Patents by Inventor Masanori IMAMURA
Masanori IMAMURA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11940630Abstract: To provide a display apparatus that makes it possible to further improve a performance in controlling video presentation according to characteristics of an eyeball of a user. A display apparatus is provided that includes a light source; a processor that performs processing on a distribution of characteristics of an eyeball; a monitoring section that monitors a state of the eyeball; a matching section that performs matching on the distribution of the characteristics of the eyeball and the state of the eyeball; and an irradiator that irradiates a specified position on a retina with video display light emitted by the light source.Type: GrantFiled: April 19, 2021Date of Patent: March 26, 2024Assignee: Sony Group CorporationInventors: Teppei Imamura, Ryo Ogawa, Masanori Iwasaki, Takanobu Omata, Katsuyuki Akutsu, Itaru Shimizu
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Patent number: 10698315Abstract: Disclosed is a substrate treating method including a solvent supplying step of supplying a solvent to a center part of a substrate while increasing a rotation speed of the substrate. In the solvent supplying step, the solvent is successively supplied to the substrate until the solvent reaches a periphery edge of the substrate. With such a substrate treating method, the solvent is able to cover a substrate surface entirely with effective suppression of particles. In other words, a process of supplying the solvent to the substrate is performable with effectively improved quality.Type: GrantFiled: August 4, 2017Date of Patent: June 30, 2020Assignee: SCREEN Holdings Co., Ltd.Inventors: Chikara Sagae, Masanori Imamura
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Patent number: 10600647Abstract: A coating apparatus includes an open/close valve having a motor that allows control of opening operation and closing operation in accordance with electric signals applied from a controller. The coating apparatus further includes a suck back valve having a motor that allows control of a volume variation in a flow path for suck back that is in communication with an upstream side and a downstream side of a pipe in accordance with electric signals from the controller. The controller allows control of start of the closing operation of the open/close valve and start of suction operation of the suck back valve through application of the electric signals to the respective motors. This achieves simple adjustment of liquid cut-off.Type: GrantFiled: September 18, 2018Date of Patent: March 24, 2020Assignee: SCREEN Holdings Co., Ltd.Inventors: Masanori Imamura, Kazuo Morioka
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Patent number: 10423070Abstract: A substrate treating method includes a determining step for determining a treating condition for hydrophobizing a surface of a substrate, based on a target regarding a dissolved area size in a resist pattern, and a treating step for hydrophobizing the surface of the substrate with the treating condition determined in the determining step before forming resist film on the surface of the substrate.Type: GrantFiled: February 28, 2017Date of Patent: September 24, 2019Assignee: SCREEN Holdings Co., Ltd.Inventors: Masashi Kanaoka, Masanori Imamura, Taiji Matsu, Hidetoshi Sagawa, Atsushi Tanaka, Kazuhiro Tadokoro, Kazuya Ono, Shinichi Takada, Tsuyoshi Mitsuhashi
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Publication number: 20190019666Abstract: A coating apparatus includes an open/close valve having a motor that allows control of opening operation and closing operation in accordance with electric signals applied from a controller. The coating apparatus further includes a suck back valve having a motor that allows control of a volume variation in a flow path for suck back that is in communication with an upstream side and a downstream side of a pipe in accordance with electric signals from the controller. The controller allows control of start of the closing operation of the open/close valve and start of suction operation of the suck back valve through application of the electric signals to the respective motors. This achieves simple adjustment of liquid cut-off.Type: ApplicationFiled: September 18, 2018Publication date: January 17, 2019Inventors: Masanori IMAMURA, Kazuo MORIOKA
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Patent number: 10144033Abstract: A substrate is held and rotated in a horizontal attitude by a rotation holder. A coating liquid is supplied by a coating liquid supplier to a surface to be processed of the substrate rotated by the rotation holder. A first removal liquid is supplied by a first removal liquid supplier to a first annular region at a peripheral portion of the substrate rotated by the rotation holder before the coating liquid supplied by the coating liquid supplier loses fluidity. In this state, a supply position of the first removal liquid by the first removal liquid supplier is moved from an inner edge to an outer edge of the first annular region.Type: GrantFiled: August 30, 2016Date of Patent: December 4, 2018Assignee: SCREEN Holdings Co., Ltd.Inventors: Masanori Imamura, Masashi Kanaoka, Hidetoshi Sagawa, Yoshinori Tawaratani, Masaaki Furukawa
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Publication number: 20180052394Abstract: Disclosed is a substrate treating method including a solvent supplying step of supplying a solvent to a center part of a substrate while increasing a rotation speed of the substrate. In the solvent supplying step, the solvent is successively supplied to the substrate until the solvent reaches a periphery edge of the substrate. With such a substrate treating method, the solvent is able to cover a substrate surface entirely with effective suppression of particles. In other words, a process of supplying the solvent to the substrate is performable with effectively improved quality.Type: ApplicationFiled: August 4, 2017Publication date: February 22, 2018Inventors: Chikara SAGAE, Masanori IMAMURA
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Publication number: 20170277038Abstract: A substrate treating method includes a determining step for determining a treating condition for hydrophobizing a surface of a substrate, based on a target regarding a dissolved area size in a resist pattern, and a treating step for hydrophobizing the surface of the substrate with the treating condition determined in the determining step before forming resist film on the surface of the substrate.Type: ApplicationFiled: February 28, 2017Publication date: September 28, 2017Inventors: Masashi KANAOKA, Masanori IMAMURA, Taiji MATSU, Hidetoshi SAGAWA, Atsushi TANAKA, Kazuhiro TADOKORO, Kazuya ONO, Shinichi TAKADA, Tsuyoshi MITSUHASHI
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Publication number: 20170278696Abstract: A coating apparatus includes an open/close valve having a motor that allows control of opening operation and closing operation in accordance with electric signals applied from a controller. The coating apparatus further includes a suck back valve having a motor that allows control of a volume variation in a flow path for suck back that is in communication with an upstream side and a downstream side of a pipe in accordance with electric signals. The controller allows control of start of the closing operation of the open/close valve and start of suction operation of the suck back valve through application of the electric signals to the motors, respectively. This achieves simple adjustment of liquid cut-off.Type: ApplicationFiled: April 3, 2015Publication date: September 28, 2017Inventors: Masanori IMAMURA, Kazuo MORIOKA
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Publication number: 20170056917Abstract: A substrate is held and rotated in a horizontal attitude by a rotation holder. A coating liquid is supplied by a coating liquid supplier to a surface to be processed of the substrate rotated by the rotation holder. A first removal liquid is supplied by a first removal liquid supplier to a first annular region at a peripheral portion of the substrate rotated by the rotation holder before the coating liquid supplied by the coating liquid supplier loses fluidity. In this state, a supply position of the first removal liquid by the first removal liquid supplier is moved from an inner edge to an outer edge of the first annular region.Type: ApplicationFiled: August 30, 2016Publication date: March 2, 2017Inventors: Masanori IMAMURA, Masashi KANAOKA, Hidetoshi SAGAWA, Yoshinori TAWARATANI, Masaaki FURUKAWA
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Patent number: 9436087Abstract: Each chemical processing section includes a chemical liquid bottle, a buffer tank, a pump, a filter, a discharge valve and a discharge nozzle. A chemical liquid stored in the chemical liquid bottle is led to the discharge nozzle and is discharged from the discharge nozzle to a substrate. A cleaning processing section includes a solvent bottle, a cleaning liquid bottle, the buffer tank and the pump. A solvent stored in the solvent bottle, a cleaning liquid stored in the cleaning liquid bottle and a gas supplied from a gas supply source are selectively led to the discharge nozzle in each chemical liquid processing section.Type: GrantFiled: July 3, 2014Date of Patent: September 6, 2016Assignees: SCREEN Holdings Co., Ltd., SCREEN Semiconductor Solutions Co., Ltd.Inventors: Kazuo Morioka, Masanori Imamura, Satoshi Yamamoto, Hideki Shimizu
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Publication number: 20150013603Abstract: Each chemical processing section includes a chemical liquid bottle, a buffer tank, a pump, a filter, a discharge valve and a discharge nozzle. A chemical liquid stored in the chemical liquid bottle is led to the discharge nozzle and is discharged from the discharge nozzle to a substrate. A cleaning processing section includes a solvent bottle, a cleaning liquid bottle, the buffer tank and the pump. A solvent stored in the solvent bottle, a cleaning liquid stored in the cleaning liquid bottle and a gas supplied from a gas supply source are selectively led to the discharge nozzle in each chemical liquid processing section.Type: ApplicationFiled: July 3, 2014Publication date: January 15, 2015Inventors: Kazuo MORIOKA, Masanori IMAMURA, Satoshi YAMAMOTO, Hideki SHIMIZU
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Patent number: 8580340Abstract: After a solvent is discharged onto a substrate in a period from a time point t0 to a time point t1, rotation of the substrate is started at a time point t2. A resist liquid is discharged onto a center portion of a target surface of the substrate at a time point t3. A rotation speed of the substrate starts to decrease at a time point t4, and attains a first speed after a certain period of time. The discharge of the resist liquid is stopped at a time point t5. The rotation of the substrate is accelerated in a period from a time point t6 to a time point t7, and the rotation speed of the substrate attains a second speed at the time point t7. The rotation of the substrate is decelerated in a period from the time point t7 to a time point t8, and the rotation speed of the substrate attains a third speed at the time point t8.Type: GrantFiled: October 6, 2010Date of Patent: November 12, 2013Assignee: Sokudo Co., Ltd.Inventors: Masanori Imamura, Akihiro Hisai, Hidetoshi Sagawa
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Publication number: 20110135820Abstract: After a solvent is discharged onto a substrate in a period from a time point t0 to a time point t1, rotation of the substrate is started at a time point t2. A resist liquid is discharged onto a center portion of a target surface of the substrate at a time point t3. A rotation speed of the substrate starts to decrease at a time point t4, and attains a first speed after a certain period of time. The discharge of the resist liquid is stopped at a time point t5. The rotation of the substrate is accelerated in a period from a time point t6 to a time point t7, and the rotation speed of the substrate attains a second speed at the time point t7. The rotation of the substrate is decelerated in a period from the time point t7 to a time point t8, and the rotation speed of the substrate attains a third speed at the time point t8.Type: ApplicationFiled: October 6, 2010Publication date: June 9, 2011Inventors: Masanori IMAMURA, Akihiro HISAI, Hidetoshi SAGAWA