Patents by Inventor Masanori Itagaki

Masanori Itagaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240137240
    Abstract: [Object] To improve the reliability by using an acknowledgement response while using radio resources efficiently in multicast transmission over wireless transmission. [Solution] A plurality of wireless communication devices included in a multicast group, when receiving a data frame, transmit simultaneously an acknowledgement response of multicast using spatial multiplexing in response to an acknowledgement request from a transmission source. On the other hand, a wireless communication device of the transmission source decomposes the acknowledgement responses simultaneously received into the original individual acknowledgement responses and restores them using signal processing based on information on a channel with each wireless communication device of a transmission destination.
    Type: Application
    Filed: December 13, 2023
    Publication date: April 25, 2024
    Applicant: Sony Group Corporation
    Inventors: Takeshi ITAGAKI, Tomoya YAMAURA, Masanori SATO
  • Patent number: 8657084
    Abstract: The present invention provides a rotary damper in which both yields and braking characteristics can be enhanced. The rotary damper of the invention includes a valve mechanism which comprises an operating chamber 7 through which fluid can pass, a valve body 8 which forwardly moves from a natural state position when the valve body 8 receives fluid pressure and which can forwardly moves in the operating chamber 7, and a first spring 9 capable of giving a resistance to the forward movement of the valve body 8. The valve mechanism can reduce a flow rate of fluid which passes through the operating chamber 7 by a flow path 14 formed between the valve body 8 and a peripheral wall 7a of the operating chamber 7. A reducing amount of fluid can be increased as a moving distance of the valve body 8 which forwardly moves in the operating chamber 7 is increased.
    Type: Grant
    Filed: September 23, 2010
    Date of Patent: February 25, 2014
    Assignee: Kabushiki Kaisha Somic Ishikawa
    Inventors: Hidenori Kanno, Ryota Shimura, Masanori Itagaki
  • Patent number: 8469163
    Abstract: The present invention provides a rotary damper in which both yields and braking characteristics can be enhanced. The rotary damper of the invention includes a valve mechanism which comprises an operating chamber 7 through which fluid can pass, a valve body 8 which forwardly moves from a natural state position when the valve body 8 receives fluid pressure and which can forwardly moves in the operating chamber 7, and a first spring 9 capable of giving a resistance to the forward movement of the valve body 8. The valve mechanism can reduce a flow rate of fluid which passes through the operating chamber 7 by a flow path 14 formed between the valve body 8 and a peripheral wall 7a of the operating chamber 7. A reducing amount of fluid can be increased as a moving distance of the valve body 8 which forwardly moves in the operating chamber 7 is increased.
    Type: Grant
    Filed: September 23, 2010
    Date of Patent: June 25, 2013
    Assignee: Kabushiki Kaisha Somic Ishikawa
    Inventors: Hidenori Kanno, Ryota Shimura, Masanori Itagaki
  • Patent number: 8261894
    Abstract: The present invention provides a rotary damper in which both yields and braking characteristics can be enhanced. The rotary damper of the invention includes a valve mechanism which comprises an operating chamber 7 through which fluid can pass, a valve body 8 which forwardly moves from a natural state position when the valve body 8 receives fluid pressure and which can forwardly moves in the operating chamber 7, and a first spring 9 capable of giving a resistance to the forward movement of the valve body 8. The valve mechanism can reduce a flow rate of fluid which passes through the operating chamber 7 by a flow path 14 formed between the valve body 8 and a peripheral wall 7a of the operating chamber 7. A reducing amount of fluid can be increased as a moving distance of the valve body 8 which forwardly moves in the operating chamber 7 is increased.
    Type: Grant
    Filed: March 30, 2005
    Date of Patent: September 11, 2012
    Assignee: Kabushiki Kaisha Somic Ishikawa
    Inventors: Hidenori Kanno, Ryota Shimura, Masanori Itagaki
  • Publication number: 20110048878
    Abstract: The present invention provides a rotary damper in which both yields and braking characteristics can be enhanced. The rotary damper of the invention includes a valve mechanism which comprises an operating chamber 7 through which fluid can pass, a valve body 8 which forwardly moves from a natural state position when the valve body 8 receives fluid pressure and which can forwardly moves in the operating chamber 7, and a first spring 9 capable of giving a resistance to the forward movement of the valve body 8. The valve mechanism can reduce a flow rate of fluid which passes through the operating chamber 7 by a flow path 14 formed between the valve body 8 and a peripheral wall 7a of the operating chamber 7. A reducing amount of fluid can be increased as a moving distance of the valve body 8 which forwardly moves in the operating chamber 7 is increased.
    Type: Application
    Filed: September 23, 2010
    Publication date: March 3, 2011
    Applicant: Kabushiki Kaisha Somic Ishikawa
    Inventors: Hidenori Kanno, Ryota Shimura, Masanori Itagaki
  • Publication number: 20110011685
    Abstract: The present invention provides a rotary damper in which both yields and braking characteristics can be enhanced. The rotary damper of the invention includes a valve mechanism which comprises an operating chamber 7 through which fluid can pass, a valve body 8 which forwardly moves from a natural state position when the valve body 8 receives fluid pressure and which can forwardly moves in the operating chamber 7, and a first spring 9 capable of giving a resistance to the forward movement of the valve body 8. The valve mechanism can reduce a flow rate of fluid which passes through the operating chamber 7 by a flow path 14 formed between the valve body 8 and a peripheral wall 7a of the operating chamber 7. A reducing amount of fluid can be increased as a moving distance of the valve body 8 which forwardly moves in the operating chamber 7 is increased.
    Type: Application
    Filed: September 23, 2010
    Publication date: January 20, 2011
    Applicant: Kabushiki Kaisha Somic Ishikawa
    Inventors: Hidenori Kanno, Ryota Shimura, Masanori Itagaki
  • Patent number: 7575109
    Abstract: Described is a rotary damper comprising a partition wall to partition space formed between a rotor and a housing to house said rotor and to form a fluid chamber to be fluid-filled; and a vane to be disposed in said fluid chamber; and a plug to close an opening of said housing; wherein said plug has a flange to be used for mounting which protrudes from an outer circumferential surface of said plug and a stepped portion to enable part of a roller caulking an edge of said opening of said housing to revolve and travel along a peripheral edge of said housing so that said plug having said flange is coupled to said housing by caulking an edge of said opening of said housing.
    Type: Grant
    Filed: June 8, 2004
    Date of Patent: August 18, 2009
    Assignee: Kabushiki Kaisha Somic Ishikawa
    Inventors: Hidenori Kanno, Ryota Shimura, Masanori Itagaki, Yoshihiko Nagashima
  • Publication number: 20080277964
    Abstract: An object of the invention is to make an apparatus compact and simplify a structure. The invention provides a motion control apparatus which is provided with a pressing member pressing a fluid, and a fluid control mechanism (130) controlling a movement of the fluid pressed by the pressing member.
    Type: Application
    Filed: January 28, 2005
    Publication date: November 13, 2008
    Applicant: Kabushiki Kaisha Somic Ishikawa
    Inventors: Hidenori Kanno, Ryota Shimura, Masanori Itagaki, Yoshihiko Nagashima
  • Publication number: 20070158153
    Abstract: The present invention provides a rotary damper in which both yields and braking characteristics can be enhanced. The rotary damper of the invention includes a valve mechanism which comprises an operating chamber 7 through which fluid can pass, a valve body 8 which forwardly moves from a natural state position when the valve body 8 receives fluid pressure and which can forwardly moves in the operating chamber 7, and a first spring 9 capable of giving a resistance to the forward movement of the valve body 8. The valve mechanism can reduce a flow rate of fluid which passes through the operating chamber 7 by a flow path 14 formed between the valve body 8 and a peripheral wall 7a of the operating chamber 7. A reducing amount of fluid can be increased as a moving distance of the valve body 8 which forwardly moves in the operating chamber 7 is increased.
    Type: Application
    Filed: March 30, 2005
    Publication date: July 12, 2007
    Applicant: Kabushiki Kaisha Somic Ishikawa
    Inventors: Hidenori Kanno, Ryota Shimura, Masanori Itagaki
  • Patent number: 7204353
    Abstract: A rotary damper is provided which can include a valve (6) which automatically varies a flow rate of a viscous fluid passing through fluid passages (5a, 5b) in correspondence with variation in load. The valve (6) comprises a leaf spring. The flow rate-adjusting portion (6g) constituting the valve (6) is provided so as not to close the fluid passages (5a, 5b) when no load is applied and bends so that its one surface side projects when no load is applied and becomes deformed in a direction in which the fluid passage (5b) is closed when receiving pressure of the viscous fluid on its one surface side. The flow rate of the viscous fluid passing through the fluid passage (5b) is adjusted depending on a degree of deformation of the flow rate-adjusting portion (6g) corresponding to magnitude of pressure of the viscous fluid applied to one surface side of the flow rate-adjusting portion (6g).
    Type: Grant
    Filed: November 30, 2005
    Date of Patent: April 17, 2007
    Assignee: Kabushiki Kaisha Somic Ishikawa
    Inventors: Hidenori Kanno, Ryota Shimura, Masanori Itagaki
  • Patent number: 7066308
    Abstract: It is an object of the present invention to provide a rotary damper capable of automatically adjusting an exhibited braking force in correspondence with variation in load. A fluid chamber 2 into which viscous fluid is charged is formed in a casing 1. A vane 3 is disposed in the fluid chamber 2. The vane 3 is formed with a fluid passage 5, and is provided with a valve 6. The valve 6 automatically varies a flow rate of the viscous fluid passing through the fluid passage 5 in correspondence with variation in load. With this structure, it is possible to automatically adjust the exhibited braking force in correspondence with variation in load caused by variation in rotational motion of a subject to be controlled, and to reduce variation in rotation speed of the subject to be controlled to an extremely small value.
    Type: Grant
    Filed: September 25, 2002
    Date of Patent: June 27, 2006
    Assignee: Kabushiki Kaisha Somic Ishikawa
    Inventors: Hidenori Kanno, Ryota Shimura, Masanori Itagaki
  • Publication number: 20060070833
    Abstract: It is an object of the present invention to provide a rotary damper capable of automatically adjusting an exhibited braking force in correspondence with variation in load. A fluid chamber 2 into which viscous fluid is charged is formed in a casing 1. A vane 3 is disposed in the fluid chamber 2. The vane 3 is formed with a fluid passage 5, and is provided with a valve 6. The valve 6 automatically varies a flow rate of the viscous fluid passing through the fluid passage 5 in correspondence with variation in load. With this structure, it is possible to automatically adjust the exhibited braking force in correspondence with variation in load caused by variation in rotational motion of a subject to be controlled, and to reduce variation in rotation speed of the subject to be controlled to an extremely small value.
    Type: Application
    Filed: November 30, 2005
    Publication date: April 6, 2006
    Applicant: Kabushiki Kaisha Somic Ishikawa
    Inventors: Hidenori Kanno, Ryota Shimura, Masanori Itagaki
  • Publication number: 20060070835
    Abstract: It is an object of the present invention to provide a rotary damper capable of automatically adjusting an exhibited braking force in correspondence with variation in load. A fluid chamber 2 into which viscous fluid is charged is formed in a casing 1. A vane 3 is disposed in the fluid chamber 2. The vane 3 is formed with a fluid passage 5, and is provided with a valve 6. The valve 6 automatically varies a flow rate of the viscous fluid passing through the fluid passage 5 in correspondence with variation in load. With this structure, it is possible to automatically adjust the exhibited braking force in correspondence with variation in load caused by variation in rotational motion of a subject to be controlled, and to reduce variation in rotation speed of the subject to be controlled to an extremely small value.
    Type: Application
    Filed: November 30, 2005
    Publication date: April 6, 2006
    Applicant: Kabushiki Kaisha Somic Ishikawa
    Inventors: Hidenori Kanno, Ryota Shimura, Masanori Itagaki
  • Publication number: 20060070834
    Abstract: It is an object of the present invention to provide a rotary damper capable of automatically adjusting an exhibited braking force in correspondence with variation in load. A fluid chamber 2 into which viscous fluid is charged is formed in a casing 1. A vane 3 is disposed in the fluid chamber 2. The vane 3 is formed with a fluid passage 5, and is provided with a valve 6. The valve 6 automatically varies a flow rate of the viscous fluid passing through the fluid passage 5 in correspondence with variation in load. With this structure, it is possible to automatically adjust the exhibited braking force in correspondence with variation in load caused by variation in rotational motion of a subject to be controlled, and to reduce variation in rotation speed of the subject to be controlled to an extremely small value.
    Type: Application
    Filed: November 30, 2005
    Publication date: April 6, 2006
    Applicant: Kabushiki Kaisha Somic Ishikawa
    Inventors: Hidenori Kanno, Ryota Shimura, Masanori Itagaki
  • Publication number: 20050205370
    Abstract: An object of the invention is to provide a rotary damper which can individually control two controlled subjects independently rotatable with each other by utilizing both a viscous resistance by a viscous material and a resistance by a viscous fluid and putting properties thereof to good use. A rotary damper (1A) is provided with first and second chambers (4, 5) which are separated by a partition wall (3), a rotor (6) which is rotatably arranged within the first chamber (4), a viscous material (7) which is filled in a slight gap between the rotor (6) and a slidable contact surface slidably contacted with the rotor (6), a viscous fluid (11) which is filled in the second chamber (5), and a vane (12) which is swingably arranged within the second chamber (5) filled with the viscous fluid (11).
    Type: Application
    Filed: May 28, 2003
    Publication date: September 22, 2005
    Applicant: Kabushiki Kaisha Somic Ishikawa
    Inventors: Hidenori Kanno, Ryota Shimura, Masanori Itagaki
  • Publication number: 20050006189
    Abstract: It is an object of the present invention to provide a rotary damper capable of automatically adjusting an exhibited braking force in correspondence with variation in load. A fluid chamber 2 into which viscous fluid is charged is formed in a casing 1. A vane 3 is disposed in the fluid chamber 2. The vane 3 is formed with a fluid passage 5, and is provided with a valve 6. The valve 6 automatically varies a flow rate of the viscous fluid passing through the fluid passage 5 in correspondence with variation in load. With this structure, it is possible to automatically adjust the exhibited braking force in correspondence with variation in load caused by variation in rotational motion of a subject to be controlled, and to reduce variation in rotation speed of the subject to be controlled to an extremely small value.
    Type: Application
    Filed: September 25, 2002
    Publication date: January 13, 2005
    Inventors: Hidenori Kanno, Ryota Shimura, Masanori Itagaki
  • Patent number: 5306842
    Abstract: A method for manufacturing a purified aromatic urethane. Aromatic urethanes are synthesized from a N,N'-disubstituted urea and an organic hydroxyl compound in a reaction medium. The organic hydroxyl compound and the primary aromatic amine side product which are present in the reaction mixture is distilled off and removed from the reaction mixture leaving a distillation bottom. The N,N'-disubstituted urea is separated and removed from the distillation bottom by solvent extraction of the aromatic urethane, and the aromatic urethane in the extract phase obtained in said solvent extraction is separated and purified.
    Type: Grant
    Filed: April 29, 1992
    Date of Patent: April 26, 1994
    Assignee: NKK Corporation
    Inventors: Takao Ikariya, Masanori Itagaki, Masatsugu Mizuguchi, Makoto Miyazawa, Sachiko Yamamoto
  • Patent number: 5130464
    Abstract: A method of manufacturing aromatic urethanes utilizes a urea production process wherein a primary aromatic amine, an aromatic nitro-compound and carbon monoxide are made to react together in the presence of a catalyst and solvents, to produce N,N'-disubstituted urea, the solvlent used in the urea production process consisting at least partly of an amide or oxygen-containing sulfur compound, and having the functions of stabilizing the catalyst and preventing it from separating out in a solution, and of increasing the activity of the catalyst, the quantity of the solvent being sufficient to permit it to fulfill these functions effectively. The method additionally includes an aromatic urethane production process wherein the N,N'-disubstituted urea produced is made to react with an organic compound containing hydroxyl groups, to produce a primary aromatic amine and aromatic urethane, the primary aromatic amine being separated to obtain the aromatic urethane.
    Type: Grant
    Filed: March 16, 1990
    Date of Patent: July 14, 1992
    Assignee: NKK Corporation
    Inventors: Takao Ikariya, Masanori Itagaki, Mikoto Iemoto, Masatsugu Mizuguchi, Tetsuo Hachiya, Tomomichi Nakamura, Makoto Miyazawa, Sachiko Yamamoto
  • Patent number: 5053845
    Abstract: A thin-film device having the structure of a bipolar transistor is provided. The device has three thin-films formed one on another to form emitter, base and collector regions, thereby providing a NPN or PNP structure depending on the impurities contained in these thin-films. The present bipolar thin-film device is particularly useful as a phototransistor, though use is not limited only for this. A non-transparent, insulating layer having an opening may be provided to limit the passage of light and to improve the transistor characteristics.
    Type: Grant
    Filed: February 20, 1990
    Date of Patent: October 1, 1991
    Assignee: Ricoh Company, Ltd.
    Inventors: Koji Mori, Hideo Segawa, Masanori Itagaki
  • Patent number: RE34137
    Abstract: The present invention relates to a method of manufacturing aromatic urethane, an aromatic mononitro-compound, an aromatic primary amine, and carbon monoxide being reacted using a catalyst containing a platinum group metal-containing compound as a major constituent to prepare N,N'-di-substituted urea. The resultant N,N'-di-substituted urea is reacted with a hydroxyl group-containing organic compound to prepare an aromatic primary amine and aromatic urethane, and the aromatic primary amine is separated to obtain aromatic urethane.
    Type: Grant
    Filed: October 12, 1989
    Date of Patent: December 1, 1992
    Assignee: NKK Corporation
    Inventors: Takao Ikariya, Masanori Itagaki, Masatsugu Mizuguchi, Itaru Sakai, Osamu Tajima