Patents by Inventor Masanari Kouguchi

Masanari Kouguchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7385198
    Abstract: A method and apparatus for measuring the physical properties of a micro region measures the two-dimensional distribution of stress/strain in real time at high resolution and sensitivity and with a high level of measuring position matching. A sample is scanned and irradiated with a finely focused electron beam (23, 26), and the displacement of position of a diffraction spot (32, 33) is measured by a two-dimensional position-sensitive electron detector (13). The displacement amount is outputted as a voltage value that is then converted into the magnitude of the stress/strain according to the principle of a nano diffraction method, and the magnitude is displayed in synchronism with a sample position signal.
    Type: Grant
    Filed: January 6, 2006
    Date of Patent: June 10, 2008
    Assignee: Hitachi, Ltd.
    Inventors: Yoshifumi Taniguchi, Mikio Ichihashi, Masanari Kouguchi
  • Publication number: 20060113473
    Abstract: A method and apparatus for measuring the physical properties of a micro region measures the two-dimensional distribution of stress/strain in real time at high resolution and sensitivity and with a high level of measuring position matching. A sample is scanned and irradiated with a finely focused electron beam (23, 26), and the displacement of position of a diffraction spot (32, 33) is measured by a two-dimensional position-sensitive electron detector (13). The displacement amount is outputted as a voltage value that is then converted into the magnitude of the stress/strain according to the principle of a nano diffraction method, and the magnitude is displayed in synchronism with a sample position signal.
    Type: Application
    Filed: January 6, 2006
    Publication date: June 1, 2006
    Inventors: Yoshifumi Taniguchi, Mikio Ichihashi, Masanari Kouguchi
  • Patent number: 7022988
    Abstract: A method and apparatus for measuring the physical properties of a micro region measures the two-dimensional distribution of stress/strain in real time at high resolution and sensitivity and with a high level of measuring position matching. A sample is scanned and irradiated with a finely focused electron beam (23, 26), and the displacement of position of a diffraction spot (32, 33) is measured by a two-dimensional position-sensitive electron detector (13). The displacement amount is outputted as a voltage value that is then converted into the magnitude of the stress/strain according to the principle of a nano diffraction method, and the magnitude is displayed in synchronism with a sample position signal.
    Type: Grant
    Filed: February 28, 2001
    Date of Patent: April 4, 2006
    Assignee: Hitachi, Ltd.
    Inventors: Yoshifumi Taniguchi, Mikio Ichihashi, Masanari Kouguchi
  • Publication number: 20040061053
    Abstract: A method and apparatus for measuring the physical properties of a micro region measures the two-dimensional distribution of stress/strain in real time at high resolution and sensitivity and with a high level of measuring position matching. A sample is scanned and irradiated with a finely focused electron beam (23, 26), and the displacement of position of a diffraction spot (32, 33) is measured by a two-dimensional position-sensitive electron detector (13). The displacement amount is outputted as a voltage value that is then converted into the magnitude of the stress/strain according to the principle of a nano diffraction method, and the magnitude is displayed in synchronism with a sample position signal.
    Type: Application
    Filed: August 7, 2003
    Publication date: April 1, 2004
    Inventors: Yoshifumi Taniguchi, Mikio Ichihashi, Masanari Kouguchi