Patents by Inventor Masanaga Fukusawa

Masanaga Fukusawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Plasma treatment method, plasma treatment apparatus, and semiconductor device manufacturing method
    Patent number: 10074517
    Abstract: A plasma treatment method includes: creating a plasma from a mixed gas containing carbon and nitrogen to generate CN active species, and treating a surface of a semiconductor substrate with the CN active species.
    Type: Grant
    Filed: July 7, 2012
    Date of Patent: September 11, 2018
    Assignee: SONY CORPORATION
    Inventors: Nobuyuki Kuboi, Masanaga Fukusawa
  • PLASMA TREATMENT METHOD, PLASMA TREATMENT APPARATUS, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD
    Publication number: 20130017672
    Abstract: A plasma treatment method includes: creating a plasma from a mixed gas containing carbon and nitrogen to generate CN active species, and treating a surface of a semiconductor substrate with the CN active species.
    Type: Application
    Filed: July 7, 2012
    Publication date: January 17, 2013
    Applicant: SONY CORPORATION
    Inventors: Nobuyuki Kuboi, Masanaga Fukusawa