Abstract: There is provided a chloroprene copolymer latex composition capable of obtaining a molded product having excellent mechanical properties and flexibility even when vulcanized and molded under milder conditions than before. A chloroprene copolymer latex composition contains a chloroprene copolymer latex (A), a metal oxide (B), a vulcanization accelerator (C), and an antioxidant (D). The chloroprene copolymer latex (A) is a latex containing particles of a chloroprene copolymer which is a copolymer of chloroprene (A-1), 2,3-dichloro-1,3-butadiene (A-2), and sulfur (A-3). The content of the sulfur (A-3) in the chloroprene copolymer is 0.1 part by mass or more and 1.0 part by mass or less when the total amount of the chloroprene (A-1) and the 2,3-dichloro-1,3-butadiene (A-2) is set to 100 parts by mass.

Abstract: A sulfur-modified chloroprene polymer latex includes an emulsifier and a sulfur-modified chloroprene polymer obtained by modifying a chloroprene polymer (A) with sulfur (B), wherein the sulfur amount Y in the sulfur-modified chloroprene polymer and the z-average particle size X of the sulfur-modified chloroprene polymer satisfy formulae (1) to (3) (formula (1): 0.10<Y<0.60; formula (2): 120<X<320; and formula (3): Y<0.0025X?0.20), the total amount of a chloroprene monomer (A-1) and a monomer (A-2) copolymerizable with the chloroprene monomer which constitute the chloroprene polymer is 100 parts by mass, the amount of sulfur (B) contained in the sulfur-modified chloroprene polymer is Y parts by mass, and the z-average particle size of the sulfur-modified chloroprene polymer is X nm. The sulfur-modified chloroprene polymer latex composition can also include a metal oxide (C), a cross-linking accelerator (D), and an antioxidant (E).

Abstract: An isoprene-based polymer latex composition includes a chloroprene polymer latex (A) and an isoprene polymer latex (B), in which the chloroprene polymer has a z-average particle size of 180 nm or greater and smaller than 300 nm, and a tetrahydrofuran-insoluble fraction of 80 to 99% by mass; the chloroprene polymer latex (A) is (1) a copolymer latex of chloroprene (A-1) and 2,3-dichloro-1,3-butadiene (A-2-1), or (2) a copolymer latex of the above (A-1) and (A-2-1), and another monomer (A-2-2); and the copolymer is obtained by copolymerization in which the ratio of 2,3-dichloro-1,3-butadiene (A-2-1) is 5.0 to 30.0% by mass relative to the total amount of the monomer components chloroprene (A-1) and 2,3-dichloro-1,3-butadiene (A-2-1) of 100% by mass. The isoprene-based polymer latex composition's quality is maintained, and the properties after cross-linking of a molded product obtained by dipping a dipping former into the composition multiple times do not deteriorate.

Abstract: A method for producing a chloroprene graft copolymer latex includes a step of adding an ethylenic double bond-containing silane coupling agent (B) to a chloroprene polymer latex and graft copolymerizing the ethylenic double bond-containing silane coupling agent (B) to the chloroprene polymer (A) in the chloroprene polymer latex at 10° C. to 50° C. (inclusive). The amount of the ethylenic double bond-containing silane coupling agent (B) added is 0.4 parts by mass to 9.0 parts by mass (inclusive) per 100 parts by mass of the chloroprene polymer (A). The present invention also relates to an adhesive containing the chloroprene graft copolymer latex and to a method for using the adhesive. The present invention can provide a method for producing a chloroprene graft copolymer latex containing no organic solvent and having high adhesive strength to glass, an adhesive containing the same, and a method for using the adhesive.

Abstract: The present invention relates to a method for producing a chloroprene polymer latex, comprising: adding (B) a sodium. salt of a naphthalene sulfonate formaldehyde condensate and. (C) sodium dodecylbenzenesulfonate to a monomer solution that contains (A-1) 2-chloro-1,3-butadiene (chloroprene) or a monomer solution that contains (A-1) 2-chloro-1,3-butadiene (chloroprene) and (A-2-1) 2,3-dichloro-1,3-butadiene, and performing polymerization. Consequently, the present invention enables the production of a chloroprene polymer latex which is suppressed in aggregates that are generated during the production of a chloroprene polymer latex having a high solid content.

Abstract: There is provided a chloroprene copolymer latex composition capable of obtaining a molded product having excellent mechanical properties and flexibility even when vulcanized and molded under milder conditions than before. A chloroprene copolymer latex composition contains a chloroprene copolymer latex (A), a metal oxide (B), a vulcanization accelerator (C), and an antioxidant (D). The chloroprene copolymer latex (A) is a latex containing particles of a chloroprene copolymer which is a copolymer of chloroprene (A-1), 2,3-dichloro-1,3-butadiene (A-2), and sulfur (A-3). The content of the sulfur (A-3) in the chloroprene copolymer is 0.1 part by mass or more and 1.0 part by mass or less when the total amount of the chloroprene (A-1) and the 2,3-dichloro-1,3-butadiene (A-2) is set to 100 parts by mass.

Abstract: Provided is a method for producing a chloroprene graft copolymer latex containing no organic solvent and exhibiting high adhesive strength even for soft polyvinyl chloride. A method for producing a chloroprene graft copolymer latex includes a chloroprene polymerization step of giving a chloroprene polymer latex and a graft copolymerization step of giving a chloroprene graft copolymer latex. The chloroprene polymerization step is a step of subjecting at least chloroprene (A-1) of chloroprene (A-1) and a monomer (A-2) copolymerizable with chloroprene (A-1) to emulsion radical polymerization. The graft copolymerization step is a step of adding, to the chloroprene polymer latex, a (meth)acrylate (B) and an organic peroxide (C) having an octanol/water partition coefficient of ?2.0 or more and 3.0 or less to subject the chloroprene polymer to graft copolymerization with the (meth)acrylate (B) at a temperature of 10° C. or more and 40° C. or less.

Abstract: Provided is a method for producing a chloroprene graft copolymer latex containing no organic solvent and exhibiting high adhesive strength even for soft polyvinyl chloride. A method for producing a chloroprene graft copolymer latex includes a chloroprene polymerization step of giving a chloroprene polymer latex and a graft copolymerization step of giving a chloroprene graft copolymer latex. The chloroprene polymerization step is a step of subjecting at least chloroprene (A-1) of chloroprene (A-1) and a monomer (A-2) copolymerizable with chloroprene (A-1) to emulsion radical polymerization. The graft copolymerization step is a step of adding, to the chloroprene polymer latex, a (meth)acrylate (B) and an organic peroxide (C) having an octanol/water partition coefficient of ?2.0 or more and 3.0 or less to subject the chloroprene polymer to graft copolymerization with the (meth)acrylate (B) at a temperature of 10° C. or more and 40° C. or less.

Abstract: There are provided a novel curable polymer compound of the present invention comprises having a structure represented by the following Formula (I): CH2?C(R1)COO(R2O)nCH2CH(OH)CH2OOC— ??Formula (I) wherein R1 represents a hydrogen atom or a methyl group, R2 independently has one or more organic residues selected from the group consisting of an alkylene group, a branched alkylene group, an alkenylene group, a branched alkenylene group, a cycloalkylene group, a cycloalkenylene group and an arylene group, and n represents an integer of 0 to 1, a method of preparing the polymer compound, a radical polymerizable and curable composition using the polymer compound, and a cured product obtained by photo-curing the radical polymerizable and curable composition.

Abstract: The present invention provides a carbon black dispersion composition for a color filter black matrix resist composition, containing (A) a carbon black having specified physical properties (average primary particle diameter, concentration of surface carboxyl groups), (B) a copolymer having an amino group and/or its quaternary ammonium salt, and (C) an organic solvent, and a color filter black matrix resist composition that contains the above-mentioned dispersion composition, (D) a binder resin having a carboxyl group, (E) an ethylenically unsaturated monomer, (F) a photopolymerization initiator, and (G) specified multifunctional thiol compound and can easily form a thin film or pattern having high light-shielding property by photolithographic method pattern, has excellent storage stability, and exhibits sufficient sensitivity and resolution.

Abstract: The present invention relates to (1) a photosensitive composition for color filter black matrix resists, containing (A) a binder resin having a carboxyl group, (B) a compound having an ethylenically unsaturated bond, (C) a photopolymerizing initiator, (D) a thiol compound having two or more mercapto-group-containing groups in which carbon atoms at the a-position and/or n-position with respect to the mercapto group have a substituent, and (E) an organic solvent, and having high sensitivity and excellent storage stability; and (2) color filterblack blackmatrix resist containing (1) the photosensitive composition for color filter black matrix resists and a black pigment (F).

Abstract: The present invention relates to a black resist composition for color filter which contains titanium black (A) with an average primary particle size of 100 nm, carbon black (B) with an average primary particle size of 60 nm or less, an acrylic copolymer dispersant (C) with an amino group and/or a quaternary ammonium salt, an organic solvent (D) and a binder resin (E) with a carboxyl group and an ethylenic unsaturated group, where the ratio in mass between the titanium black (A) and the titanium black (B) is 100:5 to 1000. According to the black resist composition for color filter of the present invention, patterns can readily be formed by photolithography, and the composition has high light resistance and high insulation property, and can be made into a thin film to attain sufficient sensitivity and resolution property.