Patents by Inventor Masanori Nagao

Masanori Nagao has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7976893
    Abstract: A heavily boron-doped diamond thin film having superconductivity is deposited by chemical vapor deposition using gas mixture of at least carbon compound and boron compound, including hydrogen. An advantage of the diamond thin film deposited by the chemical vapor deposition is that it can contain boron at high concentration, especially in (111) oriented films. The boron-doped diamond thin film deposited by the chemical vapor deposition shows the characteristics of typical type II superconductor.
    Type: Grant
    Filed: May 20, 2005
    Date of Patent: July 12, 2011
    Assignee: National Institute for Materials Science
    Inventors: Yoshihiko Takano, Masanori Nagao, Minoru Tachiki, Hiroshi Kawarada, Hitoshi Umezawa, Kensaku Kobayashi
  • Patent number: 7008906
    Abstract: The present invention relates to a defect-free oxide high-critical temperature superconductor acicular crystal, that is, an oxide high-critical temperature superconductor acicular crystal that is substantially a perfect crystal and also relates to a method for producing the same, wherein such a crystal is essential for achieving superconducting electronic devices. The oxide high-critical temperature superconductor acicular crystal of the present invention includes an acicular crystal having a Bi2Sr2Ca2Cu3O10 (Bi-2223) crystal structure and is grown from a powder compact by heat-treating the powder compact in an oxygen atmosphere, wherein the powder compact contains an oxide having the Bi-2223 crystal structure and TeO2, CaO, or (SrCa)3TeO6. The achievement of the acicular crystal having the Bi-2223 crystal structure contributes to the development of superconducting electronic devices that have been theoretically proposed but have not been achieved.
    Type: Grant
    Filed: June 10, 2002
    Date of Patent: March 7, 2006
    Assignee: Japan Science and Technology Agency
    Inventors: Mitsunori Sato, Tsutomu Yamashita, Hiroshi Maeda, Sangjae Kim, Masanori Nagao
  • Publication number: 20060035788
    Abstract: A heavily boron-doped diamond thin film having superconductivity is deposited by chemical vapor deposition using gas mixture of at least carbon compound and boron compound, including hydrogen. An advantage of the diamond thin film deposited by the chemical vapor deposition is that it can contain boron at high concentration, especially in (111) oriented films. The boron-doped diamond thin film deposited by the chemical vapor deposition shows the characteristics of typical type II superconductor.
    Type: Application
    Filed: May 20, 2005
    Publication date: February 16, 2006
    Inventors: Yoshihiko Takano, Masanori Nagao, Minoru Tachiki, Hiroshi Kawarada, Hitoshi Umezawa, Kensaku Kobayashi
  • Publication number: 20040171493
    Abstract: The present invention relates to a defect-free oxide high-critical temperature superconductor acicular crystal, that is, an oxide high-critical temperature superconductor acicular crystal that is substantially a perfect crystal and also relates to a method for producing the same, wherein such a crystal is essential for achieving superconducting electronic devices. The oxide high-critical temperature superconductor acicular crystal of the present invention includes an acicular crystal having a Bi2Sr2Ca2Cu3O10 (Bi-2223) crystal structure and is grown from a powder compact by heat-treating the powder compact in an oxygen atmosphere, wherein the powder compact contains an oxide having the Bi-2223 crystal structure and TeO2, CaO, or (SrCa)3TeO6. The achievement of the acicular crystal having the Bi-2223 crystal structure contributes to the development of superconducting electronic devices that have been theoretically proposed but have not been achieved.
    Type: Application
    Filed: January 13, 2004
    Publication date: September 2, 2004
    Inventors: Mitsunori Sato, Tsutomu Yamashita, Hiroshi Maeda, Sangjae Kim, Masanori Nagao
  • Patent number: 3962207
    Abstract: When hydrogen halide salts of L-aspartic anhydride are reacted with lower alkyl esters of L-phenylalanine to produce the corresponding L-aspartyl-L-phenylalanine esters, a significant increase in yield and in the proportion of the .alpha.-isomer to the .beta.-isomer is achieved when the reaction is carried out in the presence of a lower alkanol and of a strong acid, such as sulfuric acid, hydrogen chloride, or mono-esters of sulfuric acid with a lower alkanol.
    Type: Grant
    Filed: December 20, 1974
    Date of Patent: June 8, 1976
    Assignee: Ajinomoto Co., Inc.
    Inventors: Noboru Uchiyama, Masanori Nagao, Naomasa Mizoguchi