Patents by Inventor Masanori Shinada

Masanori Shinada has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20070287086
    Abstract: An object of the present invention is to provide a colored photosensitive resin composition which causes a small change in exposure in case of forming a pattern before and after storage. Disclosed is a colored photosensitive resin composition comprising a dye, a photo acid generator, a curing agent, and an alkali-soluble resin and solvent, wherein the dye contains C.I. Solvent Yellow 88 and the photo acid generator contains a sulfonate ester compound.
    Type: Application
    Filed: May 24, 2007
    Publication date: December 13, 2007
    Inventors: Masanori Shinada, Masanori Harasawa, Kensaku Maeda, Yoichi Ootsuka
  • Patent number: 7166410
    Abstract: A positive type colored photosensitive resin composition containing an alkali-soluble copolymer resin which comprises repeating units derived from styrene and repeating units derived from hydroxystyrene, a ratio (molar ratio) of the latter repeating units to the former repeating units is from 1:0.7 to 1:20 and has a polystyrene-converted weight average molecular weight of 6,000 to 15,000.
    Type: Grant
    Filed: October 31, 2003
    Date of Patent: January 23, 2007
    Assignees: Sumitomo Chemical Company, Limited, Sony Corporation
    Inventors: Kazuhiro Machiguchi, Masanori Shinada, Yuuji Ueda, Hiroki Endo, Taichi Natori
  • Publication number: 20040131956
    Abstract: A positive type colored photosensitive resin composition containing an alkali-soluble copolymer resin which comprises repeating units derived from styrene and repeating units derived from hydroxystyrene, a ratio (molar ratio) of the latter repeating units to the former repeating units is from 1:0.7 to 1:20 and has a polystyrene-converted weight average molecular weight of 6,000 to 15,000.
    Type: Application
    Filed: October 31, 2003
    Publication date: July 8, 2004
    Inventors: Kazuhiro Machiguchi, Masanori Shinada, Yuuji Ueda, Hiroki Endo, Taichi Natori
  • Patent number: 6329119
    Abstract: A negative type resist composition is provided, which provides excellent resolution, satisfactory profile and outstanding process stability: is suitable for exposure using deep ultra violet ray; and comprises alkali soluble resin, acid generator, crosslinking agent, and a basic compound represented by the following formula (I) wherein, A represents bivalent aliphatic hydrocarbon residue which may be optionally interrupted by imino group, sulfide group, or disulfide group, X represents nitrogen atom or C(NH2), and R1 and R2 independently represent hydrogen or alkyl.
    Type: Grant
    Filed: April 28, 2000
    Date of Patent: December 11, 2001
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Masumi Suetsugu, Takehiro Kusumoto, Naoki Takeyama, Masanori Shinada
  • Patent number: RE40964
    Abstract: A negative type resist composition is provided, which provides excellent resolution, satisfactory profile and outstanding process stability; is suitable for exposure using deep ultra violet ray; and comprises alkali soluble resin, acid generator, crosslinking agent, and a basic compound represented by the following formula (I) wherein, A represents sulfide group, disulfide group or bivalent aliphatic hydrocarbon residue which may be optionally interrupted by imino group, sulfide group, or disulfide group, X represents nitrogen atom or C(NH2), and R1 and R2 independently represent hydrogen or alkyl.
    Type: Grant
    Filed: September 17, 2003
    Date of Patent: November 10, 2009
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Masumi Suetsugu, Takehiro Kusumoto, Naoki Takeyama, Masanori Shinada