Abstract: The present invention provides a vehicle seat which includes a seat back including a seat back body and an upholstery that covers front, back, and upper surfaces and both side surfaces of the seat back body. In the vehicle seat, the seat back body includes a frame having a frame shape and serving as a framework, a front-side cover portion placed so as to cover a front side of an inner space of the frame and supporting a back of a seated occupant, and a back-side cover portion placed so as to cover a rear side of the inner space. The front-side cover portion and the back-side cover portion are covered by the upholstery. The back-side cover portion includes a flexible back-side sheet body stretched across the frame.

Abstract: The present invention provides a vehicle seat which includes a seat frame, a seat cushion receiving member stretched across the seat frame, and a seat cushion placed on the seat cushion receiving member. In the vehicle seat, the seat cushion has such dimensions as to cover the seat frame as viewed in plan, and a lower surface of the seat cushion has a raised portion in a region covering the seat frame, and the raised portion is raised so as not to contact the seat frame.

Abstract: The present invention provides a vehicle seat which includes a seat frame, a seat cushion receiving member stretched across the seat frame, and a seat cushion placed on the seat cushion receiving member. In the vehicle seat, the seat cushion has such dimensions as to cover the seat frame as viewed in plan, and a lower surface of the seat cushion has a raised portion in a region covering the seat frame, and the raised portion is raised so as not to contact the seat frame.

Abstract: The present invention provides a vehicle seat which includes a seat back including a seat back body and an upholstery that covers front, back, and upper surfaces and both side surfaces of the seat back body. In the vehicle seat, the seat back body includes a frame having a frame shape and serving as a framework, a front-side cover portion placed so as to cover a front side of an inner space of the frame and supporting a back of a seated occupant, and a back-side cover portion placed so as to cover a rear side of the inner space. The front-side cover portion and the back-side cover portion are covered by the upholstery. The back-side cover portion includes a flexible back-side sheet body stretched across the frame.

Abstract: A method of manufacturing a membrane mask for use in an electron beam exposure apparatus that exposes resist material, comprises manufacturing the membrane mask. A membrane thickness is determined so that an operation time that the electron beam exposure apparatus spends in exposing the resist material to form a predetermined pattern using the membrane mask is comparable to or less than an operation time that the electron beam exposure apparatus spends in exposing the resist material to form the predetermined pattern using complementary masks.

Abstract: A pattern inspection apparatus is designed to quickly and accurately perform an inspection of an inspection sample, such as a mask or a wafer or the like by irradiating electron beams onto the inspection sample and detecting secondary or backscattered electrons reflected from the surface of the inspection sample and/or transmitted electrons passing through the inspection sample. The pattern inspection apparatus includes an electron beam generator including at least one electron gun for generating at least one electron beam irradiating onto the surface of the inspection sample. A movable support is provided for supporting the inspection sample. The apparatus also includes a detector unit having a plurality of electron detecting elements for detecting electrons containing information related to the construction of the inspection sample and a detection signal processor for processing simultaneously or in parallel formation the outputs of the electron detecting elements of the detector.

Abstract: A pattern inspection apparatus is designed to quickly and accurately perform an inspection of an inspecting sample, such as masks, wafers or so forth by irradiating electron beams onto the inspection sample and detecting a secondary electron or a backscattered electron reflected from the surface of the inspecting sample or a transmission electron passing through the inspection sample. The pattern inspection apparatus includes an electron beam generating means including at least one electron gun for generating at least one electron beam irradiating on the surface of the inspecting sample, a movable means for supporting the inspecting sample, a detecting means including a plurality of electron detecting elements for detecting electrons containing information related to the construction of the inspection sample and a detection signal processing means for processing simultaneously or in parallel formation the outputs of the electron detecting elements of the detecting means.

Abstract: Regarding a reflected light from any line portion, which is parallel to the longitudinal direction of the alignment mark 11, on the alignment mark 11, the cylindrical lens 33 functions merely as a glass plate, while the cylindrical lens 34 converges the light onto a pixel on the line sensor 35a, performing optical integration and simplifying image processing. Regarding a reflected light from any line portion, which is parallel to the lateral direction of the alignment mark 11, on the alignment mark 11, the cylindrical lens 34 functions merely as a glass plate, while the cylindrical lens 33 magnifies and forms a line image on the line sensor 35a along the pixel row of that. A toroidal lens can be used in place of the cylindrical lenses 33 and 34.

Abstract: A pattern inspection apparatus is designed to quickly and accurately perform an inspection of an inspection sample, such as a mask or a wafer or the like by irradiating electron beams onto the inspection sample and detecting secondary or backscattered electrons reflected from the surface of the inspection sample and/or transmitted electrons passing through the inspection sample. The pattern inspection apparatus includes an electron beam generator including at least one electron gun for generating at least one electron beam irradiating onto the surface of the inspection sample. A movable support is provided for supporting the inspection sample. The apparatus also includes a detector unit having a plurality of electron detecting elements for detecting electrons containing information related to the construction of the inspection sample and a detection signal processor for processing simultaneously or in parallel formation the outputs of the electron detecting elements of the detector.

Abstract: A rotary anode assembly for an X-ray source, having a annular V-groove target portion for generating a desired characteristic X-ray emission by an electron beam bombardment applied thereto, wherein the V-grooved target portion is formed from a pair of target members each being formed into a body of rotation with respect to the axis of rotation of the assembly and having a surface including therein a coaxially-formed annular tapered portion. The target members are combined together so that the annular tapered surface portions face to each other with a predetermined angle therebetween, thereby constituting the annular V-groove. The annular V-groove target portion is formed in the peripheral surface of the rotary anode assembly or in the side surface of the anode assembly, which is perpendicular to the axis of rotation.