Abstract: The present invention provides a refrigerating machine oil comprising a base oil; a sulfide compound; and an orthophosphoric acid ester, wherein a content of the sulfide compound is 0.01 to 2.0% by mass and a content of the orthophosphoric acid ester is 0.1 to 5.0% by mass, based on a total amount of the refrigerating machine oil, and the refrigerating machine oil having a kinematic viscosity at 40° C. of 3 to 500 mm2/s.

Abstract: The lubricating base oil of the present invention comprises an ester synthesized from: a first component that is at least one selected from polyhydric alcohols having 2 to 4 hydroxyl groups; a second component that is at least one selected from polybasic acids having 6 to 12 carbon atoms; and a third component that is at least one selected from monohydric alcohols having 4 to 18 carbon atoms and monocarboxylic acids having 2 to 12 carbon atoms. In addition, the refrigerating machine oil and the working fluid composition for a refrigerating machine of the present invention each comprise the above lubricating base oil.

Abstract: Disclosed is a liquid chemical for forming a water-repellent protecting film at least on a surface of a recessed portion of an uneven pattern at the time of cleaning a wafer having a finely uneven pattern at its surface and containing silicon at at least a part of the uneven pattern. This liquid chemical contains a silicon compound A represented by the general formula: R1aSi(H)bX4-a-b and an acid A, the acid A being at least one selected from the group consisting of trimethylsilyl trifluoroactate, trimethylsilyl trifluoromethanesulfonate, dimethylsilyl trifluoroactate, dimethylsilyl trifluoromethanesulfonate, butyldimethylsilyl trifluoroactate, butyldimethylsilyl trifluoromethanesulfonate, hexyldimethylsilyl trifluoroacetate, hexyldimethylsilyl trifluoromethanesulfonate, octyldimethylsilyl trifluoroactate, octyldimethylsilyl trifluoromethanesulfonate, decyldimethylsilyl trifluoroacetate and decyldimethylsilyl trifluoromethanesulfonate.

Abstract: A layout system for a cargo area of a vehicle includes a divider and cargo side-trims. The divider includes a first rod, a second rod, and a screen. The cargo side-trims are installed in the vehicle to form sidewalls of the cargo area. The cargo side-trims include rails that include guide rail portions and rail-side securing portions. The guide rail portions are for guiding end portions of the first and the second rods along a front-rear direction of the vehicle. The guide rail portions include horizontal portion and extending portions that extend from the respective horizontal portions toward a lower rear of the vehicle. The rail-side securing portions are connected to the guide rail portions, respectively. The rail-side securing portions are for holding the end portions of the first and the second rods to secure the first and the second rods to the cargo side-trims.

Abstract: A working fluid composition for a refrigerating machine comprises a refrigerant comprising monofluoroethane and a refrigerating machine oil comprising, as a base oil, at least one selected from a mineral oil having % CN in an n-d-M ring analysis of 10 to 60 and a pour point of ?15° C. or lower and a synthetic hydrocarbon oil having a pour point of ?15° C. or lower, and the refrigerating machine oil having a kinematic viscosity at 40° C. of 3 to 500 mm2/s.

Abstract: Disclosed is a liquid chemical for forming a water repellent protective film on a wafer that has at its surface a finely uneven pattern and contains silicon element at least at a part of the uneven pattern, the water repellent protective film being formed at least on surfaces of recessed portions of the uneven pattern at the time of cleaning the wafer. The liquid chemical contains: a silicon compound (A) represented by the general formula R1aSi(H)b(X)4?a?b and an acid; or a silicon compound (C) represented by the general formula R7gSi(H)h(CH3)w(Z)4?g?h?w and a base that contains no more than 35 mass % of water. The total amount of water in the liquid chemical is no greater than 1000 mass ppm relative to the total amount of the liquid chemical. The liquid chemical can improve a cleaning step that easily induces pattern collapse.

Abstract: The present invention provides a working fluid composition for a refrigerating machine, comprising: a refrigerating machine oil comprising, as a base oil, a mixed ester of (A) a complex ester and (B) a polyol ester, wherein (A) is obtainable by synthesis from a specific polyhydric alcohol, a polybasic acid having 6 to 12 carbon atoms, and a monohydric alcohol having 4 to 18 carbon atoms or a monocarboxylic acid having 4 to 18 carbon atoms, wherein (B) is obtainable by synthesis from a specific polyhydric alcohol and a monocarboxylic acid having 4 to 18 carbon atoms, and wherein a mass ratio of (A)/(B) is 5/95 to 95/5; and difluoromethane used as a refrigerant, and the working fluid composition having a refrigerant dissolved viscosity of 5.5 mm2/s or more, at a temperature of 80° C. and an absolute pressure of 2.1 MPa.

Abstract: [Problem] To provide a method for preparing a protective film-forming liquid chemical, in a method for producing a wafer having at its surface an uneven pattern and containing silicon element at least at a part of the uneven pattern. The liquid chemical forms a water-repellent protective film on the uneven pattern of the wafer and improves a cleaning step which tends to induce a pattern collapse, and particularly provides a good persistence (pot life) of the improving effect. [Solution] A method for preparing a liquid chemical for forming a water-repellent protective film, the liquid chemical being for forming a water-repellent protective film at the time of cleaning the wafer at least on surfaces of recessed portions of the uneven pattern, the liquid chemical containing a nonaqueous organic solvent, a silylation agent, and an acid or base.

Abstract: A working fluid composition for a refrigerating machine comprising: a refrigerating machine oil containing at least one lubricating base oil selected from a mineral oil and a synthetic oil, and at least one phosphorus compound selected from a mono(alkylphenyl) diphenyl phosphate having a C3-C5 alkyl group and a di(alkylphenyl) phenyl phosphate having two C3-C5 alkyl groups, wherein a content of the phosphorus compound is 0.01 to 5% by mass based on a total amount of the refrigerating machine oil; and a hydrocarbon refrigerant having 2 to 4 carbon atoms.

Abstract: The present invention provides a lubricating oil composition comprising a lubricating base oil, and at least one ester additive selected from a first ester that is a fatty acid 3,4-epoxycyclohexyl alkyl ester and a second ester that is a 3,4-epoxycyclohexyl carboxylic acid alkyl ester, wherein a content of the ester additive is 0.01 to 5.0% by mass based on the total mass of the lubricating oil composition.

Abstract: Disclosed is a liquid chemical for forming a water-repellent protecting film on a wafer. The liquid chemical is a liquid chemical containing a water-repellent-protecting-film-forming agent for forming the water-repellent protecting film, at the time of cleaning the wafer which has a finely uneven pattern at its surface and contains at least at a part of a surface of a recessed portion of the uneven pattern at least one kind of matter selected from the group consisting of titanium, titanium nitride, tungsten, aluminum, copper, tin, tantalum nitride, ruthenium and silicon, at least on the surface of the recessed portion. The liquid chemical is characterized in that the water-repellent-protecting-film-forming agent is a water-insoluble surfactant. The water-repellent protecting film formed with the liquid chemical is capable of preventing a pattern collapse of the wafer, in a cleaning step.

Abstract: Disclosed is a liquid chemical for forming a water-repellent protecting film. The liquid chemical contains an agent for forming a water-repellent protecting film, and a solvent. The agent is for provided to form a water-repellent protecting film on a wafer after a cleaning step for the wafer and before a drying step for the wafer, the wafer having at its surface an uneven pattern and containing at least one kind element of titanium, tungsten, aluminum, copper, tin, tantalum and ruthenium at surfaces of recessed portions of the uneven pattern, the water-repellent protecting film being formed at least on the surfaces of the recessed portions. The liquid chemical is characterized in that the agent for forming a water-repellent protecting film is a compound represented by the following general formula [1].

Abstract: A silicon wafer cleaning agent includes at least a water-based cleaning liquid, and a water-repellent cleaning liquid for providing water-repellent to an uneven pattern at least at recessed portions during a cleaning process. The water-repellent cleaning liquid is a liquid composed of a water-repellent compound containing a reactive moiety which is chemically bondable to Si in the silicon wafer, and a hydrophobic group, or is a liquid wherein 0.1 mass % or more of the water-repellent compound relative to the total quantity of 100 mass % of the water-repellent cleaning liquid and an organic solvent are mixed and contained therein. A cleaning process wherein a pattern collapse is easily induced can be improved by using the cleaning agent.

Abstract: Disclosed is a liquid chemical for forming a water-repellent protecting film on a wafer. The liquid chemical is a liquid chemical containing a water-repellent-protecting-film-forming agent for forming the water-repellent protecting film, at the time of cleaning the wafer which has a finely uneven pattern at its surface and contains at least at a part of a surface of a recessed portion of the uneven pattern at least one kind of matter selected from the group consisting of titanium, titanium nitride, tungsten, aluminum, copper, tin, tantalum nitride, ruthenium and silicon, at least on the surface of the recessed portion. The liquid chemical is characterized in that the water-repellent-protecting-film-forming agent is a water-insoluble surfactant. The water-repellent protecting film formed with the liquid chemical is capable of preventing a pattern collapse of the wafer, in a cleaning step.

Abstract: A working fluid composition for a refrigerating machine of the present invention comprises: a refrigerating machine oil comprising a complex ester as a base oil; and a hydrocarbon refrigerant having 2 to 4 carbon atoms, the complex ester being obtainable by further esterifying, with at least one selected from a monohydric alcohol having 1 to 20 carbon atoms and a fatty acid having 2 to 20 carbon atoms, an ester intermediate obtained by reacting a neopentyl polyol with a dibasic acid, and having an acid value of 0.5 mgKOH/g or less, the refrigerating machine oil having a kinematic viscosity at 100° C. of 2 to 50 mm2/s.

Abstract: A layout system for a cargo area of a vehicle includes a divider and cargo side-trims. The divider includes a first rod, a second rod, and a screen. The cargo side-trims are installed in the vehicle to form sidewalls of the cargo area. The cargo side-trims include rails that include guide rail portions and rail-side securing portions. The guide rail portions are for guiding end portions of the first and the second rods along a front-rear direction of the vehicle. The guide rail portions include horizontal portion and extending portions that extend from the respective horizontal portions toward a lower rear of the vehicle. The rail-side securing portions are connected to the guide rail portions, respectively. The rail-side securing portions are for holding the end portions of the first and the second rods to secure the first and the second rods to the cargo side-trims.

Abstract: A method for cleaning a wafer that has a pattern of recessed and projected portions formed on a surface thereof and contains at least one element selected from titanium, tungsten, aluminum, copper, tin, tantalum, and ruthenium on a surface of a recessed portion of the pattern. The method at least includes a pre-treating step of holding a cleaning liquid at least in the recessed portion of the pattern; a protective film forming step of holding a protective film forming chemical liquid, which is a chemical liquid containing a water-repellant protective film forming agent, at least in the recessed portion of the pattern after the pre-treating step; and a drying step of removing the liquids from the pattern by drying. The cleaning liquid is acidic if the protective film forming chemical liquid is basic, or is basic if the protective film forming chemical liquid is acidic.

Abstract: A liquid chemical for forming a water repellent protecting film on a wafer having at its surface an uneven pattern and containing at least one kind of element selected from the group consisting of titanium, tungsten, aluminum, copper, tin, tantalum and ruthenium at surfaces of recessed portions of the uneven pattern, the water repellent protecting film being formed at least on the surfaces of the recessed portions. The liquid chemical is characterized by including: a water repellent protecting film forming agent; and water, and characterized in that the water repellent protecting film forming agent is at least one selected from compounds represented by the following general formula [1] and salt compounds thereof and that the concentration of the water relative to the total quantity of a solvent contained in the liquid chemical is not smaller than 50 mass %.

Abstract: The present invention provides a refrigerating machine oil comprising: a base oil; a sulfide compound; and a gallate, wherein a content of the sulfide compound is 0.01 to 2.0% by mass and a content of the gallate is 10 to 500 ppm by mass based on a total amount of the refrigerating machine oil, and the refrigerating machine oil having a kinematic viscosity at 40° C. of 3 to 500 mm2/s.

Abstract: Disclosed is a liquid chemical for forming a water-repellent protecting film at least on a surface of a recessed portion of an uneven pattern at the time of cleaning a wafer having a finely uneven pattern at its surface and containing silicon at at least a part of the uneven pattern. This liquid chemical contains a silicon compound A represented by the general formula: R1aSi(H)bX4-a-b and an acid A, the acid A being at least one selected from the group consisting of trimethylsilyl trifluoroactate, trimethylsilyl trifluoromethanesulfonate, dimethylsilyl trifluoroactate, dimethylsilyl trifluoromethanesulfonate, butyldimethylsilyl trifluoroactate, butyldimethylsilyl trifluoromethanesulfonate, hexyldimethylsilyl trifluoroacetate, hexyldimethylsilyl trifluoromethanesulfonate, octyldimethylsilyl trifluoroactate, octyldimethylsilyl trifluoromethanesulfonate, decyldimethylsilyl trifluoroacetate and decyldimethylsilyl trifluoromethanesulfonate.