Patents by Inventor Masami Enda
Masami Enda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8440876Abstract: A chemical decontamination apparatus of the present invention chemically dissolves radioactive substance-containing oxide films formed or adhering on the surface of a decontamination object by using ozone water to conduct decontamination. The chemical decontamination apparatus includes an ozone generating unit for generating ozone gas, an ozone supplying device for supplying the generated ozone gas to an ozone supplying unit in water, and a sintered metal element 37 which is disposed in the ozone supplying unit and to which ozone gas is supplied from the ozone supplying device. The ozone gas supplied to a sintered metal element interior from the ozone supplying device is allowed to flow out of the element into water so as to generate ozone water.Type: GrantFiled: February 6, 2007Date of Patent: May 14, 2013Assignee: Kabushiki Kaisha ToshibaInventors: Masami Enda, Nagayoshi Ichikawa, Masayuki Kaneda, Takeshi Kanasaki, Toshihiro Yoshii, Yumi Yaita, Ichiro Inami
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Publication number: 20110122986Abstract: The present invention relates to a method and an apparatus for suppressing adhesion of a radioactive substance, capable of suppressing adhesion of the radioactive substance onto the surface of a metallic material forming a structural member in a nuclear plant. On the surface of the metallic material forming the structural member in a nuclear power generation plant, e.g., a surface 32A of a pipe 32, an adhesion-suppressing substance 34 containing titanium oxide as a titanium compound is disposed, and a part on which the adhesion-suppressing substance 34 has been formed, is held at 80° C. or higher. The adhesion-suppressing substance 34 is formed on the surface 32A of the pipe 32 by spraying a solution or a suspension liquid of the substance.Type: ApplicationFiled: August 21, 2008Publication date: May 26, 2011Applicant: Kabushiki Kaisha ToshibaInventors: Seiji Yamamoto, Masami Enda, Hiromi Aoi, Yutaka Uruma
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Patent number: 7772451Abstract: A system for chemically decontaminating radioactive material.Type: GrantFiled: May 31, 2006Date of Patent: August 10, 2010Assignee: Kabushiki Kaisha ToshibaInventors: Masami Enda, Yumi Yaita, Mitsuyoshi Sato, Hitoshi Sakai, Takeshi Kanasaki, Ichiro Inami
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Publication number: 20100168497Abstract: A chemical decontamination apparatus of the present invention chemically dissolves radioactive substance-containing oxide films formed or adhering on the surface of a decontamination object by using ozone water to conduct decontamination. The chemical decontamination apparatus includes an ozone generating unit for generating ozone gas, an ozone supplying device for supplying the generated ozone gas to an ozone supplying unit in water, and a sintered metal element 37 which is disposed in the ozone supplying unit and to which ozone gas is supplied from the ozone supplying device. The ozone gas supplied to a sintered metal element interior from the ozone supplying device is allowed to flow out of the element into water so as to generate ozone water.Type: ApplicationFiled: February 6, 2007Publication date: July 1, 2010Applicant: KABUSHIKI KAISHA TOSHIBAInventors: Masami Enda, Nagayoshi Ichikawa, Masayuki Kaneda, Takeshi Kanasaki, Toshihiro Yoshii, Yumi Yaita, Ichiro Inami
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Publication number: 20100154840Abstract: A system for chemically decontaminating radioactive material.Type: ApplicationFiled: May 31, 2006Publication date: June 24, 2010Applicant: KABUSHIKI KAISHA TOSHIBAInventors: Masami Enda, Yumi Yaita, Mitsuyoshi Sato, Hitoshi Sakai, Takeshi Kanasaki, Ichiro Inami
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Patent number: 7713402Abstract: Chemical decontamination method of dissolving oxide film adhered to contaminated component including, preparing decontamination solution in which ozone is dissolved and oxidation additive agent, which suppresses corrosion of metal base of the contaminated component, is added, and applying the decontamination solution to the contaminated component, thereby to remove the oxide film by oxidation.Type: GrantFiled: June 8, 2005Date of Patent: May 11, 2010Assignee: Kabushiki Kaisha ToshibaInventors: Masami Enda, Yumi Yaita, Norihisa Saito, Hiromi Aoi, Ichiro Inami, Hitoshi Sakai, Satoshi Hiraragi, Yoshinari Takamatsu
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Patent number: 7622627Abstract: A system for chemically decontaminating radioactive material.Type: GrantFiled: June 1, 2006Date of Patent: November 24, 2009Assignee: Kabushiki Kaisha ToshibaInventors: Masami Enda, Yumi Yaita, Mitsuyoshi Sato, Hitoshi Sakai, Takeshi Kanasaki, Ichiro Inami
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Publication number: 20070071654Abstract: A system for chemically decontaminating radioactive material.Type: ApplicationFiled: June 1, 2006Publication date: March 29, 2007Applicant: KABUSHIKI KAISHA TOSHIBAInventors: Masami Enda, Yumi Yaita, Mitsuyoshi Sato, Hitoshi Sakai, Takeshi Kanasaki, Ichiro Inami
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Patent number: 7087120Abstract: A method for chemically decontaminating radioactive material. The method includes reducing-dissolving step for setting surface of radioactive material in contact with reducing decontamination liquid including mono-carboxylic acid and di-carboxylic acid as dissolvent; and oxidizing-dissolving step for setting the surface of the radioactive material in contact with oxidizing decontamination liquid including oxidizer. The method may include repeated pairs of steps, each pair including the reducing-dissolving step and the oxidizing-dissolving step. The mono-carboxylic acid may include formic acid, and the di-carboxylic acid includes oxalic acid. The oxidizer may be ozone, permanganic acid or permanganate.Type: GrantFiled: November 21, 2003Date of Patent: August 8, 2006Assignee: Kabushiki Kaisha ToshibaInventors: Masami Enda, Yumi Yaita, Mitsuyoshi Sato, Hitoshi Sakai, Takeshi Kanasaki, Ichiro Inami
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Publication number: 20060167330Abstract: A method for chemically decontaminating radioactive material. The method includes reducing-dissolving step for setting surface of radioactive material in contact with reducing decontamination liquid including mono-carboxylic acid and di-carboxylic acid as dissolvent; and oxidizing-dissolving step for setting the surface of the radioactive material in contact with oxidizing decontamination liquid including oxidizer. The method may include repeated pairs of steps, each pair including the reducing-dissolving step and the oxidizing-dissolving step. The mono-carboxylic acid may include formic acid, and the di-carboxylic acid includes oxalic acid. The oxidizer may be ozone, permanganic acid or permanganate.Type: ApplicationFiled: November 21, 2003Publication date: July 27, 2006Applicant: KABUSHIKI KAISHA TOSHIBAInventors: Masami Enda, Yumi Yaita, Mitsuyoshi Sato, Hitoshi Sakai, Takeshi Kanasaki, Ichiro Inami
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Publication number: 20060041176Abstract: Chemical decontamination method of dissolving oxide film adhered to contaminated component including, preparing decontamination solution in which ozone is dissolved and oxidation additive agent, which suppresses corrosion of metal base of the contaminated component, is added, and applying the decontamination solution to the contaminated component, thereby to remove the oxide film by oxidation.Type: ApplicationFiled: June 8, 2005Publication date: February 23, 2006Inventors: Masami Enda, Yumi Yaita, Norihisa Saito, Hiromi Aoi, Ichiro Inami, Hitoshi Sakai, Satoshi Hiraragi, Yoshinari Takamatsu
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Patent number: 6875323Abstract: Ozone gas having a high ozone concentration is generated by a solid electrolyte electrolytic process. An ozone solution is prepared by injecting the ozone gas into an acidic solution of pH 6 or below. The ozone solution heated at a temperature in the range of 50° to 90° C. is supplied to a contaminated object to oxidize and dissolve a chromium oxide film by an oxidizing dissolving process. The ozone solution used in the oxidizing dissolving process is irradiated with ultraviolet rays to decompose ozone contained in the ozone solution, the ozone solution is passed through an ion-exchange resin to remove ions contained in the ozone solution. An oxalic acid solution is supplied to the contaminated object to dissolve an iron oxide film by a reductive dissolving process.Type: GrantFiled: August 22, 2003Date of Patent: April 5, 2005Assignee: Kabushiki Kaisha ToshibaInventors: Yumi Yaita, Masami Enda, Hitoshi Sakai
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Publication number: 20040035443Abstract: Ozone gas having a high ozone concentration is generated by a solid electrolyte electrolytic process. An ozone solution is prepared by injecting the ozone gas into an acidic solution of pH 6 or below. The ozone solution heated at a temperature in the range of 50° to 90° C. is supplied to a contaminated object to oxidize and dissolve a chromium oxide film by an oxidizing dissolving process. The ozone solution used in the oxidizing dissolving process is irradiated with ultraviolet rays to decompose ozone contained in the ozone solution, the ozone solution is passed through an ion-exchange resin to remove ions contained in the ozone solution. An oxalic acid solution is supplied to the contaminated object to dissolve an iron oxide film by a reductive dissolving process.Type: ApplicationFiled: August 22, 2003Publication date: February 26, 2004Applicant: KABUSHIKI KAISHA TOSHIBAInventors: Yumi Yaita, Masami Enda, Hitoshi Sakai
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Patent number: 6635232Abstract: Ozone gas having a high ozone concentration is generated by a solid electrolyte electrolytic process. An ozone solution is prepared by injecting the ozone gas into an acidic solution of pH 6 or below. The ozone solution heated at a temperature in the range of 50° to 90° C. is supplied to a contaminated object to oxidize and dissolve a chromium oxide film by an oxidizing dissolving process. The ozone solution used in the oxidizing dissolving process is irradiated with ultraviolet rays to decompose ozone contained in the ozone solution, the ozone solution is passed through an ion-exchange resin to remove ions contained in the ozone solution. An oxalic acid solution is supplied to the contaminated object to dissolve an iron oxide film by a reductive dissolving process.Type: GrantFiled: December 22, 1999Date of Patent: October 21, 2003Assignee: Kabushiki Kaisha ToshibaInventors: Yumi Yaita, Masami Enda, Hitoshi Sakai
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Patent number: 5877388Abstract: An insulating shield plate (1) divides a room of an electrolysis bath (2) into an anode chamber (13) and a cathode chamber (14). An anode (5) is disposed in the anode chamber (13), and a cathode (6), metallic waste (7) and heater (4) are disposed in the cathode chamber (14). An electrolyte (3) stored in the electrolysis bath (2) flows in a circulation path from a circulating pump (10) through a circulating line (12) and filter (11) to return the electrolysis bath (2). An exhaust gas processing device 9 is connected to the electrolysis bath (2). When a voltage is supplied to the anode (5) and cathode (6), a surface of the metallic waste (7) is charged in a positive polar to dissolve a base metal of the metallic waste (7). Further, a cylindrical anode (33) is arranged in an electrolyte (32) in an electrolysis bath (31), and a cylindrical metal (34) as a metallic waste is arranged in the cylindrical anode (33).Type: GrantFiled: June 6, 1997Date of Patent: March 2, 1999Assignee: Kabushiki Kaisha ToshibaInventors: Masami Enda, Katsumi Hosaka, Hitoshi Sakai, Hideaki Heki
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Patent number: 5865965Abstract: An insulating shield plate (1) divides a room of an electrolysis bath (2) into an anode chamber (13) and a cathode chamber (14). An anode (5) is disposed in the anode chamber (13), and a cathode (6), metallic waste (7) and heater (4) are disposed in the cathode chamber (14). An electrolyte (3) stored in the electrolysis bath (2) flows in a circulation path from a circulating pump (10) through a circulating line (12) and filter (11) to return the electrolysis bath (2). An exhaust gas processing device 9 is connected to the electrolysis bath (2). When a voltage is supplied to the anode (5) and cathode (6), a surface of the metallic waste (7) is charged in a positive polarity to dissolve a base metal of the metallic waste (7). Further, a cylindrical anode (33) is arranged in an electrolyte (32) in an electrolysis bath (31), and a cylindrical metal (34) as a metallic waste is arranged in the cylindrical anode (33).Type: GrantFiled: January 23, 1997Date of Patent: February 2, 1999Assignee: Kabushiki Kaisha ToshibaInventors: Masami Enda, Jiro Sakurai, Hitoshi Sakai, Osamu Sasaki
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Patent number: 4701246Abstract: A decontaminating liquid capable of removing a radioactive substance adhering to or deposited in a metal waste is produced by a method which comprises immersing an anode made of a metal or a metal oxide having a high oxygen overvoltage equal to or higher than the oxygen overvoltage of platinum and a cathode made of a metal or a metal oxide having a low hydrogen overvoltage equal to or lower than the hydrogen overvoltage of platinum in an acidic solution having dissolved therein a metal ion in a low-oxidation state and causing passage of an electric current between the two electrodes thereby giving rise to a metal ion in a high-oxidation state.Type: GrantFiled: March 6, 1986Date of Patent: October 20, 1987Assignee: Kabushiki Kaisha ToshibaInventors: Reiko Fujita, Masami Enda
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Patent number: 4663085Abstract: The invention resides in an apparatus for the decontamination of radioactivated metallic waste by the electrolytic oxidation-reduction with an aqueous nitric acid solution containing trivalent cerium ions, i.e. the step of converting the trivalent cerium ions into tetravalent cerium ions through electrolytic oxidation and the step of dissolving the surface layer of the radioactivated metallic waste by oxidizing it with the electrolytic solution now vested with the oxidative power of the freshly produced tetravalent cerium ions and, at the same time, effecting regeneration of the tetravalent cerium ions.Type: GrantFiled: March 11, 1985Date of Patent: May 5, 1987Assignee: Kabushiki Kaisha ToshibaInventors: Masami Enda, Reiko Fujita, Tetsuo Morisue, Yutaka Hasegawa