Abstract: The laminate according to the invention is comprised of a base material (A), a silicon-containing layer (B) and a polymer layer (C) obtained from an organic acid metallic salt having a polymerizable group. The silicon-containing layer (B) and the polymer layer (C) are sequentially laminated over at least one surface of the base material (A), the silicon-containing layer (B) includes a high nitrogen concentration region comprised of silicon atoms and nitrogen atoms, silicon atoms and nitrogen atoms and oxygen atoms, or silicon atoms and nitrogen atoms and oxygen atoms and carbon atoms. The high nitrogen concentration region is formed by irradiating energy ray onto a polysilazane film formed over the base material (A) under an oxygen concentration equal to or lower than 5% and/or a relative humidity at room temperature (23° C.) equal to or lower than 30% so as to denature at least a part of the film.

Abstract: The present invention aims to provide a transparent gas barrier film having excellent gas barrier properties against oxygen, water vapor and the like especially under high humidity, and showing excellent delamination resistance after hydrothermal treatment. The present invention relates to a gas barrier film comprising: a base film having an inorganic compound layer formed on one side thereof; and a (meth)acrylic silane coupling agent layer and a layer (Y) that are laminated in this order on the inorganic compound layer, which layer (Y) comprises a polymer of a polyvalent metal salt of an unsaturated carboxylic acid compound (a) and a vinyl alcohol polymer (b).