Patents by Inventor Masamichi Kuwabara

Masamichi Kuwabara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8624205
    Abstract: A charged particle beam writing apparatus includes an aperture array configured to be capable of forming a plurality of charged particle beams using a plurality of openings, an element array including a plurality of main elements and a plurality of auxiliary elements different from the main elements, and a control unit configured to acquire information associated with a defect of the plurality of main elements and control the element array in accordance with the information, wherein the control unit controls the element array such that only the main elements are used when there is no defect, while when there is a main element having a defect, an auxiliary element is used without using the main element having the defect.
    Type: Grant
    Filed: January 6, 2010
    Date of Patent: January 7, 2014
    Assignee: Canon Kabushiki Kaisha
    Inventors: Isamu Seto, Yoshio Suzaki, Masamichi Kuwabara
  • Publication number: 20120115306
    Abstract: A deflector array includes a first base substrate including a plurality of apertures formed thereon, and a plurality of deflector chips including a plurality of apertures formed thereon and a plurality of electrode pairs disposed at both sides of at least a part of the plurality of apertures. The plurality of deflector chips is fixed to the first base substrate in such a manner that the plurality of apertures of the deflector chips is arranged at positions corresponding to the plurality of apertures of the first base substrate.
    Type: Application
    Filed: November 4, 2011
    Publication date: May 10, 2012
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Toru Yamazaki, Masamichi Kuwabara, Yoshihiro Hirata
  • Publication number: 20100178602
    Abstract: A charged particle beam writing apparatus includes an aperture array configured to be capable of forming a plurality of charged particle beams using a plurality of openings, an element array including a plurality of main elements and a plurality of auxiliary elements different from the main elements, and a control unit configured to acquire information associated with a defect of the plurality of main elements and control the element array in accordance with the information, wherein the control unit controls the element array such that only the main elements are used when there is no defect, while when there is a main element having a defect, an auxiliary element is used without using the main element having the defect.
    Type: Application
    Filed: January 6, 2010
    Publication date: July 15, 2010
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Isamu Seto, Yoshio Suzaki, Masamichi Kuwabara
  • Patent number: 4145462
    Abstract: A process for producing solar collectors of aluminum or aluminum alloys having a selective absorptive coating. Aluminum or its alloy is dipped in a hot aqueous solution containing a silicate. Aluminum alloys can be also used which contain alloying elements such as iron, copper, titanium, nickel, silver and gold.
    Type: Grant
    Filed: May 25, 1977
    Date of Patent: March 20, 1979
    Assignee: Toyo Aluminium Kabushiki Kaisha
    Inventors: Masamichi Kuwabara, Mitsuo Sasaki, Sigeru Uema, Youkichi Taniguchi, Noboru Fukuchi, Tohru Kimura