Patents by Inventor Masamitsu Iiyama

Masamitsu Iiyama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250091925
    Abstract: A production method for water for pure water includes adding polyaluminum chloride to raw water to produce first treated water, and filtering the first treated water in two or more stages including filtering with a filtration membrane device in a preceding stage to produce first concentrated water, and filtering the first concentrated water with a filtration membrane device in a subsequent stage. The water for pure water is produced as permeated water produced by the filtering in the two or more stages.
    Type: Application
    Filed: August 30, 2024
    Publication date: March 20, 2025
    Applicant: Nomura Micro Science Co., Ltd.
    Inventors: Masamitsu IIYAMA, Hiroki MIYAZAWA, Yoshihiro AKIMOTO
  • Publication number: 20250051198
    Abstract: A method and apparatus for producing water for pure water, the method and apparatus capable of efficiently adding agents to water to be supplied to a reverse osmosis membrane. The method for producing water for pure water includes: obtaining first treated water by adding a polyaluminum chloride to raw water containing free chlorine; obtaining second treated water by adding a reducing agent containing sodium disulfite as an active ingredient to the first treated water; and treating the second treated water with a reverse osmosis membrane.
    Type: Application
    Filed: August 2, 2024
    Publication date: February 13, 2025
    Applicant: Nomura Micro Science Co., Ltd.
    Inventors: Hiroki MIYAZAWA, Yoshihiro AKIMOTO, Yuya HIRAHARA, Masamitsu IIYAMA
  • Publication number: 20240167996
    Abstract: A test substance detection method includes: a step A in which a sample containing a test substance and water, a compound having a structure in which a response site and a recognition site are connected via a spacer, and a surfactant are added; and a step B in which the recognition site and the test substance interact and a response at the response site arising from the interaction is detected. Further, also provided are: a purified water production method and an injection water production method both using the foregoing; a detection agent composition containing a compound represented by Formula (1) and a surfactant; and a detection apparatus, a purified water production facility, and an injection water production facility, all using the foregoing.
    Type: Application
    Filed: March 4, 2022
    Publication date: May 23, 2024
    Applicants: Nomura Micro Science Co., Ltd., Sophia School Corporation
    Inventors: Hiroshi KIMOTO, Masamitsu IIYAMA, Yu EBISAWA, Takeshi HASHIMOTO, Takashi HAYASHITA
  • Patent number: 11926536
    Abstract: A method for starting up a hot ultrapure water production system that produces hot ultrapure water by heating ultrapure water to a supply water temperature, for supplied to a point of use, the method involving: alternately passing heated water and cooled water through a hot ultrapure water pipe through which the hot ultrapure water flows, the heated water being obtained by heating the ultrapure water to a temperature higher than room temperature and the cooled water being obtained by cooling the ultrapure water to a temperature lower than the temperature of the heated water in a range of from room temperature to the supply water temperature.
    Type: Grant
    Filed: July 29, 2022
    Date of Patent: March 12, 2024
    Assignee: Nomura Micro Science Co., Ltd.
    Inventor: Masamitsu Iiyama
  • Publication number: 20230243749
    Abstract: A method of detecting an endotoxin of detecting an endotoxin from a test subject sample using a fluorescent substance having a structure in which a fluorescent site and a recognition site are connected by a spacer, wherein the recognition site recognizes a specific site of a molecular structure of an endotoxin.
    Type: Application
    Filed: May 18, 2021
    Publication date: August 3, 2023
    Applicants: Nomura Micro Science Co., Ltd., Sophia School Corporation
    Inventors: Hiroshi KIMOTO, Masamitsu IIYAMA, Takeshi HASHIMOTO, Takashi HAYASHITA
  • Publication number: 20230135621
    Abstract: A method for starting up a hot ultrapure water production system that produces hot ultrapure water by heating ultrapure water to a supply water temperature, for supplied to a point of use, the method involving: alternately passing heated water and cooled water through a hot ultrapure water pipe through which the hot ultrapure water flows, the heated water being obtained by heating the ultrapure water to a temperature higher than room temperature and the cooled water being obtained by cooling the ultrapure water to a temperature lower than the temperature of the heated water in a range of from room temperature to the supply water temperature.
    Type: Application
    Filed: July 29, 2022
    Publication date: May 4, 2023
    Applicant: Nomura Micro Science Co., Ltd.
    Inventor: Masamitsu IIYAMA
  • Patent number: 8278219
    Abstract: A chelate complex is removed from a chemical which is used in a semiconductor production process and contains a compound having a chelating ability, and the cleaning load is also reduced. Specifically disclosed is a method for purifying a chemical which is used in a semiconductor production process and contains a compound having a chelating ability, wherein a chelate complex which is formed from impurity metals such as nickel and copper contained in an alkaline chemical is removed from the chemical by treating the alkaline chemical with an organic complex adsorbing material.
    Type: Grant
    Filed: November 30, 2007
    Date of Patent: October 2, 2012
    Assignee: Nomura Micro Science Co., Ltd.
    Inventors: Masamitsu Iiyama, Mitsugu Abe
  • Patent number: 8202429
    Abstract: Foreign substances which are not inherently contained in a polishing slurry are selectively separated and removed from a polishing slurry component comprised of abrasives, a solvent and an additive which are inherently contained in the polishing slurry.
    Type: Grant
    Filed: August 12, 2009
    Date of Patent: June 19, 2012
    Assignee: Nomura Micro Science Co., Ltd.
    Inventors: Mitsugu Abe, Masamitsu Iiyama
  • Publication number: 20100163487
    Abstract: Foreign substances which are not inherently contained in a polishing slurry are selectively separated and removed from a polishing slurry component comprised of abrasives, a solvent and an additive which are inherently contained in the polishing slurry.
    Type: Application
    Filed: August 12, 2009
    Publication date: July 1, 2010
    Inventors: Mitsugu ABE, Masamitsu Iiyama
  • Publication number: 20100087007
    Abstract: A method for quantitative determination of nickel and/or copper, by which an ultratrace amount of nickel and/or copper contained in a liquid sample can be easily and simply determined in situ; and apparatus to be used in the method. The method comprises a step of adding a complex-forming agent capable of forming a complex with nickel and copper to a liquid sample containing nickel and/or copper in unknown concentrations to form colored fine particles of a nickel complex and/or a copper complex and a step of determining the quantities of nickel and/or copper on the basis of the colored fine particles.
    Type: Application
    Filed: November 26, 2007
    Publication date: April 8, 2010
    Inventors: Hitoshi Mizuguchi, Junichi Shida, Masamitsu Iiyama, Mitsugu Abe
  • Publication number: 20100078589
    Abstract: A chelate complex is removed from a chemical which is used in a semiconductor production process and contains a compound having a chelating ability, and the cleaning load is also reduced. Specifically disclosed is a method for purifying a chemical which is used in a semiconductor production process and contains a compound having a chelating ability, wherein a chelate complex which is formed from impurity metals such as nickel and copper contained in an alkaline chemical is removed from the chemical by treating the alkaline chemical with an organic complex adsorbing material.
    Type: Application
    Filed: November 30, 2007
    Publication date: April 1, 2010
    Inventors: Masamitsu Iiyama, Mitsugu Abe