Patents by Inventor Masanari Yamaguchi

Masanari Yamaguchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10044918
    Abstract: The present disclosure relates to a solid-state imaging device, a method for manufacturing the same, and an electronic apparatus capable of improving sensitivity while suppressing degradation of color mixture. The solid-state imaging device includes an anti-reflection portion having a moth-eye structure provided on a boundary surface on a light-receiving surface side of a photoelectric conversion region of each pixel arranged two-dimensionally, and an inter-pixel light-blocking portion provided below the boundary surface of the anti-reflection portion to block incident light. In addition, the photoelectric conversion region is a semiconductor region, and the inter-pixel light-blocking portion has a trench structure obtained by digging the semiconductor region in a depth direction at a pixel boundary. The techniques according to the present disclosure can be applied to, for example, a solid-state imaging device of a rear surface irradiation type.
    Type: Grant
    Filed: September 29, 2017
    Date of Patent: August 7, 2018
    Assignee: Sony Corporation
    Inventors: Yoshiaki Masuda, Yuki Miyanami, Hideshi Abe, Tomoyuki Hirano, Masanari Yamaguchi, Yoshiki Ebiko, Kazufumi Watanabe, Tomoharu Ogita
  • Publication number: 20180197906
    Abstract: There is provided semiconductor devices and methods of forming the same, including: a first substrate; and a second substrate adjacent to the first substrate, where a side wall of the second substrate includes one or more diced portions that can include a blade diced portion and a stealth diced portion; and also imaging devices and methods of forming the same, including: a first substrate; a transparent layer; an adhesive layer between the first substrate and the transparent layer; a second substrate, where the first substrate is disposed between the adhesive layer and the second substrate; and a groove extending from the adhesive layer to the second substrate, where the groove is filled with the adhesive layer.
    Type: Application
    Filed: July 19, 2016
    Publication date: July 12, 2018
    Applicant: SONY SEMICONDUCTOR SOLUTIONS CORPORATION
    Inventors: Masanari YAMAGUCHI, Taizo TAKACHI, Shunsuke FURUSE, Takashi OINOUE, Yuki IKEBE
  • Publication number: 20180027157
    Abstract: The present disclosure relates to a solid-state imaging device, a method for manufacturing the same, and an electronic apparatus capable of improving sensitivity while suppressing degradation of color mixture. The solid-state imaging device includes an anti-reflection portion having a moth-eye structure provided on a boundary surface on a light-receiving surface side of a photoelectric conversion region of each pixel arranged two-dimensionally, and an inter-pixel light-blocking portion provided below the boundary surface of the anti-reflection portion to block incident light. In addition, the photoelectric conversion region is a semiconductor region, and the inter-pixel light-blocking portion has a trench structure obtained by digging the semiconductor region in a depth direction at a pixel boundary. The techniques according to the present disclosure can be applied to, for example, a solid-state imaging device of a rear surface irradiation type.
    Type: Application
    Filed: September 29, 2017
    Publication date: January 25, 2018
    Inventors: Yoshiaki MASUDA, Yuki MIYANAMI, Hideshi ABE, Tomoyuki HIRANO, Masanari YAMAGUCHI, Yoshiki EBIKO, Kazufumi WATANABE, Tomoharu OGITA
  • Patent number: 9819846
    Abstract: The present disclosure relates to a solid-state imaging device, a method for manufacturing the same, and an electronic apparatus capable of improving sensitivity while suppressing degradation of color mixture. The solid-state imaging device includes an anti-reflection portion having a moth-eye structure provided on a boundary surface on a light-receiving surface side of a photoelectric conversion region of each pixel arranged two-dimensionally, and an inter-pixel light-blocking portion provided below the boundary surface of the anti-reflection portion to block incident light. In addition, the photoelectric conversion region is a semiconductor region, and the inter-pixel light-blocking portion has a trench structure obtained by digging the semiconductor region in a depth direction at a pixel boundary. The techniques according to the present disclosure can be applied to, for example, a solid-state imaging device of a rear surface irradiation type.
    Type: Grant
    Filed: June 20, 2014
    Date of Patent: November 14, 2017
    Assignee: Sony Corporation
    Inventors: Yoshiaki Masuda, Yuki Miyanami, Hideshi Abe, Tomoyuki Hirano, Masanari Yamaguchi, Yoshiki Ebiko, Kazufumi Watanabe, Tomoharu Ogita
  • Patent number: 9794457
    Abstract: The present disclosure relates to a solid-state imaging device, a method for manufacturing the same, and an electronic apparatus capable of improving sensitivity while suppressing degradation of color mixture. The solid-state imaging device includes an anti-reflection portion having a moth-eye structure provided on a boundary surface on a light-receiving surface side of a photoelectric conversion region of each pixel arranged two-dimensionally, and an inter-pixel light-blocking portion provided below the boundary surface of the anti-reflection portion to block incident light. In addition, the photoelectric conversion region is a semiconductor region, and the inter-pixel light-blocking portion has a trench structure obtained by digging the semiconductor region in a depth direction at a pixel boundary. The techniques according to the present disclosure can be applied to, for example, a solid-state imaging device of a rear surface irradiation type.
    Type: Grant
    Filed: June 20, 2014
    Date of Patent: October 17, 2017
    Assignee: Sony Corporation
    Inventors: Yoshiaki Masuda, Yuki Miyanami, Hideshi Abe, Tomoyuki Hirano, Masanari Yamaguchi, Yoshiki Ebiko, Kazufumi Watanabe, Tomoharu Ogita
  • Publication number: 20160112614
    Abstract: The present disclosure relates to a solid-state imaging device, a method for manufacturing the same, and an electronic apparatus capable of improving sensitivity while suppressing degradation of color mixture. The solid-state imaging device includes an anti-reflection portion having a moth-eye structure provided on a boundary surface on a light-receiving surface side of a photoelectric conversion region of each pixel arranged two-dimensionally, and an inter-pixel light-blocking portion provided below the boundary surface of the anti-reflection portion to block incident light. In addition, the photoelectric conversion region is a semiconductor region, and the inter-pixel light-blocking portion has a trench structure obtained by digging the semiconductor region in a depth direction at a pixel boundary. The techniques according to the present disclosure can be applied to, for example, a solid-state imaging device of a rear surface irradiation type.
    Type: Application
    Filed: June 20, 2014
    Publication date: April 21, 2016
    Inventors: Yoshiaki MASUDA, Yuki MIYANAMI, Hideshi ABE, Tomoyuki HIRANO, Masanari YAMAGUCHI, Yoshiki EBIKO, Kazufumi WATANABE, Tomoharu OGITA
  • Patent number: 8390933
    Abstract: Disclosed herein is an image display device including a light source and a scanner. The scanner includes (a) a first mirror on which a light beam emitted from the light source is incident, (b) a first light deflector on which the light beam output from the first mirror is incident and that outputs collimated light forming a first output angle depending on a first incident angle of the light beam in association with the pivoting of the first mirror, (c) a second mirror on which the collimated light output from the first light deflector is incident, and (d) a second light deflector on which the collimated light output from the second mirror is incident and that outputs collimated light forming a second output angle depending on a second incident angle of the collimated light in association with the pivoting of the second mirror.
    Type: Grant
    Filed: July 7, 2010
    Date of Patent: March 5, 2013
    Assignee: Sony Corporation
    Inventors: Hiroshi Tanaka, Kazuya Hayashibe, Masanari Yamaguchi, Kunihiko Saruta, Keita Ishikawa, Teppei Imamura
  • Patent number: 8268660
    Abstract: A method for manufacturing a micromachine is provided which can remove a sacrifice layer and can perform sealing without using a specific packaging technique. In a method for manufacturing a micromachine (1) including an oscillator (4), a step of forming a sacrifice layer around a movable portion of the oscillator (4); a step of covering a sacrifice layer with an overcoat film (8), followed by the formation of a penetrating hole (10) reaching the sacrifice layer in the overcoat layer (8); a step of performing sacrifice-layer etching for removing the sacrifice layer using the penetrating hole (10) in order to form a space around the movable portion; and a step of performing a film-formation treatment at a reduced pressure following the sacrifice-layer etching so as to seal the penetrating hole (10).
    Type: Grant
    Filed: April 2, 2004
    Date of Patent: September 18, 2012
    Assignee: Sony Corporation
    Inventors: Masahiro Tada, Takashi Kinoshita, Masahiro Tanaka, Masanari Yamaguchi, Shun Mitarai, Koji Naniwada
  • Publication number: 20110013245
    Abstract: Disclosed herein is an image display device including a light source and a scanner. The scanner includes (a) a first mirror on which a light beam emitted from the light source is incident, (b) a first light deflector on which the light beam output from the first mirror is incident and that outputs collimated light forming a first output angle depending on a first incident angle of the light beam in association with the pivoting of the first mirror, (c) a second mirror on which the collimated light output from the first light deflector is incident, and (d) a second light deflector on which the collimated light output from the second mirror is incident and that outputs collimated light forming a second output angle depending on a second incident angle of the collimated light in association with the pivoting of the second mirror.
    Type: Application
    Filed: July 7, 2010
    Publication date: January 20, 2011
    Applicant: Sony Corporation
    Inventors: Hiroshi Tanaka, Kazuya Hayashibe, Masanari Yamaguchi, Kunihiko Saruta, Keita Ishikawa, Teppei Imamura
  • Publication number: 20060216847
    Abstract: A method for manufacturing a micromachine is provided which can remove a sacrifice layer and can perform sealing without using a specific packaging technique. In a method for manufacturing a micromachine (1) including an oscillator (4), a step of forming a sacrifice layer around a movable portion of the oscillator (4); a step of covering a sacrifice layer with an overcoat film (8), followed by the formation of a penetrating hole (10) reaching the sacrifice layer in the overcoat layer (8); a step of performing sacrifice-layer etching for removing the sacrifice layer using the penetrating hole (10) in order to form a space around the movable portion; and a step of performing a film-formation treatment at a reduced pressure following the sacrifice-layer etching so as to seal the penetrating hole (10).
    Type: Application
    Filed: April 2, 2004
    Publication date: September 28, 2006
    Inventors: Masahiro Tada, Takashi Kinoshita, Masahiro Tanaka, Masanari Yamaguchi, Shun Mitarai, Koji Naniwada
  • Publication number: 20050183950
    Abstract: A fluid actuating apparatus is proposed, which includes: a diaphragm for providing a pressure change in fluid; a diaphragm-side electrode, formed for the diaphragm, for actuating the diaphragm; a substrate-side electrode formed so that it faces the diaphragm-side electrode; a space formed between the diaphragm-side electrode and the substrate-side electrode; and a support post, formed on the substrate-side electrode, for supporting the diaphragm-side electrode through the space. where the diaphragm-side electrode is formed so that it passes through the support post and extends to and covers part of the bottom of the support post.
    Type: Application
    Filed: February 23, 2005
    Publication date: August 25, 2005
    Inventor: Masanari Yamaguchi