective lens and the system of intermediate lenses form a crossover at a given position between intermediate lenses and the electron biprism and, at the same time, focus a magnified image at a certain position between the electron biprism and projector lenses. Since the system of intermediate lenses is made up of three or more stages of lenses, it forms a crossover at a given position and focuses a magnified image at a certain position.
    Type: Grant
    Filed: February 20, 2001
    Date of Patent: June 3, 2003
    Assignee: JEOL Ltd.
    Inventors: Toshikatsu Kaneyama, Hiromi Nunome, Masaki Takeguchi
  • Patent number: 6344082
    Abstract: Si nanocrystals are formed by irradiating SiO2 substrates with electron beams at a temperature of 400° C. or higher, thereby causing electron-stimulated decomposition reaction. As a result of the said reaction, single crystalline Si nanostructures are fabricated on the SiO2 substrate with good size and positional controllability.
    Type: Grant
    Filed: June 29, 1999
    Date of Patent: February 5, 2002
    Assignee: Japan Agency of Industrial Science and Technology as represented by Director General of National Research Institute for Metals
    Inventors: Kazuo Furuya, Masaki Takeguchi, Kazuhiro Yoshihara
  • Publication number: 20010042830
    Abstract: A holography electron microscope permitting electron holography without limitations on the magnification. An electron biprism is mounted between a system of intermediate lenses and a system of projector lenses. The objective lens and the system of intermediate lenses form a crossover at a given position between intermediate lenses and the electron biprism and, at the same time, focus a magnified image at a certain position between the electron biprism and projector lenses. Since the system of intermediate lenses is made up of three or more stages of lenses, it forms a crossover at a given position and focuses a magnified image at a certain position.
    Type: Application
    Filed: February 20, 2001
    Publication date: November 22, 2001
    Applicant: JEOL Ltd.
    Inventors: Toshikatsu Kaneyama, Hiromi Nunome, Masaki Takeguchi
  • Patent number: 5811806
    Abstract: There is disclosed an electron-beam biprism for use in an electron-beam holographic interference microscope. The biprism comprises a rotary plate having a hole permitting passage of an electron beam, a biprism wire mounted to the rotary plate and electrically insulated from the rotary plate, a holder, a rotating mechanism, a heating mechanism for heating the biprism wire, a voltage source for applying a voltage to the biprism wire, and a pair of grounding electrodes extending parallel to the biprism wire which bridges across the hole. The rotary plate is rotatably held by the holder so as to be rotatable about the hole. The grounding electrodes are mounted to the rotary plate. The biprism wire is sandwiched between the grounding electrodes.
    Type: Grant
    Filed: September 12, 1996
    Date of Patent: September 22, 1998
    Assignee: Jeol Ltd.
    Inventors: Toshikazu Honda, Masaki Takeguchi, Takeshi Tomita