Patents by Inventor Masami Onodera

Masami Onodera has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5875505
    Abstract: A substrate cleaning station includes a first index table supporting thereon at least three circumferentially spaced first substrate carriers on which hard disk substrates are mounted respectively. A substrate drying station includes a second index table disposed rearward of the first index table and supporting thereon at least three circumferentially spaced second substrate carriers on which cleaned hard disk substrate are mounted, respectively. Upon rotation of the first index table, each of the first substrate carriers moves successively through a substrate mounting position, a substrate cleaning position and a substrate removing position. Likewise, upon rotation of the second index table, each of the second substrate carriers moves through a substrate mounting position, a substrate drying position and a substrate removing position.
    Type: Grant
    Filed: August 27, 1997
    Date of Patent: March 2, 1999
    Assignee: System Seiko Co., Ltd.
    Inventor: Masami Onodera
  • Patent number: 5685040
    Abstract: An apparatus for cleaning and then drying batches of hard disk substrates includes a substrate cleaning station and a substrate drying station. The substrate cleaning station includes a first index table supporting thereon at least three circumferentially spaced first substrate carriers on which hard disk substrates are mounted respectively. The substrate drying station includes a second index table disposed rearward of the first index table and supporting thereon at least three circumferentially spaced second substrate carriers on which cleaned hard disk substrate are mounted, respectively. Upon rotation of the first index table, each of the first substrate carriers moves successively through a substrate mounting position, a substrate cleaning position and a substrate removing position. Likewise, upon rotation of the second index table, each of the second substrate carriers moves through a substrate mounting position, a substrate drying position and a substrate removing position.
    Type: Grant
    Filed: October 26, 1993
    Date of Patent: November 11, 1997
    Assignee: System Seiko Co., Ltd.
    Inventor: Masami Onodera
  • Patent number: 5579850
    Abstract: A cultivating system including a tractor, a cultivating machine for performing a cultivating work in combination with the tractor, and a link mechanism for linking the tractor and the cultivating machine, includes a free-motion mechanism provided to at least one of the tractor, the cultivating machine and the link mechanism, and having a free motion permissible zone in which at least one of the tractor, the cultivating machine and the link mechanism is freely movable relatively to the others in accordance with variation of a cultivation attitude of the cultivating machine due to variation of a cultivation environment, a cultivation-condition control mechanism for detecting the free motion of at least one of the tractor, the cultivating machine and the link mechanism within the free motion permissible zone in accordance with the variation of the cultivation environment, and moving the cultivating machine in accordance with the free motion permissible zone so as to offset the variation of the attitude of said c
    Type: Grant
    Filed: October 12, 1994
    Date of Patent: December 3, 1996
    Assignee: Sugano Farm Machinery Mfg. Co., Ltd.
    Inventors: Shigetoshi Kimura, Masami Onodera, Yoshinori Takahashi
  • Patent number: 5538460
    Abstract: An apparatus for grinding hard disk substrates includes a dressing unit essentially radially movable across the faces of rotating of grinding wheels for simultaneously dressing one or both of the two confronting surfaces thereof. The apparatus thus constructed is suited to fully automated grinding/dressing operations.
    Type: Grant
    Filed: December 23, 1994
    Date of Patent: July 23, 1996
    Assignee: System Seiko Co., Ltd.
    Inventor: Masami Onodera
  • Patent number: 5357645
    Abstract: An apparatus for cleaning and then drying batches of hard disk substrates includes a substrate cleaning station and a substrate drying station. The substrate cleaning station includes a first index table supporting thereon at least three circumferentially spaced first substrate carriers on which hard disk substrates are mounted respectively. The substrate drying station includes a second index table disposed rearward of the first index table and supporting thereon at least three circumferentially spaced second substrate carriers on which cleaned hard disk substrates are mounted, respectively. Upon rotation of the first index table, each of the first substrate carriers moves successively through a substrate mounting position, a substrate cleaning position and a substrate removing position. Likewise, upon rotation of the second index table, each of the second substrate carriers moves through a substrate mounting position, a substrate drying position and a substrate removing position.
    Type: Grant
    Filed: May 14, 1993
    Date of Patent: October 25, 1994
    Assignee: System Seiko Co., Ltd.
    Inventor: Masami Onodera
  • Patent number: 5140774
    Abstract: An apparatus capable of simultaneously polishing a plurality of hard disk substrates at the same time includes at least three substrate carriers which are rotatably disposed on an index table and which carry and transfer a plurality of hard disk substrates, are moved successively through a substrate loading station, a substrate polishing station and a substrate removing station in response to intermittent rotation of the index table.
    Type: Grant
    Filed: October 31, 1991
    Date of Patent: August 25, 1992
    Assignee: System Seiko Co., Ltd.
    Inventor: Masami Onodera