Abstract: A vacuum pump (10) has a pump casing (54) including pump chambers (50a-50f) held in fluid communication with each other and arrayed in a longitudinal direction thereof, an inlet port (52a) and an outlet port (52b), a rotational shaft (58) rotatably supported at opposite ends thereof and extending in the longitudinal direction of the pump casing (54), and rotors (60a-60f) housed in the pump chambers (50a-50f) and coupled to the rotational shaft (58). The pump casing (54) includes a first thermally conductive member (72) extending parallel to the rotational shafts (58) substantially the full length of the pump casing (54) in the longitudinal direction thereof, and a second thermally conductive member (74) positioned near an end of the first thermally conductive member (72) at the outlet port (52b) and extending in a transverse direction of the pump casing (54).

Abstract: A vacuum pump (10) includes a pump casing (56) having an inlet port (54a), an outlet port (54b), and pump chambers (50a-50f) defined therein, rotational shafts 60 having opposite ends rotatably supported by bearings (84a, 84b) on the pump casing (56) and extending longitudinally in the pump casing (56), and rotors (62a-62f) housed in the pump chambers (50a-50f) and coupled to the rotational shafts (60) for rotation in unison with the rotational shafts (60). The pump casing (56) has an atmosphere-vented compartment (52) defined therein which is held in fluid communication with the outlet port (54b) of the pump casing (56) and vented to the atmosphere.

Abstract: A processing method is performed for processing a workpiece such as a semiconductor wafer. The processing method utilizes an apparatus comprising a cover for covering a portion of a surface, to be processed, of a workpiece, a process chamber formed by the cover and the surface, to be processed, of the workpiece, and a sealing portion provided between the cover and the surface of the workpiece for sealing the process chamber.

Abstract: A processing method is performed for processing a workpiece such as a semiconductor wafer. The processing method utilizes an apparatus comprising a cover for covering a portion of a surface, to be processed, of a workpiece, a process chamber formed by the cover and the surface, to be processed, of the workpiece, and a sealing portion provided between the cover and the surface of the workpiece for sealing the process chamber.

Abstract: A processing apparatus is used for processing a workpiece such as a semiconductor wafer. The processing apparatus comprises a cover for covering a portion of a surface, to be processed, of a workpiece, a process chamber formed by the cover and the surface, to be processed, of the workpiece, and a sealing portion provided between the cover and the surface of the workpiece for sealing the process chamber.

Abstract: A multishaft electric motor has a plurality of juxtaposed rotors having respective permanent magnets disposed therearound, and a plurality of sets of armature elements disposed fully circumferentially around the rotors, respectively, the permanent magnets of adjacent two of the rotors having a plurality of pairs of unlike magnetic poles for magnetically coupling the rotors through the armature elements between the permanent magnets. A positive-displacement vacuum pump includes a casing, a pair of pump rotors rotatably disposed in the casing in confronting relation to each other, and a two-shaft electric motor coupled to the pump rotors for rotating the pump rotors in opposite directions. The two-shaft electric motor may comprise a pair of juxtaposed rotors and a pair of sets of armature elements disposed fully circumferentially around the rotors, respectively.

Abstract: A multishaft electric motor has a plurality of juxtaposed rotors having respective permanent magnets disposed therearound, and a plurality of sets of armature elements disposed fully circumferentially around the rotors, respectively, the permanent magnets of adjacent two of the rotors having a plurality of pairs of unlike magnetic poles for magnetically coupling the rotors through the armature elements between the permanent magnets. A positive-displacement vacuum pump includes a casing, a pair of pump rotors rotatably disposed in the casing in confronting relation to each other, and a two-shaft electric motor coupled to the pump rotors for rotating the pump rotors in opposite directions. The two-shaft electric motor may comprise a pair of juxtaposed rotors and a pair of sets of armature elements disposed fully circumferentially around the rotors, respectively.

Abstract: A multishaft electric motor has a plurality of juxtaposed rotors having respective permanent magnets disposed therearound, and a plurality of sets of armature elements disposed fully circumferentially around the rotors, respectively, the permanent magnets of adjacent two of the rotors having a plurality of pairs of unlike magnetic poles for magnetically coupling the rotors through the armature elements between the permanent magnets. A positive-displacement vacuum pump includes a casing, a pair of pump rotors rotatably disposed in the casing in confronting relation to each other, and a two-shaft electric motor coupled to the pump rotors for rotating the pump rotors in opposite directions. The two-shaft electric motor may comprise a pair of juxtaposed rotors and a pair of sets of armature elements disposed fully circumferentially around the rotors, respectively.

Abstract: A multishaft electric motor has a plurality of juxtaposed rotors having respective permanent magnets disposed therearound, and a plurality of sets of armature elements disposed fully circumferentially around the rotors, respectively, the permanent magnets of adjacent two of the rotors having a plurality of pairs of unlike magnetic poles for magnetically coupling the rotors through the armature elements between the permanent magnets. A positive-displacement vacuum pump includes a casing, a pair of pump rotors rotatably disposed in the casing in confronting relation to each other, and a two-shaft electric motor coupled to the pump rotors for rotating the pump rotors in opposite directions. The two-shaft electric motor may comprise a pair of juxtaposed rotors and a pair of sets of armature elements disposed fully circumferentially around the rotors, respectively.

Abstract: A processing apparatus is used for processing a workpiece such as a semiconductor wafer. The processing apparatus comprises a cover for covering a portion of a surface, to be processed, of a workpiece, a process chamber formed by the cover and the surface, to be processed, of the workpiece, and a sealing portion provided between the cover and the surface of the workpiece for sealing the process chamber.

Abstract: A multishaft electric motor has a plurality of juxtaposed rotors having respective permanent magnets disposed therearound, and a plurality of sets of armature elements disposed fully circumferentially around the rotors, respectively, the permanent magnets of adjacent two of the rotors having a plurality of pairs of unlike magnetic poles for magnetically coupling the rotors through the armature elements between the permanent magnets. A positive-displacement vacuum pump includes a casing, a pair of pump rotors rotatably disposed in the casing in confronting relation to each other, and a two-shaft electric motor coupled to the pump rotors for rotating the pump rotors in opposite directions. The two-shaft electric motor may comprise a pair of juxtaposed rotors and a pair of sets of armature elements disposed fully circumferentially around the rotors, respectively.

Abstract: A multishaft electric motor has a plurality of juxtaposed rotors having respective permanent magnets disposed therearound, and a plurality of sets of armature elements disposed fully circumferentially around the rotors, respectively, the permanent magnets of adjacent two of the rotors having a plurality of pairs of unlike magnetic poles for magnetically coupling the rotors through the armature elements between the permanent magnets. A positive-displacement vacuum pump includes a casing, a pair of pump rotors rotatably disposed in the casing in confronting relation to each other, and a two-shaft electric motor coupled to the pump rotors for rotating the pump rotors in opposite directions. The two-shaft electric motor may comprise a pair of juxtaposed rotors and a pair of sets of armature elements disposed fully circumferentially around the rotors, respectively.

Abstract: A multistage positive-displacement vacuum pump which is preferably used in the fabrication of semiconductor devices and can be operated from atmospheric pressure. The vacuum pump comprises a pump casing, a pump assembly housed in the pump casing and comprising a pair of pump rotors rotatable in synchronism with each other and arranged in multiple stages, and an intermediate pressure chamber provided between a preceding stage and a subsequent stage in the pump casing. The shaft portions of the pump rotors located between the preceding and subsequent stages are located in the intermediate pressure chamber.

Abstract: A multishaft electric motor has a plurality of juxtaposed rotors having respective permanent magnets disposed therearound, and a plurality of sets of armature elements disposed fully circumferentially around the rotors, respectively, the permanent magnets of adjacent two of the rotors having a plurality of pairs of unlike magnetic poles for magnetically coupling the rotors through the armature elements between the permanent magnets. A positive-displacement vacuum pump includes a casing, a pair of pump rotors rotatably disposed in the casing in confronting relation to each other, and a two-shaft electric motor coupled to the pump rotors for rotating the pump rotors in opposite directions. The two-shaft electric motor may comprise a pair of juxtaposed rotors and a pair of sets of armature elements disposed fully circumferentially around the rotors, respectively.

Abstract: A vacuum pump has a pump casing having a suction side where a suction port is located and a discharge side where a discharge port is located, a pump assembly housed in the pump casing and comprising a pair of pump rotors rotatable in synchronism with each other and having respective shafts, and a brushless direct-current motor mounted on the pump casing at a suction side of the pump casing. The motor has a pair of motor rotors comprising respective sets of permanent magnets which are mounted respectively on the shafts, a pair of cans surrounding outer circumferential and end surfaces of the motor rotors in sealing relation to the pump assembly, a motor stator mounted on the cans and housed in a water-cooled motor frame.