Patents by Inventor Masanori Odaka
Masanori Odaka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 5519658Abstract: Disclosed are a semiconductor integrated circuit device and methods for production thereof. An embodiment of the invention is a semiconductor chip that comprises fuses constituting part of redundancy circuits formed therein, the fuses being made of the same ingredients CCB bump substrate metal. The fuses are patterned simultaneously during the patterning of the CCB bump substrate metal. This involves forming the fuses using at least part of the ingredients of an electrode conductor pattern in the chip. The cutting regions of the fuses are made of only one of the metal layers constituting the substrate. The principal plane of the semiconductor chip has a fuse protective film formed over at least the cutting regions of the fuses for protection of the latter. In operation, a switch MOSFET under switching control of a redundancy signal is used to select one of two transmission paths, one carrying an address signal or a decode signal, the other carrying a reference voltage.Type: GrantFiled: November 1, 1994Date of Patent: May 21, 1996Assignee: Hitachi, Ltd.Inventors: Takayuki Uda, Toshiro Hiramoto, Nobuo Tamba, Hisashi Ishida, Kazuhiro Akimoto, Masanori Odaka, Tasuku Tanaka, Jun Hirokawa, Masayuki Ohayashi
-
Patent number: 5512497Abstract: Disclosed is a bipolar-CMOS LSI manufactured by a simplified process and realizing a higher density of integration as well as a higher operating speed, in which a base lead-out electrode of a bipolar transistor and respective gate electrodes of a p-channel MISFET and an n-channel MISFET of CMOS transistors are made of an identical conductor film, and the conductor film of the gate electrode of the p-channel MISFET is of p-type, while that of the gate electrode of the n-channel MISFET is of n-type.Type: GrantFiled: July 8, 1994Date of Patent: April 30, 1996Assignee: Hitachi, Ltd.Inventors: Takahide Ikeda, Kouichirou Yamada, Osamu Saito, Masanori Odaka, Nobuo Tamba, Katsumi Ogiue, Atsushi Hiraishi, Atsuo Watanabe, Mitsuru Hirao, Akira Fukami, Masayuki Ohayashi, Tadashi Kuramoto
-
Patent number: 5457412Abstract: A semiconductor integrated circuit device is provided for permitting operation of a CMOS or BiCMOS memory with ECL level input signals, in which operating speed is increased and power consumption is reduced.Input signals of ECL levels are received by an input buffer for amplifying the input signals to an output signal level within a range where differential transistors of the input buffer operate in an unsaturation region. The output signal of the input buffer is supplied to a CMOS circuit or Bi-CMOS circuit which is operated by both an operating voltage having a first-stage smaller absolute value than that of the operating voltage of the input buffer and the ground potential of the circuit. This first stage CMOS or BiCMOS circuit also includes an arrangement to further amplify the received signals to provide further level conversion.Type: GrantFiled: November 10, 1993Date of Patent: October 10, 1995Assignee: Hitachi, Ltd.Inventors: Nobuo Tamba, Masanori Odaka, Toshiro Hiramoto, Masayuki Ohayashi, Kayoko Saito
-
Patent number: 5398201Abstract: A circuit technique suitable to attain a high speed of a memory which is constructed in a manner such that memory cells include a field effect transistor and peripheral circuits include a bipolar transistor and a field effect transistor. According to the invention, a bipolar transistor whose collector is connected to a differential amplifier and which supplies a current to the differential amplifier in accordance with a signal which is inputted to a base or an emitter is added, and a bipolar transistor to supply a current only when writing to bit lines is connected. According to the invention, a high speed of the access time when information is read out by switching the selection bit line is accomplished. Further, the charge/discharge time of the bit line when information is written is reduced and a high speed of the writing time can be also accomplished.Type: GrantFiled: April 28, 1993Date of Patent: March 14, 1995Assignees: Hitachi, Ltd., Hitachi Device Engineering Co., Ltd.Inventors: Hiroaki Nambu, Noriyuki Homma, Kunihiko Yamaguchi, Hisayuki Higuchi, Kazuo Kanetani, Youji Idei, Ken'ichi Ohata, Yoshiaki Sakurai, Masanori Odaka, Goro Kitsukawa
-
Patent number: 5384738Abstract: A semiconductor integrated circuit device such as a memory device with logic function comprises a plurality of RAM macrocells and gate arrays. The RAM macrocells are constituted by bipolar CMOS RAMs having a total memory capacity of at least 100 kilobits, and the gate arrays contain at least 4000 gates. The logic circuits in the memory device with logic function or the like are constructed by selectively combining CMOS, bipolar CMOS or ECL gate circuits depending on the output load capacity, transmission characteristic requirement, power dissipation and required layout area. The level of signals at various circuits is set to the ECL level or MOS level depending on the local circuit configuration and other factors. The memory device further incorporates sequence control circuits required to be installed downstream of buffer storages of computers.Type: GrantFiled: February 1, 1994Date of Patent: January 24, 1995Assignees: Hitachi, Ltd., Hitachi Microcomputer System, Ltd.Inventors: Shuuichi Miyaoka, Kazuhisa Miyamoto, Masanori Odaka, Hideo Sawamoto, Michiaki Nakayama, Mitsugu Kusunoki, Masato Ikeda, Takashi Ogata, Kouji Kobayashi, Masao Kato, Tsutomu Sumimoto
-
Patent number: 5371713Abstract: In order to provide high speed and low power consumption, a semiconductor integrated circuit is constructed to utilize both CMOS elements and bipolar transistors. The bipolar transistors are used in the output portions to take advantage of their speed of operation to allow rapid charging and discharging of output lines. In the meantime, the principal operating portions of the circuit use CMOS elements of low power consumption. This arrangement is particularly advantageous in memory circuits.Type: GrantFiled: March 9, 1994Date of Patent: December 6, 1994Assignee: Hitachi, Ltd.Inventors: Katsumi Ogiue, Yukio Suzuki, Ikuro Masuda, Masanori Odaka, Hideaki Uchida
-
Patent number: 5360988Abstract: Disclosed are a semiconductor integrated circuit device and methods for production thereof. An embodiment of the invention is a semiconductor chip that comprises fuses constituting part of redundancy circuits formed therein, the fuses being made of the same ingredients as those of a CCB bump substrate metal. The fuses are patterned simultaneously during the patterning of the CCB bump substrate metal. This involves forming the fuses using at least part of the ingredients of an electrode conductor pattern in the chip. The cutting regions of the fuses are made of only one of the metal layers constituting the substrate. The principal plane of the semiconductor chip has a fuse protective film formed over at least the cutting regions of the fuses for protection of the latter. In operation, a switch MOSFET under switching control of a redundancy signal is used to select one of two transmission paths, one carrying an address signal or a decode signal, the other carrying a reference voltage.Type: GrantFiled: June 23, 1992Date of Patent: November 1, 1994Assignee: Hitachi, Ltd.Inventors: Takayuki Uda, Toshiro Hiramoto, Nobuo Tamba, Hisashi Ishida, Kazuhiro Akimoto, Masanori Odaka, Tasuku Tanaka, Jun Hirokawa, Masayuki Ohayashi
-
Patent number: 5354699Abstract: Disclosed is a bipolar-CMOS LSI manufactured by a simplified process and realizing a higher density of integration as well as a higher operating speed, in which a base lead-out electrode of a bipolar transistor and respective gate electrodes of a p-channel MISFET and an n-channel MISFET of CMOS transistors are made of an identical conductor film, and the conductor film of the gate electrode of the p-channel MISFET is of p-type, while that of the gate electrode of the n-channel MISFET is of n-type.Type: GrantFiled: October 22, 1992Date of Patent: October 11, 1994Assignee: Hitachi, Ltd.Inventors: Takahide Ikeda, Kouichirou Yamada, Osamu Saito, Masanori Odaka, Nobuo Tamba, Katsumi Ogiue, Atsushi Hiraishi, Atsuo Watanabe, Mitsuru Hirao, Akira Fukami, Masayuki Ohayashi, Tadashi Kuramoto
-
Patent number: 5311482Abstract: In order to provide high speed and low power consumption, a semiconductor integrated circuit is constructed to utilize both CMOS elements and bipolar transistors. The bipolar transistors are used in the output portions to take advantage of their speed of operation to allow rapid charging and discharging of output lines. In the meantime, the principal operating portions of the circuit use CMOS elements of low power consumption. This arrangement is particularly advantageous in memory circuits.Type: GrantFiled: July 16, 1993Date of Patent: May 10, 1994Assignee: Hitachi, Ltd.Inventors: Katsumi Ogiue, Yukio Suzuki, Ikuro Masuda, Masanori Odaka, Hideaki Uchida
-
Patent number: 5296755Abstract: Herein disclosed is a logic circuit which has an input bipolar transistor for receiving an input signal at its base; variable impedance circuit having at least a first P-channel MOSFET connected between a first supply voltage and the collector of the input bipolar transistor; a second N-channel MOSFET connected between the emitter of the input bipolar transistor and a second supply voltage; an output bipolar transistor connected between the first supply voltage and the output terminal of the circuit for receiving the collector potential of the input bipolar transistor at its base; and a third, pull-down MOSFET connected between the output terminal and the second or third supply voltage.Type: GrantFiled: November 27, 1991Date of Patent: March 22, 1994Assignee: Hitachi, Ltd.Inventors: Kazuhisa Miyamoto, Mitsugu Kusunoki, Masanori Odaka, Mitsuo Usami
-
Patent number: 5291445Abstract: A semiconductor integrated circuit device such as a memory device with logic function comprises a plurality of RAM macrocells and gate arrays. The RAM macrocells are constituted by bipolar CMOS RAMs having a total memory capacity of at least 100 kilobits, and the gate arrays contain at least 4000 gates. The logic circuits in the memory device with logic function or the like are constructed by selectively combining CMOS, bipolar CMOS or ECL gate circuits depending on the output load capacity, transmission characteristic requirement, power dissipation and required layout area. The level of signals at various circuits is set to the ECL level or MOS level depending on the local circuit configuration and other factors. The memory device further incorporates sequence control circuits required to be installed downstream of buffer storages of computers.Type: GrantFiled: September 28, 1990Date of Patent: March 1, 1994Assignees: Hitachi, Ltd., Hitachi Microcomputer System Ltd.Inventors: Shuuichi Miyaoka, Kazuhisa Miyamoto, Masanori Odaka, Hideo Sawamoto, Michiaki Nakayama, Mitsugu Kusunoki, Masato Ikeda, Takashi Ogata, Kouji Kobayashi, Masao Kato, Tsutomu Sumimoto
-
Patent number: 5255225Abstract: A semiconductor integrated circuit device including a level conversion circuit in which the simplifying of the circuit and the increasing of the speed of operation have been attained is provided.A pair of complementary output signals amplified to a required signal level by a current switch circuit including differential transistors which receive an input signal and a reference voltage are inputted into a pair of emitter follower circuits. An emitter follower output transistor is driven by an output signal from one emitter follower circuit, while an N-channel MOSFET provided between the output transistor and a current source used as a load is driven by an output signal from the other emitter follower circuit, to obtain a level-amplified output signal from an emitter of the output transistor.Type: GrantFiled: March 4, 1992Date of Patent: October 19, 1993Assignees: Hitachi, Ltd., Hitachi Device Engineering Co., Ltd.Inventors: Hiroaki Nambu, Noriyuki Homma, Kunihiko Yamaguchi, Kazuo Kanetani, Hisayuki Higuchi, Youji Idei, Kenichi Ohata, Yoshiaki Sakurai, Masanori Odaka, Goro Kitsukawa, Nobuo Tamba, Masayuki Ohayashi, Toshiro Hiramoto, Kayoko Saito
-
Patent number: 5220187Abstract: A logic circuit to be formed in a gate array is selected depending upon the value of the output load capacitance thereof, from among a CMOS circuit, a first Bi-CMOS circuit including an output bipolar transistor whose emitter size is set at a predetermined value, and a second Bi-CMOS circuit including an output bipolar transistor whose emitter size is larger than the emitter size of the output bipolar transistor of the first Bi-CMOS circuit. That is, the logic circuit is brought into a circuit form whose output load capacitance can be charged and discharged fastest. As a result, the logic circuit constructed in the gate array by adopting such a design technique has its operating speed raised. An improved structure is also provided for reducing wiring lengths by arranging bipolar transistors in adjacent basic cells to have mirror symmetry with one another.Type: GrantFiled: July 21, 1992Date of Patent: June 15, 1993Assignee: Hitachi, Ltd.Inventors: Shuuichi Miyaoka, Masanori Odaka, Katsumi Ogiue
-
Patent number: 5214302Abstract: A semiconductor integrated circuit device having a structure in which each of the following regions, that is, a first region for forming the base and emitter regions of each of the bipolar transistors, a second region for forming the collector lead-out region of the bipolar transistor, and a third region for forming each of the MISFETs, is projected from the main surface of a semiconductor substrate, whereby it is possible to effect isolation between the MISFETs and between these MISFETs and the bipolar transistors with the same isolation structure and in the same manufacturing step as those for the isolation between the bipolar transistors. In this device, furthermore, the base region of the bipolar transistor is electrically and self-alignedly connected to a base electrode which is formed over the main surface so as to surround the emitter region.Type: GrantFiled: December 13, 1991Date of Patent: May 25, 1993Assignee: Hitachi, Ltd.Inventors: Akihisa Uchida, Keiichi Higeta, Nobuo Tamba, Masanori Odaka, Katsumi Ogiue
-
Patent number: 5140550Abstract: A semiconductor memory device is provided which includes a plurality of memory arrays each including main word lines, sub word lines to which a plurality of memory cells are connected, and a decoder which selectively connects the sub word lines to the main word lines. The main word lines are relatively short, since they are isolated electrically between memory arrays, and their resistance can thus be relatively low. The main word lines are not directly connected with a plurality of memory cells, and this results in a smaller capacitance coupled to the main word lines than is customarily the case. Consequently, the semiconductor memory device can have an enhanced operating speed.Type: GrantFiled: October 2, 1990Date of Patent: August 18, 1992Assignees: Hitachi Ltd., Hitachi Microcomputer Engineering Ltd., Akia Electronics Co., Ltd.Inventors: Shuuichi Miyaoka, Masanori Odaka, Hiroshi Higuchi, Toshikazu Arai
-
Patent number: 5068828Abstract: A semiconductor memory device having a plurality of memory arrays in which static memory cells are disposed in a lattice arrangement at intersections of word lines and complementary data lines. The load circuits thereof are characterized as having a varying impedance effected by the combination of a first pair of P-channel MOSFETs disposed between the complementary data lines and a first node supplied with a first supply voltage and kept normally in an ON-state, and a pair of transistors, such as a second pair of P-channel MOSFETs, similarly connected as the first pair of P-channel MOSFETs and which are turned off selectively in accordance with a control signal corresponding to a predetermined selection timing signal in a write-in mode. The semiconductor memory device has a plurality of switching circuits which are coupled between the plurality of complementary data lines and a pair of data read and write lines.Type: GrantFiled: June 19, 1990Date of Patent: November 26, 1991Assignees: Hitachi, Ltd., Hitachi Microcomputer Engineering, Ltd., Akita Electronics Co., Ltd.Inventors: Shuuichi Miyaoka, Masanori Odaka, Toshikazu Arai, Hiroshi Higuchi
-
Patent number: 5057894Abstract: Disclosed is a bipolar-CMOS LSI manufactured by a simplified process and realizing a higher density of integration as well as a higher operating speed, in which a base lead-out electrode of a bipolar transistor and respective gate electrodes of a p-channel MISFET and an n-channel MISFET of CMOS transistors are made of an identical conductor film, and the conductor film of the gate electrode of the p-channel MISFET is of p-type, while that of the gate electrode of the n-channel MISFET is of n-type.Type: GrantFiled: May 23, 1990Date of Patent: October 15, 1991Assignee: Hitachi, Ltd.Inventors: Takahide Ikeda, Kouichirou Yamada, Osamu Saito, Masanori Odaka, Nobuo Tamba, Katsumi Ogiue, Atsushi Hiraishi, Atsuo Watanabe, Mitsuru Hirao, Akira Fukami, Masayuki Ohayashi, Tadashi Kuramoto
-
Patent number: 5050127Abstract: A memory device wherein a voltage dropped by a fixed voltage from a highest operating voltage is divided using a plurality of impedance elements, and common data lines are biased by the divided voltages. Owing to the application of the voltage dropped by the fixed voltage from the highest operating potential, even when resistance values of the impedance elements are reduced, a current to flow through the impedance element path does not increase considerably, and a low power consumption is attained. Owing to the reduced resistance values of the impedance elements, time constants which are determined by the resistances and stray capacitances parasitic to the common data lines are decreased. Thus, the potential changes of the common data lines to arise in correspondence with information stored in a memory cell are quickened, and a data sense time is curtailed, whereby an access time can be shortened.Type: GrantFiled: October 19, 1989Date of Patent: September 17, 1991Assignee: Hitachi, Ltd.Inventors: Kinya Mitsumoto, Shinji Nakazato, Yoshiaki Yazawa, Masanori Odaka, Hideaki Uchida, Nobuaki Miyakawa
-
Patent number: 5047986Abstract: A semiconductor integrated circuit is provided having first and second level generate circuits producing different levels and first and second emitter follower circuits respectively connected thereto. A level generated by one of the first and second level generate circuits is selectively supplied to either one of the first and second emitter follower circuits. This enables the first and second emitter follower circuits to supply the respective circuits formed in a semiconductor substrate with stable reference voltages.Type: GrantFiled: January 30, 1990Date of Patent: September 10, 1991Assignee: Hitachi, Ltd.Inventors: Kazuhisa Miyamoto, Shuuichi Miyaoka, Masanori Odaka
-
Patent number: 5042010Abstract: In order to provide high speed and lower power consumption, a semiconductor integrated circuit is constructed to utilize both CMOS elements and bipolar transistors. The bipolar transistors are used in the output portions to take advantage of their speed of operation to allow rapid charging and discharging of output lines. In the meantime, the principal operating portiosn of the circuit use CMOS elements of lower power consumption. This arrangement is particulary advantageous in memory circuits.Type: GrantFiled: May 8, 1990Date of Patent: August 20, 1991Assignee: Hitachi, Ltd.Inventors: Katsumi Ogiue, Yukio Suzuki, Ikuro Masuda, Masanori Odaka, Hideaki Uchida