Abstract: A method for starting up a hot ultrapure water production system that produces hot ultrapure water by heating ultrapure water to a supply water temperature, for supplied to a point of use, the method involving: alternately passing heated water and cooled water through a hot ultrapure water pipe through which the hot ultrapure water flows, the heated water being obtained by heating the ultrapure water to a temperature higher than room temperature and the cooled water being obtained by cooling the ultrapure water to a temperature lower than the temperature of the heated water in a range of from room temperature to the supply water temperature.

Abstract: A method of detecting an endotoxin of detecting an endotoxin from a test subject sample using a fluorescent substance having a structure in which a fluorescent site and a recognition site are connected by a spacer, wherein the recognition site recognizes a specific site of a molecular structure of an endotoxin.

Abstract: A method for starting up a hot ultrapure water production system that produces hot ultrapure water by heating ultrapure water to a supply water temperature, for supplied to a point of use, the method involving: alternately passing heated water and cooled water through a hot ultrapure water pipe through which the hot ultrapure water flows, the heated water being obtained by heating the ultrapure water to a temperature higher than room temperature and the cooled water being obtained by cooling the ultrapure water to a temperature lower than the temperature of the heated water in a range of from room temperature to the supply water temperature.

Abstract: A chelate complex is removed from a chemical which is used in a semiconductor production process and contains a compound having a chelating ability, and the cleaning load is also reduced. Specifically disclosed is a method for purifying a chemical which is used in a semiconductor production process and contains a compound having a chelating ability, wherein a chelate complex which is formed from impurity metals such as nickel and copper contained in an alkaline chemical is removed from the chemical by treating the alkaline chemical with an organic complex adsorbing material.

Abstract: Foreign substances which are not inherently contained in a polishing slurry are selectively separated and removed from a polishing slurry component comprised of abrasives, a solvent and an additive which are inherently contained in the polishing slurry.

Abstract: Foreign substances which are not inherently contained in a polishing slurry are selectively separated and removed from a polishing slurry component comprised of abrasives, a solvent and an additive which are inherently contained in the polishing slurry.

Abstract: A method for quantitative determination of nickel and/or copper, by which an ultratrace amount of nickel and/or copper contained in a liquid sample can be easily and simply determined in situ; and apparatus to be used in the method. The method comprises a step of adding a complex-forming agent capable of forming a complex with nickel and copper to a liquid sample containing nickel and/or copper in unknown concentrations to form colored fine particles of a nickel complex and/or a copper complex and a step of determining the quantities of nickel and/or copper on the basis of the colored fine particles.

Abstract: A chelate complex is removed from a chemical which is used in a semiconductor production process and contains a compound having a chelating ability, and the cleaning load is also reduced. Specifically disclosed is a method for purifying a chemical which is used in a semiconductor production process and contains a compound having a chelating ability, wherein a chelate complex which is formed from impurity metals such as nickel and copper contained in an alkaline chemical is removed from the chemical by treating the alkaline chemical with an organic complex adsorbing material.