Abstract: An electrostatic chuck includes a base having a surface on which an object is to be placed, and a through hole extending through the base, wherein a porous material containing angular ceramic particles is disposed in the through hole.

Abstract: An electrostatic chuck includes a base having a surface on which an object is to be placed, and a through hole extending through the base, wherein a porous material containing angular ceramic particles is disposed in the through hole.

Abstract: A sintered body includes a ceramic substrate including sintered oxide particles, a through-hole formed in the ceramic substrate such that the side surfaces of the oxide particles exposed from an inner wall of the through-hole form a flat surface, and a porous body disposed in the through-hole, the porous body including spherical oxide ceramic particles and a mixed oxide configured to bind the spherical oxide ceramic particles.

Abstract: A substrate fixing device includes an electrostatic chuck on a baseplate, and a porous body in a gas hole piercing through a substrate of the electrostatic chuck. The electrostatic chuck attracts an object onto a first surface of the substrate. The gas hole includes a first recess formed in a second surface of the substrate facing the baseplate and depressed toward the first surface, a second recess formed at the bottom of the first recess and depressed toward the first surface, and a through hole extending from the bottom of the second recess to the first surface. The first recess is entirely and the second recess is partly filled with the porous body. A region of the second recess unfilled with the porous body is a recess in the porous body depressed toward the second surface relative to where the bottom of the second recess communicates with the through hole.

Abstract: A sintered body includes a ceramic substrate including sintered oxide particles, a through-hole formed in the ceramic substrate such that the side surfaces of the oxide particles exposed from an inner wall of the through-hole form a flat surface, and a porous body disposed in the through-hole, the porous body including spherical oxide ceramic particles and a mixed oxide configured to bind the spherical oxide ceramic particles.

Abstract: An electrostatic chuck includes a mount base. The mount base includes a base body and an electrostatic electrode, which is located in the base body. The base body is formed from a ceramic that contains aluminum oxide, which serves as a main component, yttrium oxide, magnesium oxide, and calcium oxide. A content percentage of the calcium oxide is 0.4 wt % to 0.6 wt %.

Abstract: An electrostatic chuck includes a placing stage formed from a ceramic including aluminum oxide and yttrium oxide, and an electrostatic electrode arranged in the placing stage, wherein a content rate of the yttrium oxide is 0.5 wt % to 2.0 wt %. Preferably, the electrostatic chuck is used while being heated at a temperature of 100° C. to 200° C.

Abstract: An electrostatic chuck includes a placing stage formed from a ceramic including aluminum oxide and yttrium oxide, and an electrostatic electrode arranged in the placing stage, wherein a content rate of the yttrium oxide is 0.5 wt % to 2.0 wt %. Preferably, the electrostatic chuck is used while being heated at a temperature of 100° C. to 200° C.

Abstract: There is provided an electrostatic chuck. The electrostatic chuck includes: a ceramic base containing alumina and first flux; an electrostatic electrode built in the ceramic base; and a ceramic material containing second flux and provided between the ceramic base and the electrostatic electrode, the ceramic material contacting the ceramic base and the electrostatic electrode. A content rate of the second flux is higher than that of the first flux.