Patents by Inventor Masanobu Kohda

Masanobu Kohda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Radiation-sensitive positive resist
    Patent number: 4259407
    Abstract: A radiation-sensitive positive resist which is prepared from a homogeneous polymer of any one of the various forms of halogenated alkyl .alpha.-halogenated acrylate expressed by the general structural formula: ##STR1## where: X = fluorine, chlorine or bromineR = alkyl group in which one or more hydrogen atoms are substituted by the corresponding number of fluorine atoms, or aryl group in which said substitution takes place, or alkoxy group in which said substitution takes place, or a copolymer of two or more of the monomers expressed by said general structural formula or a copolymer of any one of said monomers and any one of the different forms of vinyl monomer from those expressed by said general structural formula.
    Type: Grant
    Filed: July 25, 1979
    Date of Patent: March 31, 1981
    Assignee: VLSI Technology Research Association
    Inventors: Tsukasa Tada, Yuzo Shimazaki, Masanobu Kohda, Hirohisa Kato, Hideo Saeki