Patents by Inventor Masako Yamakawa

Masako Yamakawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10377734
    Abstract: The present invention provides a resist composition which is excellent in heat resistance, has high solubility in a safe solvent, has high sensitivity, and can impart a good shape to a resist pattern.
    Type: Grant
    Filed: January 28, 2014
    Date of Patent: August 13, 2019
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Masatoshi Echigo, Masako Yamakawa
  • Patent number: 9908831
    Abstract: A resist composition containing a compound represented by the general formula (1) or (2), a method for forming a resist pattern using the composition, a polyphenolic compound for use in the composition, and an alcoholic compound that can be derived therefrom are described.
    Type: Grant
    Filed: January 19, 2016
    Date of Patent: March 6, 2018
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Masatoshi Echigo, Masako Yamakawa
  • Publication number: 20170183279
    Abstract: A resist composition containing a compound represented by the general formulas (1) or (2), a method for forming a resist pattern using the composition, a polyphenolic compound for use in the composition, an alcoholic compound that can be derived therefrom, and a method for producing an alcoholic compound represented by general formulas (6) or (7) are described.
    Type: Application
    Filed: March 14, 2017
    Publication date: June 29, 2017
    Inventors: Masatoshi ECHIGO, Masako YAMAKAWA
  • Patent number: 9598392
    Abstract: A resist composition containing a compound represented by the general formula (1) or (2), a method for forming a resist pattern using the composition, a polyphenolic compound for use in the composition, and an alcoholic compound that can be derived therefrom are described.
    Type: Grant
    Filed: August 9, 2012
    Date of Patent: March 21, 2017
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Masatoshi Echigo, Masako Yamakawa
  • Patent number: 9540339
    Abstract: A resist composition containing a compound represented by the general formula (1) or (2), a method for forming a resist pattern using the composition, a polyphenolic compound for use in the composition, and an alcoholic compound that can be derived therefrom are described.
    Type: Grant
    Filed: January 25, 2016
    Date of Patent: January 10, 2017
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Masatoshi Echigo, Masako Yamakawa
  • Publication number: 20160176840
    Abstract: A resist composition containing a compound represented by the general formula (1) or (2), a method for forming a resist pattern using the composition, a polyphenolic compound for use in the composition, and an alcoholic compound that can be derived therefrom are described.
    Type: Application
    Filed: January 25, 2016
    Publication date: June 23, 2016
    Inventors: Masatoshi ECHIGO, Masako YAMAKAWA
  • Publication number: 20160145231
    Abstract: A resist composition containing a compound represented by the general formula (1) or (2), a method for forming a resist pattern using the composition, a polyphenolic compound for use in the composition, and an alcoholic compound that can be derived therefrom are described.
    Type: Application
    Filed: January 19, 2016
    Publication date: May 26, 2016
    Inventors: Masatoshi ECHIGO, Masako YAMAKAWA
  • Publication number: 20150376157
    Abstract: The present invention provides a resist composition which is excellent in heat resistance, has high solubility in a safe solvent, has high sensitivity, and can impart a good shape to a resist pattern.
    Type: Application
    Filed: January 28, 2014
    Publication date: December 31, 2015
    Inventors: Masatoshi Echigo, Masako Yamakawa
  • Patent number: 9182666
    Abstract: A cyclic compound of the present invention has a molecular weight of 500 to 5000, and is represented by the following formula (1):
    Type: Grant
    Filed: November 14, 2012
    Date of Patent: November 10, 2015
    Assignee: MITSUBISHI GAS CHEMICAL CO., INC.
    Inventors: Masatoshi Echigo, Masako Yamakawa
  • Patent number: 9122153
    Abstract: A cyclic compound having a molecular weight of 500 to 5000 is represented by the following formula (1), wherein at least one of R0 is a monovalent group containing an iodine atom. Also disclosed are a method for producing the cyclic compound, a composition containing the cyclic compound, and a method for forming a resist pattern using the composition.
    Type: Grant
    Filed: August 9, 2012
    Date of Patent: September 1, 2015
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Masatoshi Echigo, Masako Yamakawa
  • Publication number: 20140329177
    Abstract: A cyclic compound of the present invention has a molecular weight of 500 to 5000, and is represented by the following formula (1):
    Type: Application
    Filed: November 14, 2012
    Publication date: November 6, 2014
    Inventors: Masatoshi Echigo, Masako Yamakawa
  • Publication number: 20140329178
    Abstract: A cyclic compound of the present invention has a molecular weight of 500 to 5000, and is represented by the following formula (1):
    Type: Application
    Filed: November 14, 2012
    Publication date: November 6, 2014
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY,INC
    Inventors: Masatoshi Echigo, Masako Yamakawa
  • Publication number: 20140308615
    Abstract: A cyclic compound having a molecular weight of 500 to 5000 is represented by the following formula (1), wherein at least one of R0 is a monovalent group containing an iodine atom. Also disclosed are a method for producing the cyclic compound, a composition containing the cyclic compound, and a method for forming a resist pattern using the composition.
    Type: Application
    Filed: August 9, 2012
    Publication date: October 16, 2014
    Applicant: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Masatoshi Echigo, Masako Yamakawa
  • Publication number: 20140248561
    Abstract: A resist composition containing a compound represented by the general formula (1) or (2), a method for forming a resist pattern using the composition, a polyphenolic compound for use in the composition, and an alcoholic compound that can be derived therefrom are described.
    Type: Application
    Filed: August 9, 2012
    Publication date: September 4, 2014
    Applicant: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Masatoshi Echigo, Masako Yamakawa
  • Patent number: 6127290
    Abstract: Provided is a heat generating bag for footwear having a comfortable temperature regardless of the state of use, namely, when staying still, walking etc., which is thin and avoids an uncomfortable feeling of the wearer. The heat generating bag for footwear is made by having a heat generating composition powder and hot-melt adhesive powder held in the pores of multiporous vegetable fiber non-woven fabrics, such fabrics being heat compressed on a mold compressor, and the obtained sheet shaped heat generating body being packed in an air-permeable bag. The heat composition is held in the pores of multiporous vegetable fiber non-woven fabric layers which are superposed by the adhesion of water. Such non-woven fabric are compressed on a mold compressor, and the obtained sheet shaped heat generating body is impregnated with water or an inorganic electrolyte and then packed in an air-permeable bag.
    Type: Grant
    Filed: November 6, 1997
    Date of Patent: October 3, 2000
    Assignee: Japan Pionics Co., Ltd.
    Inventors: Yasuhiko Koiso, Naoto Wagatsuma, Masako Yamakawa, Minako Suzuki
  • Patent number: 5665313
    Abstract: A detecting agent for hydride gases (arsine, phosphine, silane, diborane, selenium hydride etc.) which comprises at least one member selected from molybdic acid, a salt thereof, a molybdenum-containing acid (molybdophosphoric acid, etc.) and a salt thereof, and optionally a cupric salt each as a discoloring component being supported on an inorganic carrier (silica, alumina, silica-alumina, zirconia, etc.). The above detecting agent can detect the above hydride gases contained in the exhaust gas discharged from a semiconductor manufacturing process, with high accuracy, selectivity and sensitivity at a high discoloring rate without being influenced by other gases such as hydrogen gas.
    Type: Grant
    Filed: August 7, 1995
    Date of Patent: September 9, 1997
    Assignee: Japan Pionics Co., Ltd.
    Inventors: Takashi Shimada, Masako Yamakawa, Youji Nawa