Abstract: The apparatus 10 includes a tray 22 for holding a semiconductor device 18, an inspection connector 30 for automatically coupling to a connector 16 of the device 18, a probe 32 for supplying or receiving signals to or from terminals 14A of a device body 14 being in contact with each other, an inspection robot 36 for picking up the body 14 held in the tray and transporting it to the probe to get contact with or close to; a controller 66 to control the robot 36, and a tester 34 to test the device 18 by supplying input signals to one of the connector 30 or the probe 32 and receiving output signals from the other.

Abstract: The apparatus 10 includes a tray 22 for holding a semiconductor device 18, an inspection connector 30 for automatically coupling to a connector 16 of the device 18, a probe 32 for supplying or receiving signals to or from terminals 14A of a device body 14 being in contact with each other, an inspection robot 36 for picking up the body 14 held in the tray and transporting it to the probe to get contact with or close to; a controller 66 to control the robot 36, and a tester 34 to test the device 18 by supplying input signals to one of the connector 30 or the probe 32 and receiving output signals from the other.

Abstract: A pattern sewing machine which recognizes a reference point of a cloth in a cloth holding frame 2 by recognition means 11, can space stitch point data of the current sewing pattern to be sewn in the cloth holding frame 2 at a predetermined pattern distance apart from the already formed embroidered pattern in X and Y directions by correction means 13i based on the reference point, detects a rotation direction shift of the cloth set in the cloth holding frame 2 by rotation direction shift detection means 13g, and corrects the stitch point data spaced at the predetermined pattern distance apart from the already formed embroidered pattern in the X and Y directions in the rotation direction with the reference point as the center by the correction means 13i based on the reference point and the cloth rotation direction shift, thereby finely matching the relative positions of the already formed sewing pattern and the subsequent sewing pattern to be sewn.

Abstract: An embroidery sewing machine is provided with an editing device for editorially combining or joining a plural number of embroidery component patterns into a composite or target embroidery pattern on a display window, which is larger than an embroidering frame for holding a work cloth, and a sewing device for sewing the thus edited composite embroidery pattern onto a work cloth set to the embroidering frame. The editing device has an enlarging function to edit the embroidery component patterns and to display a part of the composite embroidery pattern in an area larger than the display window in a manner that a preset point is set as a reference point on a display area of the display window and the reference point is horizontally and vertically moved. The sewing device has a continuing function to continue the sewing operation of the composite embroidery pattern that is edited in the area larger than that of the display window by use of the enlarging function of the editing device.