Patents by Inventor Masanao Kamachi

Masanao Kamachi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10770224
    Abstract: An object of the present invention is to provide a novel method for forming an electrolytic copper plating film having excellent adhesion on the surface of a rare earth metal-based permanent magnet. The method of the present invention as a means for achieving the object is characterized in that after a magnet is immersed in a plating solution, a cathode current density of 0.05 A/dm2 to 4.0 A/dm2 for performing an electrolytic copper plating treatment is applied thereto over 10 seconds to 180 seconds to start the treatment.
    Type: Grant
    Filed: June 27, 2018
    Date of Patent: September 8, 2020
    Assignee: HITACHI METALS, LTD.
    Inventors: Masanao Kamachi, Koshi Yoshimura
  • Publication number: 20180350519
    Abstract: An object of the present invention is to provide a novel method for forming an electrolytic copper plating film having excellent adhesion on the surface of a rare earth metal-based permanent magnet. The method of the present invention as a means for achieving the object is characterized in that after a magnet is immersed in a plating solution, a cathode current density of 0.05 A/dm2 to 4.0 A/dm2 for performing an electrolytic copper plating treatment is applied thereto over 10 seconds to 180 seconds to start the treatment.
    Type: Application
    Filed: June 27, 2018
    Publication date: December 6, 2018
    Applicant: Hitachi Metals, Ltd.
    Inventors: Masanao KAMACHI, Koshi YOSHIMURA
  • Publication number: 20180096762
    Abstract: A sintered R-TM-B magnet comprising 24.5-34.5% by mass of R, wherein R is at least one selected from rare earth elements including Y, 0.92-1.15% by mass of B, less than 0.1% by mass of Ni, 0.07-0.5% by mass of Ga, 0-0.4% by mass of Cu, and inevitable impurities, the balance being Fe; the amounts (% by mass) of Ga and Cu being in a region of a pentagon defined by a point A (0.5, 0.0), a point B (0.5, 0.4), a point C? (0.1, 0.4), a point D? (0.1, 0.1) and a point E (0.2, 0.0), on an X-Y plane in which the X-axis represents the amount of Ga, and the Y-axis represents the amount of Cu.
    Type: Application
    Filed: September 29, 2017
    Publication date: April 5, 2018
    Applicant: HITACHI METALS, LTD.
    Inventors: Daisuke YAMAMICHI, Masanao KAMACHI, Rintaro ISHII, Takahiro KATOU
  • Publication number: 20180025818
    Abstract: A sintered R-TM-B magnet comprising 24.5-34.5% by mass of R, which is at least one selected from rare earth elements including Y, 0.85-1.15% by mass of B, less than 0.1% by mass of Co, 0.07-0.5% by mass of Ga, and 0-0.4% by mass of Cu, the balance being Fe and inevitable impurities; the amounts (% by mass) of Ga and Cu being in a region of a pentagon defined by a point A (0.5, 0.0), a point B (0.5, 0.4), a point C (0.07, 0.4), a point D (0.07, 0.1) and a point E (0.2, 0.0), on an X-Y plane in which the X-axis represents the amount of Ga, and the Y-axis represents the amount of Cu.
    Type: Application
    Filed: March 22, 2016
    Publication date: January 25, 2018
    Applicant: HITACHI METALS, LTD.
    Inventors: Daisuke YAMAMICHI, Masanao KAMACHI, Rintaro ISHII, Takahiro KATOU
  • Patent number: 9873953
    Abstract: A method for removing rare earth impurities from a nickel-electroplating solution by adding a rare earth compound to the nickel-electroplating solution containing rare earth impurities, keeping the electroplating solution at 60° C. or higher for a certain period of time, and then removing precipitate generated by the heating from the nickel-electroplating solution together with the added rare earth compound by sedimentation and/or filtration.
    Type: Grant
    Filed: March 17, 2014
    Date of Patent: January 23, 2018
    Assignee: HITACHI METALS, LTD.
    Inventor: Masanao Kamachi
  • Patent number: 9771664
    Abstract: A method for removing rare earth impurities from a nickel-electroplating solution by keeping a nickel-electroplating solution containing rare earth impurities and having pH of 4.0-5.1 at 60° C. or higher for a certain period of time, and then removing precipitate generated by the heating from the nickel-electroplating solution by sedimentation and/or filtration.
    Type: Grant
    Filed: March 17, 2014
    Date of Patent: September 26, 2017
    Assignee: HITACHI METALS, LTD.
    Inventor: Masanao Kamachi
  • Patent number: 9695524
    Abstract: [Object] When rare earth magnets are plated, components of the rare earth magnets are dissolved in the plating solution, causing plating defects. Thus, an easy method for removing rare earth impurities has been necessary. [Means for Solution] A nickel-electroplating solution containing rare earth impurities is kept at 60° C. or higher for a predetermined period of time to precipitate rare earth impurities for separation by sedimentation or filtration. Rare earth impurities can be precipitated further efficiently by adding precipitate to the nickel-electroplating solution, or by concentrating the nickel-electroplating solution by heating.
    Type: Grant
    Filed: September 21, 2012
    Date of Patent: July 4, 2017
    Assignee: HITACHI METALS, LTD.
    Inventor: Masanao Kamachi
  • Patent number: 9275794
    Abstract: An object of the present invention is to provide an R—Fe—B based sintered magnet that exhibits excellent corrosion resistance and maintains excellent adhesion strength to an adherend even under severe conditions, and a method for producing the same. A corrosion-resistant magnet of the present invention as a means for achieving the object is characterized by comprising a chemical conversion film containing at least Zr, V, Al, fluorine, and oxygen as constituent elements and not containing phosphorus over a surface of an R—Fe—B based sintered magnet with a film made of Al or an alloy thereof therebetween.
    Type: Grant
    Filed: July 30, 2009
    Date of Patent: March 1, 2016
    Assignee: HITACHI METALS, LTD.
    Inventors: Atsushi Kikugawa, Koshi Yoshimura, Yoshimi Tochishita, Masanao Kamachi, Nobuhiro Misumi
  • Patent number: 9267217
    Abstract: An object of the present invention is to provide a production method for an R—Fe—B based sintered magnet having a plating film excellent in adhesiveness on the surface thereof, by conducting a series of processes of acid cleaning and smut removal as pretreatments of an R—Fe—B based sintered magnet, and the subsequent plating treatment effectively without causing trouble. The production method of the present invention includes a series of processes of acid cleaning and smut removal of a magnet as pretreatments, and the subsequent plating treatment is conducted consistently with a state, in which the magnet is placed in a barrel made of synthetic resin. The smut removal is conducted by ultrasonic cleaning of the magnet with rotating the barrel in water in which the dissolved oxygen amount is set to 0.1 ppm to 6 ppm by degassing.
    Type: Grant
    Filed: January 4, 2012
    Date of Patent: February 23, 2016
    Assignee: HITACHI METALS, LTD.
    Inventors: Masanao Kamachi, Koshi Yoshimura, Takahiro Isozaki
  • Publication number: 20160002815
    Abstract: A method for removing rare earth impurities from a nickel-electroplating solution by keeping a nickel-electroplating solution containing rare earth impurities and having pH of 4.0-5.1 at 60° C. or higher for a certain period of time, and then removing precipitate generated by the heating from the nickel-electroplating solution by sedimentation and/or filtration.
    Type: Application
    Filed: March 17, 2014
    Publication date: January 7, 2016
    Applicant: HITACHI METALS, LTD.
    Inventor: Masanao KAMACHI
  • Publication number: 20160002814
    Abstract: A method for removing rare earth impurities from a nickel-electroplating solution by adding a rare earth compound to the nickel-electroplating solution containing rare earth impurities, keeping the electroplating solution at 60° C. or higher for a certain period of time, and then removing precipitate generated by the heating from the nickel-electroplating solution together with the added rare earth compound by sedimentation and/or filtration.
    Type: Application
    Filed: March 17, 2014
    Publication date: January 7, 2016
    Applicant: HITACHI METALS, LTD.
    Inventor: Masanao KAMACHI
  • Publication number: 20140224664
    Abstract: [Object] When rare earth magnets are plated, components of the rare earth magnets are dissolved in the plating solution, causing plating defects. Thus, an easy method for removing rare earth impurities has been necessary. [Means for Solution] A nickel-electroplating solution containing rare earth impurities is kept at 60° C. or higher for a predetermined period of time to precipitate rare earth impurities for separation by sedimentation or filtration. Rare earth impurities can be precipitated further efficiently by adding precipitate to the nickel-electroplating solution, or by concentrating the nickel-electroplating solution by heating.
    Type: Application
    Filed: September 21, 2012
    Publication date: August 14, 2014
    Applicant: HITACHI METALS, LTD.
    Inventor: Masanao Kamachi
  • Publication number: 20130313125
    Abstract: An object of the present invention is to provide a production method for an R—Fe—B based sintered magnet having a plating film excellent in adhesiveness on the surface thereof, by conducting a series of processes of acid cleaning and smut removal as pretreatments of a plating treatment of an R—Fe—B based sintered magnet, and the subsequent plating treatment, effectively without requiring troubles. The production method for an R—Fe—B based sintered magnet having a plating film on the surface thereof of the present invention, as a solution method therefor, is characterized in that a series of processes of acid cleaning and smut removal of a magnet as pretreatments of a plating treatment, and the subsequent plating treatment is conducted consistently with a state, in which the magnet is placed in a barrel made of synthetic resin, and that the smut removal is conducted by ultrasonic cleaning of the magnet with rotating the barrel in water in which the dissolved oxygen amount is set to 0.
    Type: Application
    Filed: January 4, 2012
    Publication date: November 28, 2013
    Applicant: HITACHI METALS, LTD.
    Inventors: Masanao Kamachi, Koshi Yoshimura, Takahiro Isozaki
  • Publication number: 20130180860
    Abstract: An object of the present invention is to provide a novel method for forming an electrolytic copper plating film having excellent adhesion on the surface of a rare earth metal-based permanent magnet. The method of the present invention as a means for achieving the object is characterized in that after a magnet is immersed in a plating solution, a cathode current density of 0.05 A/dm2 to 4.0 A/dm2 for performing an electrolytic copper plating treatment is applied thereto over 10 seconds to 180 seconds to start the treatment.
    Type: Application
    Filed: September 29, 2011
    Publication date: July 18, 2013
    Applicant: Hitachi Metals,Ltd.
    Inventors: Masanao Kamachi, Koshi Yoshimura
  • Patent number: 8163106
    Abstract: An R—Fe—B sinlered magnet having on the surface thereof a vapor deposited film of aluminum or an alloy thereof and a method for producing the same. The vapor deposited film of aluminum or an alloy thereof comprises a columnar crystalline structure grown broader from the surface of the R—Fe—B sintered magnet body outward to the outer surface, which has a part within a region defined in the thickness direction of the film as taken from the surface of the R—Fe—B sintered magnet to ? of the film thickness, 5 to 30 intercrystalline gaps of 0.01 ?m to 1 ?m in width as counted per 10 ?m length in the lateral direction of the film. The method comprises controlling the average film formation rate such that it is slower up to a predetermined point and then is speeded up later thereon.
    Type: Grant
    Filed: May 9, 2008
    Date of Patent: April 24, 2012
    Assignee: Hitachi Metals, Ltd.
    Inventors: Atsushi Kikugawa, Koshi Yoshimura, Yoshimi Tochishita, Masanao Kamachi, Nobuhiro Misumi
  • Publication number: 20110273252
    Abstract: An object of the present invention is to provide an R—Fe—B based sintered magnet that exhibits excellent corrosion resistance and maintains excellent adhesion strength to an adherend even under severe conditions, and a method for producing the same. A corrosion-resistant magnet of the present invention as a means for achieving the object is characterized by comprising a chemical conversion film containing at least Zr, V, Al, fluorine, and oxygen as constituent elements and not containing phosphorus over a surface of an R—Fe—B based sintered magnet with a film made of Al or an alloy thereof therebetween.
    Type: Application
    Filed: July 30, 2009
    Publication date: November 10, 2011
    Applicant: HITACHI METALS, LTD.
    Inventors: Atsushi Kikugawa, Koshi Yoshimura, Yoshimi Tochishita, Masanao Kamachi, Nobuhiro Misumi
  • Publication number: 20100295644
    Abstract: An objective of the present invention is to provide an R—Fe—B based sintered magnet having on the surface thereof a vapor deposited film of aluminum or an alloy thereof, which maintains excellent adhesion strength with the adhered object even after subjecting it to a severe heat cycle test, and a method for producing the same. As a means for solving the problems, an R—Fe—B based sintered magnet having on the surface thereof a vapor deposited film of aluminum or an alloy thereof of the present invention is characterized in that the vapor deposited film of aluminum or an alloy thereof comprises a columnar crystalline structure grown broader from the surface of the bulk magnet body outward to the outer surface, which has a part within a region defined in the thickness direction of the film as taken from the surface of the bulk magnet body to ? of the film thickness, 5 to 30 intercrystalline gaps of 0.01 ?m to 1 ?m in width as counted per 10 ?m length in the lateral direction of the film are existing at the part.
    Type: Application
    Filed: May 9, 2008
    Publication date: November 25, 2010
    Applicant: HITACHI METALS, LTD.
    Inventors: Atsushi Kikugawa, Koshi Yoshimura, Yoshimi Tochishita, Masanao Kamachi, Nobuhiro Misumi