Patents by Inventor Masamichi Nomura
Masamichi Nomura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20120279944Abstract: Provided is an annealing apparatus, which is free from a problem of reduced light energy efficiency resulted by the reduction of light emission amount due to a heat generation and capable of maintaining stable performance. The apparatus includes: a processing chamber 1 for accommodating a wafer W; heating sources 17a and 17b including LEDs 33 and facing the surface of the wafer W to irradiate light on the wafer W; light-transmitting members 18a and 18b arranged in alignment with the heating sources 17a and 17b to transmit the light emitted from the LEDs 33; cooling members 4a and 4b supporting the light-transmitting members 18a and 18b at opposite side to the processing chamber 1 to make direct contact with the heating sources 17a and 17b and made of a material of high thermal conductivity; and a cooling mechanism for cooling the cooling members 4a and 4b with a coolant.Type: ApplicationFiled: July 17, 2012Publication date: November 8, 2012Applicant: TOKYO ELECTRON LIMITEDInventors: Shigeru KASAI, Hiroyuki MIYASHITA, Masatake YONEDA, Tomohiro SUZUKI, Sumi TANAKA, Masamichi NOMURA, Miwa SHIMIZU
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Patent number: 8299671Abstract: A rotary floater (30) for supporting an object to be processed (W) is floated by the magnetic attraction of a floating electromagnet assembly (F), and the rotary floater (30) is rotated by the magnetic attraction of a rotary electromagnet assembly (R) while its horizontal position being controlled by the magnetic attraction of a positioning electromagnet assembly (H). The floating electromagnet assembly (F) causes the magnetic attraction to act vertically upwardly, so that the rotary floater (30) is floated and suspended without contact with the inner wall of a processing container (2).Type: GrantFiled: May 29, 2008Date of Patent: October 30, 2012Assignee: Tokyo Electron LimitedInventors: Masamichi Nomura, Kenjiro Koizumi, Shigeru Kasai
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Patent number: 8246900Abstract: Provided is an annealing apparatus, which is free from a problem of reduced light energy efficiency resulted by the reduction of light emission amount due to a heat generation and capable of maintaining stable performance. The apparatus includes: a processing chamber 1 for accommodating a wafer W; heating sources 17a and 17b including LEDs 33 and facing the surface of the wafer W to irradiate light on the wafer W; light-transmitting members 18a and 18b arranged in alignment with the heating sources 17a and 17b to transmit the light emitted from the LEDs 33; cooling members 4a and 4b supporting the light-transmitting members 18a and 18b at opposite side to the processing chamber 1 to make direct contact with the heating sources 17a and 17b and made of a material of high thermal conductivity; and a cooling mechanism for cooling the cooling members 4a and 4b with a coolant.Type: GrantFiled: August 31, 2007Date of Patent: August 21, 2012Assignee: Tokyo Electron LimitedInventors: Shigeru Kasai, Hiroyuki Miyashita, Masatake Yoneda, Tomohiro Suzuki, Sumi Tanaka, Masamichi Nomura, Miwa Shimizu
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Publication number: 20120118504Abstract: A processing apparatus for performing a process on an object includes a chamber; a rotary floater for supporting the object on its upper end side; XY rotating attraction bodies provided in the rotary floater at an interval circumferentially; a floating attraction body provided in the rotary floater to extend circumferentially; a floating electromagnet group for floating the rotary floater while adjusting an inclination of the rotary floater by applying a vertically upward acting magnetic attraction to the floating attraction body; an XY rotating electromagnet group for rotating the rotary floater while adjusting a horizontal position of the rotary floater by applying a magnetic attraction force to the XY rotating attraction bodies; a gas supply for supplying a gas into the chamber; a mechanism for performing a process on the object; and an apparatus control unit for controlling an entire operation of the apparatus.Type: ApplicationFiled: July 21, 2010Publication date: May 17, 2012Applicant: TOKYO ELECTRON LIMITEDInventors: Masamichi Nomura, Kenjiro Koizumi, Shigeru Kasai, Sumi Tanaka
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Publication number: 20100164315Abstract: A rotary floater (30) for supporting an object to be processed (W) is floated by the magnetic attraction of a floating electromagnet assembly (F), and the rotary floater (30) is rotated by the magnetic attraction of a rotary electromagnet assembly (R) while its horizontal position being controlled by the magnetic attraction of a positioning electromagnet assembly (H). The floating electromagnet assembly (F) causes the magnetic attraction to act vertically upwardly, so that the rotary floater (30) is floated and suspended without contact with the inner wall of a processing container (2).Type: ApplicationFiled: May 29, 2008Publication date: July 1, 2010Applicant: TOKYO ELECTRON LIMITEDInventors: Masamichi Nomura, Kenjiro Koizumi, Shigeru Kasai
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Publication number: 20100038833Abstract: Provided is an annealing apparatus, which is free from a problem of reduced light energy efficiency resulted by the reduction of light emission amount due to a heat generation and capable of maintaining stable performance. The apparatus includes: a processing chamber 1 for accommodating a wafer W; heating sources 17a and 17b including LEDs 33 and facing the surface of the wafer W to irradiate light on the wafer W; light-transmitting members 18a and 18b arranged in alignment with the heating sources 17a and 17b to transmit the light emitted from the LEDs 33; cooling members 4a and 4b supporting the light-transmitting members 18a and 18b at opposite side to the processing chamber 1 to make direct contact with the heating sources 17a and 17b and made of a material of high thermal conductivity; and a cooling mechanism for cooling the cooling members 4a and 4b with a coolant.Type: ApplicationFiled: August 31, 2007Publication date: February 18, 2010Applicant: TOKYO ELECTRON LIMITEDInventors: Shigeru Kasai, Hiroyuki Miyashita, Masatake Yoneda, Tomohiro Suzuki, Sumi Tanaka, Masamichi Nomura, Miwa Shimizu
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Patent number: 6121579Abstract: A heat treating apparatus comprises a process chamber within which a wafer is subjected to a heat treatment. A supporting plate for supporting the wafer is arranged within the process chamber. A process gas is supplied from above into the process chamber. A main heating means for heating the wafer is arranged below the process chamber, with a transmitting window interposed therebetween. The main heating means includes a plurality of heating sources for irradiating the supporting plate with heat rays so as to heat the wafer indirectly and a rotatable table having the heating sources arranged on the front surface thereof. The heat treating apparatus also comprises an auxiliary heating means for compensating for an uneven temperature caused on the surface of the wafer by the main heating means.Type: GrantFiled: February 27, 1997Date of Patent: September 19, 2000Assignee: Tokyo Electron LimitedInventors: Kazutsugu Aoki, Wataru Okase, Hironori Yagi, Masamichi Nomura