Abstract: A mass analyzer includes two rotating electric field (REF) units, sinusoidal signal generators and a means for separation of dispersed ions. The REF units include a plurality of elongated electrodes surrounding a central axis, and are lined in tandem at elongated direction. Sinusoidal signals are applied to the electrodes to rotate electric fields within each REF unit. The means for separation is placed adjacent the downstream end of the 2nd REF unit. Ions enter the 1st REF unit, diverge outwards and leave the 1st REF unit on off-axis positions. The ions successively enter the 2nd REF unit and converge inwards because of 180 degrees phase difference from the 1st REF unit. Specified mass ions return to and travel along the central axis. However, unspecified mass ions deviate from the central axis and travel apart from the central axis. The means for separation separates specified ions from unspecified ions.

Abstract: A mass analyzer includes two rotating electric field (REF) units, sinusoidal signal generators and a means for separation of dispersed ions. The REF units include a plurality of elongated electrodes surrounding a central axis, and are lined in tandem at elongated direction. Sinusoidal signals are applied to the electrodes to rotate electric fields within each REF unit. The means for separation is placed adjacent the downstream end of the 2nd REF unit. Ions enter the 1st REF unit, diverge outwards and leave the 1st REF unit on off-axis positions. The ions successively enter the 2nd REF unit and converge inwards because of 180 degrees phase difference from the 1st REF unit. Specified mass ions return to and travel along the central axis. However, unspecified mass ions deviate from the central axis and travel apart from the central axis. The means for separation separates specified ions from unspecified ions.

Abstract: In an electron beam lithography system, an outputted main signal is applied directly to deflection plates, whereas an outputted auxiliary signal is applied to the deflection plate through a capacitive coupling for writing a wide strip-like pattern accurately at a high speed. In the electron beam lithography system, a deflection signal is divided into a main signal having a low frequency and a large amplitude and an auxiliary signal having a high frequency and a small amplitude. The main signal is applied directly to deflection plates, and the auxiliary signal is applied to the deflection plate through a capacitor.

Abstract: In an electron beam lithography system, an outputted main signal is applied directly to deflection plates, whereas an outputted auxiliary signal is applied to the deflection plate through a capacitive coupling for thereby writing a wide strip-like pattern accurately at a high speed.

Abstract: A plasma generating device comprises:a rectangular wave guide for transmitting microwaves, wherein the width of the plasma generating device is decreased in the direction of an electrical field of the microwaves; a plasma generating chamber wherein plasma is generated by absorbing, in a gas, microwave energy transmitted by the rectangular wave guide, and a part of the plasma generating chamber has a rectangular cross-section taken along the plane perpendicular to the microwave propagation direction. A magnetic field generating device is provided having the same axial direction as the direction of propagation of the microwaves and applies a magnetic field having an Electron Cyclotron Resonance intensity to the plasma generating chamber.