Patents by Inventor Masanori Kohgo

Masanori Kohgo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10418629
    Abstract: Provided are: an anode active material for a lithium ion secondary battery with which high initial efficiency and battery capacity can be maintained and excellent cycling characteristics are achieved; and a method for producing such an active material. The anode active material for a lithium ion secondary battery, the active material comprising a Si compound and a carbonaceous material or a carbonaceous material and graphite, is obtained by a method comprising the steps of: mixing a Si compound, a carbon precursor, and, as appropriate, graphite powder; performing granulation/compaction; pulverizing the mixture to form composite particles; firing the composite particles in an inert gas atmosphere; and subjecting the pulverized and conglobated composite powder or the fired powder to air classification.
    Type: Grant
    Filed: March 20, 2015
    Date of Patent: September 17, 2019
    Assignee: TOSOH CORPORATION
    Inventors: Hidehiko Misaki, Masanori Abe, Toru Tsuyoshi, Masanori Kohgo, Shuji Takato, Taichi Arakawa, Kohei Iwanaga
  • Publication number: 20170084913
    Abstract: Provided are: an anode active material for a lithium ion secondary battery with which high initial efficiency and battery capacity can be maintained and excellent cycling characteristics are achieved; and a method for producing such an active material. The anode active material for a lithium ion secondary battery, the active material comprising a Si compound and a carbonaceous material or a carbonaceous material and graphite, is obtained by a method comprising the steps of: mixing a Si compound, a carbon precursor, and, as appropriate, graphite powder; performing granulation/compaction; pulverizing the mixture to form composite particles; firing the composite particles in an inert gas atmosphere; and subjecting the pulverized and conglobated composite powder or the fired powder to air classification.
    Type: Application
    Filed: March 20, 2015
    Publication date: March 23, 2017
    Applicant: TOSOH CORPORATION
    Inventors: Hidehiko MISAKI, Masanori ABE, Toru TSUYOSHI, Masanori KOHGO, Shuji TAKATO, Taichi ARAKAWA, Kohei IWANAGA
  • Patent number: 8637154
    Abstract: A subject for the invention is to provide a process for ceramic bead production in which ceramic beads with smooth surfaces are obtained by a simpler method without using a complicated process involving, for example, a DC plasma/radio-frequency plasma combination or a two-stage radio-frequency plasma. Another subject is to provide such ceramic beads. The invention relates to a technique in which a preheated raw ceramic material is introduced into a laminar-flow thermal plasma obtained using a high-voltage type direct-current (DC) plasma gun and is cooled and solidified and the resultant ceramic beads are collected.
    Type: Grant
    Filed: December 8, 2009
    Date of Patent: January 28, 2014
    Assignee: Tosoh Corporation
    Inventors: Masanori Kohgo, Koyata Takahashi
  • Publication number: 20110244239
    Abstract: A subject for the invention is to provide a process for ceramic bead production in which ceramic beads with smooth surfaces are obtained by a simpler method without using a complicated process involving, for example, a DC plasma/radio-frequency plasma combination or a two-stage radio-frequency plasma. Another subject is to provide such ceramic beads. The invention relates to a technique in which a preheated raw ceramic material is introduced into a laminar-flow thermal plasma obtained using a high-voltage type direct-current (DC) plasma gun and is cooled and solidified and the resultant ceramic beads are collected.
    Type: Application
    Filed: December 8, 2009
    Publication date: October 6, 2011
    Applicant: TOSOH CORPORATION
    Inventors: Masanori Kohgo, Koyata Takahashi
  • Patent number: 7338699
    Abstract: In film-forming devices and plasma-processing devices, filmy matter adheres to the surfaces of the inner parts and it peels to cause dust and particles in the devices. In the devices, the dust and particles contaminate the objects for film formation thereon or the objects to be processed with plasma. For preventing the objects from being contaminated with them, the inner parts of the devices must be frequently exchanged every time when they have received any minor filmy matter thereon, and this lowers the productivity in the devices. When a modified glass part of which the surface is modified with spherical or bell-like island projections having a width and a height of from a few ?m to a few hundreds ?m is used in a film-forming device and in a plasma-processing device, then its ability to hold the filmy substance having adhered thereto is good and its resistance to plasma is also good.
    Type: Grant
    Filed: October 30, 2003
    Date of Patent: March 4, 2008
    Assignee: Tosoh Corporation
    Inventors: Koyata Takahashi, Masanori Kohgo, Osamu Matsunaga
  • Patent number: 7081290
    Abstract: Parts, especially those formed of quartz glass, for film-forming devices, plasma-treating devices and the like have a problem of inner pollution of the devices with particles given by dropping of deposit films from the parts, a problem of hermetical sealing reduction due to bonding failure of the parts to other parts, and a problem of energy efficiency reduction due to the heat insulation failure in the parts. Parts having a thermal sprayed quartz glass film formed on a substrate have an increased ability to hold a deposit thereon, and have an increased ability to hermetically bond to other parts. The parts having a thermal sprayed black quartz glass film have an increased ability of heat insulation property. Even when washed with acid, the abilities of the parts do not lower. The parts can be used for a long period of time and their life is long.
    Type: Grant
    Filed: April 3, 2003
    Date of Patent: July 25, 2006
    Assignee: Tosoh Corporation
    Inventors: Koyata Takahashi, Masanori Kohgo
  • Publication number: 20060019103
    Abstract: Members to be used in CVD devices, plasma treatment devices, etc. are exhausted by reaction with a corrosive gas or etching with plasma, and therefore, there were encountered problems such as staining of products due to the generation of particles and a reduction of the yield productivity. Also, glasses resistant to corrosive gases or plasma are weak in the heat resistance, and therefore, applications to be employed were limited. Members containing a heat-resisting base material having coated thereon a corrosion resistant glass containing at least one element selected from the group consisting of elements of the group 2a, group 3a and group 4a, especially an aluminosilicate or zirconia silicate based glass sprayed coating have high corrosion resistance to corrosive gases and plasma and high heat resistance and are less in the generation of particles.
    Type: Application
    Filed: January 26, 2004
    Publication date: January 26, 2006
    Inventors: Masanori Abe, Koyata Takahashi, Kazuyoshi Arai, Tsutomu Takahata, Shinkichi Hashimoto, Masanori Kohgo
  • Publication number: 20040086689
    Abstract: In film-forming devices and plasma-processing devices, filmy matter adheres to the surfaces of the inner parts and it peels to cause dust and particles in the devices. In the devices, the dust and particles contaminate the objects for film formation thereon or the objects to be processed with plasma. For preventing the objects from being contaminated with them, the inner parts of the devices must be frequently exchanged every time when they have received any minor filmy matter thereon, and this lowers the productivity in the devices. When a modified glass part of which the surface is modified with spherical or bell-like island projections having a width and a height of from a few &mgr;m to a few hundreds &mgr;m is used in a film-forming device and in a plasma-processing device, then its ability to hold the filmy substance having adhered thereto is good and its resistance to plasma is also good.
    Type: Application
    Filed: October 30, 2003
    Publication date: May 6, 2004
    Applicant: TOSOH CORPORATION
    Inventors: Koyata Takahashi, Masanori Kohgo, Osamu Matsunaga
  • Publication number: 20040018361
    Abstract: Parts, especially those formed of quartz glass, for film-forming devices, plasma-treating devices and the like have a problem of inner pollution of the devices with particles given by dropping of deposit films from the parts, a problem of hermetical sealing reduction due to bonding failure of the parts to other parts, and a problem of energy efficiency reduction due to the heat insulation failure in the parts. Parts having a thermal sprayed quartz glass film formed on a substrate have an increased ability to hold a deposit thereon, and have an increased ability to hermetically bond to other parts. The parts having a thermal sprayed black quartz glass film have an increased ability of heat insulation property. Even when washed with acid, the abilities of the parts do not lower. The parts can be used for a long period of time and their life is long.
    Type: Application
    Filed: April 3, 2003
    Publication date: January 29, 2004
    Applicant: TOSOH QUARTZ CORPORATION
    Inventors: Koyata Takahashi, Masanori Kohgo