Patents by Inventor Masanori Miyamoto
Masanori Miyamoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11913813Abstract: A power generation element includes a magnetic member that produces a large Barkhausen effect and magnetism collection members including an insertion part having the magnetic member inserted therethrough. The magnetism collection member includes a first component on an opposite side of a boundary plane to a magnetic field generation unit and a second component on the same side of the boundary plane as the magnetic field generation unit, the boundary plane passing through a center of an imaginary circle inscribed in the insertion part and having a diameter equal to a length of the insertion part in a third direction perpendicular to first and second directions, the first direction is a direction of the insertion of the magnetic member, and the second direction is a direction in which the magnetic field generation unit is disposed. A volume of the second component is larger than a volume of the first component.Type: GrantFiled: December 27, 2021Date of Patent: February 27, 2024Assignee: MITSUBISHI ELECTRIC CORPORATIONInventors: Yoshitomo Nakamura, Yoshinori Miyamoto, Shinichiro Yoshida, Hisanori Torii, Takeshi Musha, Masanori Nimura, Shizuka Ueda, Takuya Noguchi, Toshio Mekata, Yuji Kubo, Hitoshi Hasegawa
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Patent number: 11760934Abstract: The compound is represented by general formula (i). In the compound, in a group Ki1, at least two secondary carbon atoms in an alkyl group (a linear alkyl, halogenated alkyl, or cyanogenated alkyl group having 3 to 40 carbon atoms) are replaced with —C(?Xi1)— and/or —CH(—CN)—, where Xi1 is an oxygen atom, a sulfur atom, NH, or NR13; in addition, a group Ai2, a group Ai3, or the group Ki1 includes, as a substituent, at least one Pi1-Spi1- group, where Pi1 is a polymerizable group, and SPi1 is a spacer group or a single bond. The liquid crystal composition including the compound represented by general formula (i) can be adsorbed onto substrates between which a liquid crystal layer is held, and, consequently, without the use of an alignment film, liquid crystal molecules can be maintained in a state in which the liquid crystal molecules are aligned in a vertical direction.Type: GrantFiled: November 1, 2018Date of Patent: September 19, 2023Assignee: DIC CORPORATIONInventors: Kenta Shimizu, Masanao Hayashi, Yutaka Kadomoto, Tetsuo Kusumoto, Ayaki Hosono, Shinya Yamamoto, Masanori Miyamoto, Hidetomo Kai
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Publication number: 20230151143Abstract: An object of the present disclosure is to provide a method for producing an aliphatic polyester resin which substantially does not contain impurities, such as metals, and which has high molecular weight, particularly a polylactic acid having high molecular weight and high optical purity. The method for producing an aliphatic polyester resin of the present disclosure has a step of contacting a solution containing a cyclic ester with a cyclic amine catalyst and a polymerization initiator to initiate a reaction, a step of conducting the reaction by flow-type polymerization, and a step of subjecting the product obtained in the flow-type polymerization to further reaction by postpolymerization by stirring.Type: ApplicationFiled: March 31, 2021Publication date: May 18, 2023Applicant: TEIJIN LIMITEDInventors: Takaya MASUDA, Masanori MIYAMOTO
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Patent number: 11487204Abstract: To provide a resist material that can form a film with high smoothness and uniformity and has high patterning performance, such as resolution, a resist material is provided that contains a calixarene compound (A) with a molecular structure represented by the following structural formula (1) and a resin component (B); wherein R1 denotes a perfluoroalkyl group or a structural moiety with a perfluoroalkyl group; R2 denotes a hydrogen atom, a polar group, a polymerizable group, or a structural moiety with a polar group or a polymerizable group; R3 denotes a hydrogen atom, an aliphatic hydrocarbon group that optionally has a substituent, or an aryl group that optionally has a substituent; n denotes an integer in the range of 2 to 10; and * denotes a bonding point with an aromatic ring.Type: GrantFiled: July 3, 2018Date of Patent: November 1, 2022Assignee: DIC CorporationInventors: Tomoyuki Imada, Shinya Yamamoto, Masanori Miyamoto
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Patent number: 11479569Abstract: There are provided a compound represented by general formula (1), a photopolymerization initiator comprising this compound, a photocurable composition having this photopolymerization initiator and a photocurable compound as essential components, and a cured product formed by curing this photocurable composition, wherein in formula (1), R1 and R2 each independently represents an alkyl group or the like; R3 to R5 each independently represent a hydrogen atom, an alkyl group or the like; X1 represents a single bond or an alkylene group; and X2 represents a bonding group represented by general formulas (2) to (4), and wherein n represents an integer of 1 to 6, when n is an integer of 1, Y represents an alkyl group, an aryl group or the like.Type: GrantFiled: October 10, 2017Date of Patent: October 25, 2022Assignee: DIC CORPORATIONInventors: Masanori Miyamoto, Tomokazu Yamada, Yong Fang, Fangxi Xiu, Changjun Deng
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Patent number: 11472763Abstract: A calixarene compound represented by formula (1) below is provided. The calixarene compound contains, per molecule, at least one —CH2OH group or phenolic hydroxy group and at least one carbon-carbon unsaturated bond. R1's are a structural moiety (A), which has a —CH2OH group; a structural moiety (B), which has a carbon-carbon unsaturated bond; a structural moiety (C), which has a —CH2OH group and a carbon-carbon unsaturated bond; a monovalent organic group (D), which is different from (A), (B), and (C); or a hydrogen atom (E). R2's are (A), (B), (C), (D), or (E) provided that not all R2's are (E). R3's are one of a hydrogen atom, an aliphatic hydrocarbon group, and an aryl group, n is 2 to 10. * is a point of attachment to an aromatic ring. A curable composition including the calixarene compound is provided.Type: GrantFiled: July 19, 2018Date of Patent: October 18, 2022Assignee: DIC CorporationInventors: Shinya Yamamoto, Yutaka Kadomoto, Masanori Miyamoto, Tomoyuki Imada, Hidetomo Kai
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Publication number: 20220315527Abstract: Provided is a calixarene compound represented by structural formula (1). In structural formula (1), R1 and R2 each independently represent a structural moiety (A) having a functional group (I), a structural moiety (B) having a functional group (II) having a carbon-carbon unsaturated bond (excluding maleate groups), a structural moiety (C) having both the functional group (I) and the functional group (II), a monovalent organic group (D) that has 1 to 20 carbon atoms and is other than the structural moieties (A), (B) and (C), or a hydrogen atom (E). At least one of a plurality of R2s is the structural moiety (A), the structural moiety (B), the structural moiety (C), or the organic group (D).Type: ApplicationFiled: May 15, 2019Publication date: October 6, 2022Applicant: DIC CorporationInventors: Shinya Yamamoto, Masanori Miyamoto, Hidetomo Kai, Tomoyuki Imada, Yutaka Kadomoto
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Patent number: 11111225Abstract: A compound useful as a release agent, and a release agent, a curable composition, and a nanoimprint lithography resin material each containing the compound are provided. More specifically, a calixarene compound with a molecular structure represented by the following structural formula (1) and a composition containing the calixarene compound are provided. wherein R1 denotes a structural moiety with a perfluoroalkyl group, R2 denotes a hydrogen atom, a polar group, a polymerizable group, or a structural moiety with a polar group or a polymerizable group, R3 denotes a hydrogen atom, an aliphatic hydrocarbon group that may have a substituent, or an aryl group that may have a substituent, n denotes an integer in the range of 2 to 10, and * denotes a bonding point with an aromatic ring.Type: GrantFiled: November 16, 2017Date of Patent: September 7, 2021Assignee: DIC CorporationInventors: Shinya Yamamoto, Masanori Miyamoto, Tomoyuki Imada
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Patent number: 11079675Abstract: A novel compound is used as a novel photopolymerization initiator, the novel compound having a molecular structure represented by general formula 1 below [R1 represents an alkyl group having 1 to 10 carbon atoms, R2 represents an alkyl group having 1 to 12 carbon atoms or the like, R3 represents an alkyl group having 1 to 12 carbon atoms or the like, R4 to R7 each independently represent a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, or the like, Y1 represents an alkyl group having 3 to 19 carbon atoms or the like, Y2 represents an organic linking group, X1 represents an ethylene group or the like, X2 and X3 each represent an ethylene group or the like, Y3 represents a single bond or an alkylidene group, and n represents an integer of 1 to 3].Type: GrantFiled: February 21, 2017Date of Patent: August 3, 2021Assignee: DIC CORPORATIONInventors: Masanori Miyamoto, Keisuke Wakahara, Tomokazu Yamada
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Publication number: 20210198178Abstract: A calixarene compound represented by formula (1) below is provided. The calixarene compound contains, per molecule, at least one —CH2OH group or phenolic hydroxy group and at least one carbon-carbon unsaturated bond. R1's are a structural moiety (A), which has a —CH2OH group; a structural moiety (B), which has a carbon-carbon unsaturated bond; a structural moiety (C), which has a —CH2OH group and a carbon-carbon unsaturated bond; a monovalent organic group (D), which is different from (A), (B), and (C); or a hydrogen atom (E). R2's are (A), (B), (C), (D), or (E) provided that not all R2's are (E). R3's are one of a hydrogen atom, an aliphatic hydrocarbon group, and an aryl group. n is 2 to 10. * is a point of attachment to an aromatic ring. A curable composition including the calixarene compound is provided. A cured product of the curable composition is provided.Type: ApplicationFiled: July 19, 2018Publication date: July 1, 2021Inventors: Shinya Yamamoto, Yutaka Kadomoto, Masanori Miyamoto, Tomoyuki Imada, Hidetomo Kai
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Patent number: 10961405Abstract: The invention provides a fluorine-containing acetophenone derivative which is useful as an additive that can impart excellent antifouling properties and scratch resistance to the surface of a cured coating and that also offers high transparency of the coating; a fluoroadditive and an active energy ray curable composition which each include the above derivative; a cured product of the composition; and an article having a cured coating of the composition.Type: GrantFiled: September 9, 2019Date of Patent: March 30, 2021Assignee: DIC CorporationInventors: Masanori Miyamoto, Yu Asano
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Patent number: 10921490Abstract: Provided are an active energy ray-curable composition which has a low viscosity suitable for coating and also exhibits a high refractive index in terms of a cured product thereof, a cured product thereof, and a plastic lens. The active energy ray-curable composition contains a phenylbenzyl (meth)acrylate (A) and a bicarbazole compound (B) represented by the following structural formula (1) (in the formula, X1 and X2 each independently represent a photopolymerizable functional group, a structural moiety having a photopolymerizable functional group, or a hydrogen atom, provided that at least one of X1 and X2 represents a photopolymerizable functional group or a structural moiety having a photopolymerizable functional group; and R1 and R2 each independently represent a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, an alkoxy group having 1 to 4 carbon atoms, a bromine atom, or a chlorine atom).Type: GrantFiled: October 6, 2016Date of Patent: February 16, 2021Assignee: DIC CorporationInventors: Yasuko Odani, Masanori Miyamoto, Nobuo Kobayashi, Changjun Deng, Xia Yang
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Publication number: 20200308488Abstract: The compound is represented by general formula (i). In the compound, in a group Ki1, at least two secondary carbon atoms in an alkyl group (a linear alkyl, halogenated alkyl, or cyanogenated alkyl group having 3 to 40 carbon atoms) are replaced with —C(?Xi1)— and/or —CH(—CN)—, where Xi1 is an oxygen atom, a sulfur atom, NH, or NR13; in addition, a group Ai2, a group Ai3, or the group Ki1 includes, as a substituent, at least one Pi1-Spi1- group, where Pi1 is a polymerizable group, and SPi1 is a spacer group or a single bond. The liquid crystal composition including the compound represented by general formula (i) can be adsorbed onto substrates between which a liquid crystal layer is held, and, consequently, without the use of an alignment film, liquid crystal molecules can be maintained in a state in which the liquid crystal molecules are aligned in a vertical direction.Type: ApplicationFiled: November 1, 2018Publication date: October 1, 2020Applicant: DIC CorporationInventors: Kenta Shimizu, Masanao Hayashi, Yutaka Kadomoto, Tetsuo Kusumoto, Ayaki Hosono, Shinya Yamamoto, Masanori Miyamoto, Hidetomo Kai
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Publication number: 20200270286Abstract: There are provided a compound represented by general formula (1), a photopolymerization initiator comprising this compound, a photocurable composition having this photopolymerization initiator and a photocurable compound as essential components, and a cured product formed by curing this photocurable composition, wherein in formula (1), R1 and R2 each independently represents an alkyl group or the like; R3 to R5 each independently represent a hydrogen atom, an alkyl group or the like; X1 represents a single bond or an alkylene group; and X2 represents a bonding group represented by general formulas (2) to (4), and wherein n represents an integer of 1 to 6, when n is an integer of 1, Y represents an alkyl group, an aryl group or the like.Type: ApplicationFiled: October 10, 2017Publication date: August 27, 2020Applicant: DIC CorporationInventors: Masanori Miyamoto, Tomokazu Yamada, Yong Fang, Fangxi Xiu, Changjun Deng
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Publication number: 20200166838Abstract: To provide a resist material that can form a film with high smoothness and uniformity and has high patterning performance, such as resolution, a resist material is provided that contains a calixarene compound (A) with a molecular structure represented by the following structural formula (1) and a resin component (B); wherein R1 denotes a perfluoroalkyl group or a structural moiety with a perfluoroalkyl group; R2 denotes a hydrogen atom, a polar group, a polymerizable group, or a structural moiety with a polar group or a polymerizable group; R3 denotes a hydrogen atom, an aliphatic hydrocarbon group that optionally has a substituent, or an aryl group that optionally has a substituent; n denotes an integer in the range of 2 to 10; and * denotes a bonding point with an aromatic ring.Type: ApplicationFiled: July 3, 2018Publication date: May 28, 2020Applicant: DIC CorporationInventors: Tomoyuki Imada, Shinya Yamamoto, Masanori Miyamoto
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Patent number: 10527755Abstract: Provided are an active energy ray-curable composition which has a viscosity suitable for coating and also has a super high refractive index at a level higher than ever, a cured product thereof, and a plastic lens. The active energy ray-curable composition contains zirconium oxide nanoparticles (A) and a bicarbazole compound (B) represented by the following structural formula (1) (in the formula, X1 and X2 each independently represent a photopolymerizable functional group, a structural moiety having a photopolymerizable functional group, or a hydrogen atom, provided that at least one of X1 and X2 represents a photopolymerizable functional group or a structural moiety having a photopolymerizable functional group; and R1 and R2 each independently represent a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, an alkoxy group having 1 to 4 carbon atoms, a bromine atom, or a chlorine atom).Type: GrantFiled: October 6, 2016Date of Patent: January 7, 2020Assignee: DIC CorporationInventors: Yasuko Odani, Masanori Miyamoto, Nobuo Kobayashi, Naohiro Takeshita, Ena Takeshita, Changjun Deng, Xia Yang
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Publication number: 20200002554Abstract: The invention provides a fluorine-containing acetophenone derivative which is useful as an additive that can impart excellent antifouling properties and scratch resistance to the surface of a cured coating and that also offers high transparency of the coating; a fluoroadditive and an active energy ray curable composition which each include the above derivative; a cured product of the composition; and an article having a cured coating of the composition.Type: ApplicationFiled: September 9, 2019Publication date: January 2, 2020Inventors: Masanori Miyamoto, Yu Asano
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Publication number: 20190276421Abstract: A compound useful as a release agent, and a release agent, a curable composition, and a nanoimprint lithography resin material each containing the compound are provided. More specifically, a calixarene compound with a molecular structure represented by the following structural formula (1) and a composition containing the calixarene compound are provided. wherein R1 denotes a structural moiety with a perfluoroalkyl group, R2 denotes a hydrogen atom, a polar group, a polymerizable group, or a structural moiety with a polar group or a polymerizable group, R3 denotes a hydrogen atom, an aliphatic hydrocarbon group that may have a substituent, or an aryl group that may have a substituent, n denotes an integer in the range of 2 to 10, and * denotes a bonding point with an aromatic ring.Type: ApplicationFiled: November 16, 2017Publication date: September 12, 2019Inventors: Shinya Yamamoto, Masanori Miyamoto, Tomoyuki Imada
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Patent number: 10336696Abstract: A photopolymerizable material contains, as a main polymerization component, a bicarbazole compound represented by structural formula (1). In structural formula (1), X1 and X2 are each independently a photopolymerizable functional group, a structural site having a photopolymerizable functional group, or a hydrogen atom, at least one of X1 and X2 is a photopolymerizable functional group or a structural site having a photopolymerizable functional group, R1 and R2 are each independently a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, an alkoxy group having 1 to 4 carbon atoms, a bromine atom, or a chlorine atom, and at least one of R1 and R2 is a hydrogen atom.Type: GrantFiled: April 30, 2014Date of Patent: July 2, 2019Assignee: DIC CorporationInventors: Changjun Deng, Masanori Miyamoto, Nobuo Kobayashi, Xia Yang
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Publication number: 20190137872Abstract: A novel compound is used as a novel photopolymerization initiator, the novel compound having a molecular structure represented by general formula 1 below [R1 represents an alkyl group having 1 to 10 carbon atoms, R2 represents an alkyl group having 1 to 12 carbon atoms or the like, R3 represents an alkyl group having 1 to 12 carbon atoms or the like, R4 to R7 each independently represent a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, or the like, Y1 represents an alkyl group having 3 to 19 carbon atoms or the like, Y2 represents an organic linking group, X1 represents an ethylene group or the like, X2 and X3 each represent an ethylene group or the like, Y3 represents a single bond or an alkylidene group, and n represents an integer of 1 to 3].Type: ApplicationFiled: February 21, 2017Publication date: May 9, 2019Applicant: DIC CorporationInventors: Masanori Miyamoto, Keisuke Wakahara, Tomokazu Yamada