Patents by Inventor Masanobu Onishi

Masanobu Onishi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10755738
    Abstract: The present invention provides: an aluminum alloy substrate for magnetic discs with excellent plating surface smoothness; a manufacturing method therefor; and a magnetic disc using said aluminum alloy substrate for magnetic discs. The present invention is an aluminum alloy substrate for magnetic discs, a manufacturing method therefor, and a magnetic disc using said aluminum alloy substrate for magnetic discs, the aluminum alloy substrate being characterized in being obtained from an aluminum alloy containing Mg: 2.0-8.0 mass % (“%” below), Be: 0.00001-0.00200%, Cu: 0.003-0.150%, Zn: 0.05-0.60%, Cr: 0.010-0.300%, Si: 0.060% or less, Fe: 0.060% or less, the balance being obtained from Al and unavoidable impurities.
    Type: Grant
    Filed: May 23, 2016
    Date of Patent: August 25, 2020
    Assignees: UACJ Corporation, Furukawa Electric Co., Ltd.
    Inventors: Kotaro Kitawaki, Takuya Murata, Akira Hibino, Naoki Kitamura, Masanobu Onishi, Hideki Takahashi, Satoshi Yamazaki, Sadayuki Toda
  • Publication number: 20180190316
    Abstract: The present invention provides: an aluminum alloy substrate for magnetic discs with excellent plating surface smoothness; a manufacturing method therefor; and a magnetic disc using said aluminum alloy substrate for magnetic discs. The present invention is an aluminum alloy substrate for magnetic discs, a manufacturing method therefor, and a magnetic disc using said aluminum alloy substrate for magnetic discs, the aluminum alloy substrate being characterized in being obtained from an aluminum alloy containing Mg: 2.0-8.0 mass % (“%” below), Be: 0.00001-0.00200%, Cu: 0.003-0.150%, Zn: 0.05-0.60%, Cr: 0.010-0.300%, Si: 0.060% or less, Fe: 0.060% or less, the balance being obtained from Al and unavoidable impurities.
    Type: Application
    Filed: May 23, 2016
    Publication date: July 5, 2018
    Applicants: UACJ Corporation, Furukawa Electric Co., Ltd.
    Inventors: Kotaro KITAWAKI, Takuya MURATA, Akira HIBINO, Naoki KITAMURA, Masanobu ONISHI, Hideki TAKAHASHI, Satoshi YAMAZAKI, Sadayuki TODA
  • Publication number: 20160042754
    Abstract: A metal member for magnetic storage medium includes an aluminum alloy substrate, and a nonmagnetic layer formed on at least one surface of the aluminum alloy substrate, and the nonmagnetic layer comprises a Ni—Cu—P based alloy containing 5 mass % to 50 mass % Cu and 100 ppm to 1000 ppm Pb.
    Type: Application
    Filed: July 6, 2015
    Publication date: February 11, 2016
    Applicants: Furukawa Electric Co., Ltd., C. Uyemura & Co., Ltd.
    Inventors: Wataru Kumagai, Hideki Takahashi, Masanobu Onishi, Yasuo Fujii, Hiroki Ota, Hideyuki Hatakeyama, Hideyuki Takami
  • Patent number: 7897790
    Abstract: The present invention provides a novel thiophene compound as a synthetic intermediate that is useful for efficient production of kahweofuran or an analogue thereof. The present invention also provides a process for producing kahweofuran or an analogue thereof using the novel thiophene compound as an intermediate material. Of novel thiophene compounds represented by Formula (1): wherein R1 is a hydrogen atom or a C1-C4 lower alkyl group; R2 is a hydrogen atom or an alcohol-protecting group; R3 is a hydrogen atom, —COR4 or —C(OH)R5 (wherein R4 and R5 each represent a C1-C4 lower alkyl group); provided that when R2 and R3 are hydrogen atoms, R1 is not any of a hydrogen atom, methyl group, or n-propyl group; a thiophene compound represented by Formula (2) is reduced and cyclized in the presence of a transition metal catalyst to produce kahweofuran or kahweofuran analogue (3a) shown below: wherein R1 is a hydrogen atom or a C1-C4 lower alkyl group, and R4 is a C1-C4 lower alkyl group.
    Type: Grant
    Filed: February 22, 2006
    Date of Patent: March 1, 2011
    Assignee: San-Ei Gen F.F.I., Inc.
    Inventors: Shigeo Katsumura, Yanwu Li, Hisakatsu Iwabuchi, Masanobu Onishi, Yusuke Murakami
  • Publication number: 20080167481
    Abstract: The present invention provides a novel thiophene compound as a synthetic intermediate that is useful for efficient production of kahweofuran or an analogue thereof. The present invention also provides a process for producing kahweofuran or an analogue thereof using the novel thiophene compound as an intermediate material. Of novel thiophene compounds represented by Formula (1): wherein R1 is a hydrogen atom or a C1-C4 lower alkyl group; R2 is a hydrogen atom or an alcohol-protecting group; R3 is a hydrogen atom, —COR4 or —C(OH)R5 (wherein R4 and R5 each represent a C1-C4 lower alkyl group); provided that when R2 and R3 are hydrogen atoms, R1 is not any of a hydrogen atom, methyl group, or n-propyl group; a thiophene compound represented by Formula (2) is reduced and cyclized in the presence of a transition metal catalyst to produce kahweofuran or kahweofuran analogue (3a) shown below: wherein R1 is a hydrogen atom or a C1-C4 lower alkyl group, and R4 is a C1-C4 lower alkyl group.
    Type: Application
    Filed: February 22, 2006
    Publication date: July 10, 2008
    Applicant: SAN EI GEN F.F.I., INC.
    Inventors: Shigeo Katsumura, Yanwu Li, Hisakatsu Iwabuchi, Masanobu Onishi, Yusuke Murakami
  • Patent number: 7169955
    Abstract: Perfluoroisopropylbenzene derivatives of the general formula (I) or salts thereof, useful as intermediates or raw materials in the synthesis of various industrial materials including agricultural chemicals, drugs and surfactants: wherein X1 is H, halogen, formyl, optionally halogenated (C1–C6) alkyl, (C1–C6) alkylthio, or the like; X2 is H, halogen, formyl, hydroxyl, (C1–C6) alkyl, —C(?O)—R1 (wherein R1 is H, halogen, hydroxyl, (C1–C6) alkyl, or NR2R3, with R2 and R3 being each H, C1-6 alkyl, or the like), or the like; X3 is H, halogen, hydroxyl, cyano, isocyanate, hydrazino, diazo, —C(?O)—R1, —SO2—R4 (wherein R4 is halogen, hydroxyl, (C1–C6) alkyl, or NR5R6, with R5 and R6 being each H or (C1–C6) alkyl), or the like; and X4 is H, halogen, (C1–C6) alkyl, or (C1–C6) alkoxy, with publicly known compounds being excepted.
    Type: Grant
    Filed: October 22, 2004
    Date of Patent: January 30, 2007
    Assignee: Nihon Nohyaku Co., Ltd.
    Inventors: Masanobu Onishi, Kenichi Ikeda, Takashi Shimaoka, Masanori Yoshida
  • Publication number: 20050113567
    Abstract: Perfluoroisopropylbenzene derivatives of the general formula (I) or salts thereof, useful as intermediates or raw materials in the synthesis of various industrial materials including agricultural chemicals, drugs and surfactants: wherein X1 is H, halogen, formyl, optionally halogenated (C1-C6) alkyl, (C1-C6) alkylthio, or the like; X2 is H, halogen, formyl, hydroxyl, (C1-C6) alkyl, —C(?O)—R1 (wherein R1 is H, halogen, hydroxyl, (C1-C6) alkyl, or NR2R3, with R2 and R3 being each H, C1-6 alkyl, or the like), or the like; X3 is H, halogen, hydroxyl, cyano, isocyanate, hydrazino, diazo, —C(?O)—R1, —SO2—R4 (wherein R4 is halogen, hydroxyl, (C1-C6) alkyl, or NR5R6, with R5 and R6 being each H or (C1-C6) alkyl), or the like; and X4 is H, halogen, (C1-C6) alkyl, or (C1-C6) alkoxy, with publicly known compounds being excepted.
    Type: Application
    Filed: October 22, 2004
    Publication date: May 26, 2005
    Inventors: Masanobu Onishi, Kenichi Ikeda, Takashi Shimaoka, Masanori Yoshida
  • Patent number: 6717013
    Abstract: The present invention provides an aniline derivative represented by the formula (I) wherein R1 and R2 are each H, (C1-12)alkyl, (C3-8)cycloalkyl, hydroxy(C1-12)alkyl, hydroxycarbonyl (C1-12)alkyl, (C1-6)-alkoxycarbonyl(C1-6)alkyl, —COR8, wherein R8 is H, halo-(C1-12)alkyl, (C3-8)cycloalkyl or (substituted) phenyl, COOR9, wherein R9 is a halo(C1-6)alkyl group, (substituted) phenyl or (substituted) benzyl; R3, R4, R5, R6 and R7 are each H, halogen, OH, nitro, halo(C1-12)alkylthio, (substituted) amino-(C1-2)alkyl, (substituted) phenyl, (substituted) benzyl, amino, —N(R10)R11 wherein R10 and R11 are each H, alkyl, cycloalkyl, (substituted) phenyl, (substituted) benzyl, —COR8 or COOR9, or (C2-27)perfluoroalkyl, etc., and a process for producing the aniline derivative. According to the process of the present invention, perfluoroalkylaniline derivatives can be obtained by using various anilines as the substrate with a high position selectivity and high yield.
    Type: Grant
    Filed: May 14, 2003
    Date of Patent: April 6, 2004
    Assignee: Nihon Nohyaku Co., Ltd.
    Inventors: Masanobu Onishi, Akihiko Yoshiura, Eiji Kohno, Kenji Tsubata
  • Publication number: 20030204104
    Abstract: The present invention provides an aniline derivative represented by the formula (I) 1
    Type: Application
    Filed: May 14, 2003
    Publication date: October 30, 2003
    Inventors: Masanobu Onishi, Akihiko Yoshiura, Eiji Kohno, Kenji Tsubata
  • Publication number: 20030187233
    Abstract: Perfluoroisopropylbenzene derivatives of the general formula (I) or salts thereof, useful as intermediates or raw materials in the synthesis of various industrial materials including agricultural chemicals, drugs and surfactants, wherein X1 is H, halogeno, formyl, optionally halogenated C1-6 alkyl, —C(═O)—R1 (wherein R1 is H, halogeno, hydroxyl, C1-6 alkyl, or NR2R3, with R2 and R3 being each H, C1-6 alkyl, or the like), or the like; X3 is H, halogeno, hydroxyl, cyano, isocyanato, hydrazino, diazo, —C(═O)—R1, —SO2—R4 (wherein R4 is halogeno, hydroxyl, C1-6 alkyl, or NR5R6, with R5 and R6 being each H or C1-6 alkyl), or the like; and X4 is H, halogeno, C1-6 alkyl, or C1-6 alkoxy, with publicly known compounds being excepted.
    Type: Application
    Filed: September 11, 2002
    Publication date: October 2, 2003
    Inventors: Masanobu Onishi, Kenichi Ikeda, Takashi Shimaoka, Masanori Yoshida
  • Patent number: 6600074
    Abstract: The present invention provides an aniline derivative represented by the formula (I) wherein R1 and R2 are each H, (C1-12)alkyl, (C3-8)cycloalkyl, hydroxy(C1-12)alkyl, hydroxycarbonyl (C1-12)alkyl, (C1-6)-alkoxycarbonyl(C1-6)alkyl, —COR8, wherein R8 is H, halo-(C1-12)alkyl, (C3-8)cycloalkyl or (substituted) phenyl, COOR9, wherein R9 is a halo(C1-6)alkyl group, (substituted) phenyl or (substituted) benzyl; R3, R4, R5, R6and R7 are each H, halogen, OH, nitro, halo(C1-12)alkylthio, (substituted)amino-(C1-2)alkyl, (substituted) phenyl, (substituted) benzyl, amino, —N(R10)R11 wherein R10 and R11 are each H, alkyl, cycloalkyl, (substituted) phenyl, (substituted) benzyl, —COR8 or COOR9, or (C2-27)perfluoroalkyl, etc., and a process for producing the aniline derivative. According to the process of the present invention, perfluoroalkylaniline derivatives can be obtained by using various anilines as the substrate with a high position selectivity and high yield.
    Type: Grant
    Filed: July 29, 2002
    Date of Patent: July 29, 2003
    Assignee: Nihon Nohyaku Co., Ltd.
    Inventors: Masanobu Onishi, Akihiko Yoshiura, Eiji Kohno, Kenji Tsubata
  • Publication number: 20020198399
    Abstract: The present invention provides an aniline derivative represented by the formula (I) 1
    Type: Application
    Filed: July 29, 2002
    Publication date: December 26, 2002
    Inventors: Masanobu Onishi, Akihiko Yoshiura, Eiji Kohno, Kenji Tsubata
  • Publication number: 20020157722
    Abstract: A refrigerant transporting hose has a five-layered wall formed of an inner rubber layer, a middle rubber layer, an outer rubber layer, a first reinforcing layer formed between the inner and middle rubber layers and a second reinforcing layer formed between the middle and outer rubber layers. Each rubber layer has a thickness of at least 0.3 mm. Each reinforcing layer is a single layer of spirally wound reinforcing yarn, and the two reinforcing layers have substantially opposite spiral yarn directions. The hose having no resin layer in its wall is of improved flexibility, as well as retaining satisfactory pressure resistance, fluid impermeability and kink resistance.
    Type: Application
    Filed: February 22, 2002
    Publication date: October 31, 2002
    Inventors: Tetsuya Arima, Masanobu Onishi, Keiichi Kitamura, Makoto Yoshino
  • Patent number: 6469003
    Abstract: A pyridazinone derivative represented by formula (I): a pharmaceutically acceptable salt thereof, or a derivative thereof, or a pharmaceutical composition comprising as an active ingredient the derivative or a pharmaceutically acceptable salt thereof, and a pharmaceutically acceptable carrier or diluent.
    Type: Grant
    Filed: February 14, 2001
    Date of Patent: October 22, 2002
    Assignee: Nihon Nohyaku Co., Ltd.
    Inventors: Makoto Gotoh, Koji Umimoto, Masanobu Onishi, Akiyuki Satoh, Yoshitami Oshita, Masashi Nagamine