Patents by Inventor Masanori Tachibana

Masanori Tachibana has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220117117
    Abstract: An electronic apparatus includes a flow rate control circuit that controls a plurality of flow rate adjusting mechanisms, based on desired flow rates of the coolant for a plurality of electronic circuits and information that indicates relationships between pressure losses and flow rates in a plurality of routes that include internal flow passages of the plurality of electronic circuits, a plurality of distribution pipes, a plurality of discharge pipes, and the plurality of flow rate adjusting mechanisms and in which the coolant flows between the first pipe and the second pipe.
    Type: Application
    Filed: July 22, 2021
    Publication date: April 14, 2022
    Applicant: FUJITSU LIMITED
    Inventors: Masanori Tachibana, KENJI SASABE
  • Patent number: 10362704
    Abstract: An information processing apparatus includes a substrate that includes a first connector and a second connector, a backplane that includes a third connector coupled to the first connector and a fourth connector coupled to the second connector, and a metal plate attached to the backplane, wherein the metal plate has an opening to which the fourth connector is attached, wherein the first connector is arranged near a central part of the substrate on an end side inserted into the backplane and the second connector is arranged on each side of the first connector, and wherein a clearance between the opening of the metal plate and the fourth connector increases as a distance from the third connector to the fourth connector increases.
    Type: Grant
    Filed: July 20, 2018
    Date of Patent: July 23, 2019
    Assignee: FUJITSU LIMITED
    Inventors: Yukihiro Hirano, Masanori Tachibana, Akira Shimasaki, Yoshimi Maekawa, Misao Umematsu, Naomi Fukunaga
  • Publication number: 20190045652
    Abstract: An information processing apparatus includes a substrate that includes a first connector and a second connector, a backplane that includes a third connector coupled to the first connector and a fourth connector coupled to the second connector, and a metal plate attached to the backplane, wherein the metal plate has an opening to which the fourth connector is attached, wherein the first connector is arranged near a central part of the substrate on an end side inserted into the backplane and the second connector is arranged on each side of the first connector, and wherein a clearance between the opening of the metal plate and the fourth connector increases as a distance from the third connector to the fourth connector increases.
    Type: Application
    Filed: July 20, 2018
    Publication date: February 7, 2019
    Applicant: FUJITSU LIMITED
    Inventors: Yukihiro Hirano, Masanori Tachibana, Akira Shimasaki, Yoshimi Maekawa, Misao Umematsu, Naomi Fukunaga
  • Patent number: 10154609
    Abstract: A cable unit includes a first casing body, a second connector body, a first connector, a second casing, and a cable. The first casing body forms an open shape that includes a first main wall and a first peripheral side-wall. The second casing body forms an open shape that includes a second main wall and a second peripheral side-wall. The second casing body is fitted together with the first casing body such that the second casing body and the first casing body configure a box-shaped casing that expands and contracts along a direction in which the first main wall and the second main wall face each other. The first connector is provided to the first main wall. The second connector is provided to the second main wall. The cable is housed in the casing and connects the first connector with the second connector.
    Type: Grant
    Filed: September 29, 2017
    Date of Patent: December 11, 2018
    Assignee: FUJITSU LIMITED
    Inventors: Misao Umematsu, Masanori Tachibana
  • Patent number: 10039937
    Abstract: A charged-particle beam therapy apparatus includes: an accelerator configured to accelerate a charged particle and emit a charged-particle beam; an irradiation unit configured to irradiate an irradiated body with the charged-particle beam using a scanning method; and a control unit. The control unit stores a control pattern of the apparatus during one treatment. An irradiation interruption time for which the irradiation of the irradiated body with the charged-particle beam by the irradiation unit is interrupted and an irradiation time for which the irradiation unit irradiates the irradiated body with the charged-particle beam are set in the control pattern. The sum of the irradiation interruption times during one treatment is set to be shorter than the sum of the irradiation times during one treatment.
    Type: Grant
    Filed: March 18, 2015
    Date of Patent: August 7, 2018
    Assignee: SUMITOMO HEAVY INDUSTRIES, LTD.
    Inventors: Toshiki Tachikawa, Toru Asaba, Masanori Tachibana
  • Publication number: 20180124944
    Abstract: A cable unit includes a first casing body, a second connector body, a first connector, a second casing, and a cable. The first casing body forms an open shape that includes a first main wall and a first peripheral side-wall. The second casing body forms an open shape that includes a second main wall and a second peripheral side-wall. The second casing body is fitted together with the first casing body such that the second casing body and the first casing body configure a box-shaped casing that expands and contracts along a direction in which the first main wall and the second main wall face each other. The first connector is provided to the first main wall. The second connector is provided to the second main wall. The cable is housed in the casing and connects the first connector with the second connector.
    Type: Application
    Filed: September 29, 2017
    Publication date: May 3, 2018
    Applicant: FUJITSU LIMITED
    Inventors: Misao Umematsu, Masanori Tachibana
  • Patent number: 9566453
    Abstract: A charged particle beam irradiation apparatus includes: an accelerator which accelerates charged particles and emits a charged particle beam; an irradiation unit which irradiates an irradiation target with the charged particle beam; a transport line which transports the charged particle beam emitted from the accelerator, to the irradiation unit; an energy adjustment unit which is provided at the transport line and adjusts energy of the charged particle beam; a plurality of electromagnets provided further toward the downstream side than the energy adjustment unit in the transport line; an electromagnet power source provided to correspond to each of the electromagnets; and a control unit which controls a parameter of the electromagnet according to the energy of the charged particle beam, wherein the electromagnet power source has a storage unit which stores the parameter of the electromagnet for each layer which is irradiated with the charged particle beam, in the irradiation target.
    Type: Grant
    Filed: March 30, 2016
    Date of Patent: February 14, 2017
    Assignee: Sumitomo Heavy Industries, Ltd.
    Inventor: Masanori Tachibana
  • Publication number: 20160279446
    Abstract: A charged particle beam irradiation apparatus includes: an accelerator which accelerates charged particles and emits a charged particle beam; an irradiation unit which irradiates an irradiation target with the charged particle beam; a transport line which transports the charged particle beam emitted from the accelerator, to the irradiation unit; an energy adjustment unit which is provided at the transport line and adjusts energy of the charged particle beam; a plurality of electromagnets provided further toward the downstream side than the energy adjustment unit in the transport line; an electromagnet power source provided to correspond to each of the electromagnets; and a control unit which controls a parameter of the electromagnet according to the energy of the charged particle beam, wherein the electromagnet power source has a storage unit which stores the parameter of the electromagnet for each layer which is irradiated with the charged particle beam, in the irradiation target.
    Type: Application
    Filed: March 30, 2016
    Publication date: September 29, 2016
    Inventor: Masanori Tachibana
  • Publication number: 20150265855
    Abstract: A charged-particle beam therapy apparatus includes: an accelerator configured to accelerate a charged particle and emit a charged-particle beam; an irradiation unit configured to irradiate an irradiated body with the charged-particle beam using a scanning method; and a control unit. The control unit stores a control pattern of the apparatus during one treatment. An irradiation interruption time for which the irradiation of the irradiated body with the charged-particle beam by the irradiation unit is interrupted and an irradiation time for which the irradiation unit irradiates the irradiated body with the charged-particle beam are set in the control pattern. The sum of the irradiation interruption times during one treatment is set to be shorter than the sum of the irradiation times during one treatment.
    Type: Application
    Filed: March 18, 2015
    Publication date: September 24, 2015
    Inventors: Toshiki TACHIKAWA, Toru ASABA, Masanori TACHIBANA
  • Publication number: 20150036272
    Abstract: An electronic device includes: substrate unit including a signal terminal provided over a first edge of a substrate body, and a power terminal provided over a second edge that is different from the first edge; and a case including an insertion unit into which the substrate unit is inserted from the first edge, a signal connection member to which the signal terminal is coupled when the substrate unit is inserted into the insertion unit, and a power connection member to which the power terminal is coupled when the substrate unit is inserted into the insertion unit.
    Type: Application
    Filed: July 7, 2014
    Publication date: February 5, 2015
    Inventors: Masanori Tachibana, Yukihiro Hirano, Misao Umematsu
  • Patent number: 8901520
    Abstract: A particle beam irradiation apparatus including: a scanning unit configured to scan a particle beam; an electric current supply unit configured to supply an electric current to the scanning unit; and a scanning control unit configured to control the scanning unit by sending an electric current command value to the electric current supply unit, wherein a period of an operation clock of the scanning control unit and a period of an operation clock of the electric current supply unit are the same.
    Type: Grant
    Filed: July 15, 2014
    Date of Patent: December 2, 2014
    Assignee: Sumitomo Heavy Industries, Ltd.
    Inventors: Masanori Tachibana, Junichi Inoue, Shoubun Hara
  • Publication number: 20140319368
    Abstract: A particle beam irradiation apparatus including: a scanning unit configured to scan a particle beam; an electric current supply unit configured to supply an electric current to the scanning unit; and a scanning control unit configured to control the scanning unit by sending an electric current command value to the electric current supply unit, wherein a period of an operation clock of the scanning control unit and a period of an operation clock of the electric current supply unit are the same.
    Type: Application
    Filed: July 15, 2014
    Publication date: October 30, 2014
    Inventors: Masanori TACHIBANA, Junichi INOUE, Shoubun HARA
  • Patent number: 8700228
    Abstract: A beam scheduler adds the maximum allowable waiting time until a beam is allocated to an irradiation chamber corresponding to an irradiation request when the irradiation request is received from one irradiation chamber of a plurality of irradiation chambers A to D; adds the irradiation request to the end of the order of a waiting list; determines whether or not the predicted waiting time until the beam is allocated to the one irradiation chamber exceeds the maximum allowable waiting time; and advances the order of the irradiation request on the waiting list, thereby allocating the beam to the irradiation chamber corresponding to the top irradiation request in the order of the waiting list, if it is determined that the predicted waiting time exceeds the maximum allowable waiting time.
    Type: Grant
    Filed: March 29, 2011
    Date of Patent: April 15, 2014
    Assignee: Sumitomo Heavy Industries, Ltd.
    Inventors: Masanori Tachibana, Yoshinori Yano
  • Publication number: 20120307477
    Abstract: An electronic device including five input-end bus bars supplied with three-phase alternating-current power, and three units connected to the five input-end bus bars and supplied with single-phase alternating-current power, and the three units include a first unit including a first terminal and a second terminal, a second unit including a third terminal and a fourth terminal, and a third unit including a fifth terminal and a sixth terminal, and the five input-end bus bars include a first input-end bus bar connected to the first terminal and the third terminal, a second input-end bus bar connected to the fifth terminal, a third input-end bus bar connected to the second terminal, a fourth input-end bus bar connected to the fourth terminal, and a fifth input-end bus bar connected to the sixth terminal.
    Type: Application
    Filed: March 26, 2012
    Publication date: December 6, 2012
    Applicant: FUJITSU LIMITED
    Inventors: Masanori TACHIBANA, Akira SHIMASAKI
  • Patent number: 8294127
    Abstract: A charged-particle beam irradiation device, which irradiates an object to be irradiated with a charged-particle beam, includes a scanning member that scans the object to be irradiated with the charged-particle beam; an irradiation amount setting unit that sets an irradiation amount of the charged-particle beam at a plurality of target scanning positions on a scanning line of the charged-particle beam with which the scanning member scans the object to be irradiated; and a scanning speed setting unit that sets a target scanning speed of the charged-particle beam at each of the target scanning positions on the basis of the irradiation amount set by the irradiation amount setting unit.
    Type: Grant
    Filed: August 11, 2011
    Date of Patent: October 23, 2012
    Assignee: Sumitomo Heavy Industries, Ltd.
    Inventor: Masanori Tachibana
  • Publication number: 20120253545
    Abstract: A beam scheduler adds the maximum allowable waiting time until a beam is allocated to an irradiation chamber corresponding to an irradiation request when the irradiation request is received from one irradiation chamber of a plurality of irradiation chambers A to D; adds the irradiation request to the end of the order of a waiting list; determines whether or not the predicted waiting time until the beam is allocated to the one irradiation chamber exceeds the maximum allowable waiting time; and advances the order of the irradiation request on the waiting list, thereby allocating the beam to the irradiation chamber corresponding to the top irradiation request in the order of the waiting list, if it is determined that the predicted waiting time exceeds the maximum allowable waiting time.
    Type: Application
    Filed: March 29, 2011
    Publication date: October 4, 2012
    Applicant: SUMITOMO HEAVY INDUSTRIES, LTD.
    Inventors: Masanori TACHIBANA, Yoshinori YANO
  • Publication number: 20120049091
    Abstract: A charged-particle beam irradiation device, which irradiates an object to be irradiated with a charged-particle beam, includes a scanning member that scans the object to be irradiated with the charged-particle beam; an irradiation amount setting unit that sets an irradiation amount of the charged-particle beam at a plurality of target scanning positions on a scanning line of the charged-particle beam with which the scanning member scans the object to be irradiated; and a scanning speed setting unit that sets a target scanning speed of the charged-particle beam at each of the target scanning positions on the basis of the irradiation amount set by the irradiation amount setting unit.
    Type: Application
    Filed: August 11, 2011
    Publication date: March 1, 2012
    Applicant: SUMITOMO HEAVY INDUSTRIES, LTD.
    Inventor: Masanori TACHIBANA
  • Publication number: 20090283205
    Abstract: A method of manufacturing a thin-film magnetic head is capable of planarizing and forming the upper surface of a main magnetic pole with high precision, of forming a trailing gap with a precise form, and of efficiently and precisely forming side shields and a trailing shield. A stopper layer is formed so as to cover a magnetic pole and so that a thickness thereof at positions on both sides of the magnetic pole is a predetermined side shield gap width. After a resist layer has been formed so that a thickness thereof at positions on both sides of the magnetic pole is a predetermined side shield width, an insulating layer is formed thereupon and then lapping according to a CMP process is carried out until the stopper layer becomes exposed. After this, the stopper layer is removed by dry etching until the upper surface of the magnetic pole becomes exposed, and then the upper surface of the magnetic pole is lapped by a CMP process until the surface is planarized.
    Type: Application
    Filed: January 15, 2009
    Publication date: November 19, 2009
    Applicant: FUJITSU LIMITED
    Inventors: Hiroyuki Miyazawa, Masaya Kato, Masanori Tachibana
  • Publication number: 20090265917
    Abstract: By the method of manufacturing a thin film magnetic head, a magnetic material having a suitable characteristic can be used for manufacturing a magnetic pole and corrosion of the magnetic pole can be prevented. The method comprises: a step of forming a multilayered magnetic pole; a step of forming a stopper layer on the magnetic pole; a step of forming an insulating layer on the stopper layer; a step of polishing the insulating layer, by chemical mechanical polishing process, until an upper face of the stopper layer is exposed; a step of removing the stopper layer, by dry etching process with a reactive gas, until an upper face of the magnetic head is exposed; a step of removing the upper face of the magnetic pole, by dry etching process with an inert gas, until reaching a prescribed depth; and a step of polishing the upper face of the magnetic pole, by chemical mechanical polishing process, until the upper face of the magnetic pole is flattened.
    Type: Application
    Filed: December 11, 2008
    Publication date: October 29, 2009
    Applicant: FUJITSU LIMITED
    Inventors: Koichi Sugimoto, Masanori Tachibana, Kazuaki Satoh, Yoshiyuki Ikeda
  • Publication number: 20090152119
    Abstract: According to an aspect of an embodiment, a method for manufacturing a magnetic head includes: providing a substrate; forming a first magnetic layer having a pattern for forming a magnetic pole on the substrate; forming a stopper layer of non-magnetic material on the top and the sides of the first magnetic layer; reducing the thickness of the stopper layer on the top of the first magnetic layer; and forming a second magnetic layer on the stopper layer. The method further includes: polishing the second magnetic layer to expose the stopper layer on the top of the first magnetic layer; and removing the stopper layer on the top of the first magnetic layer, so as to expose the top of the first magnetic layer.
    Type: Application
    Filed: December 9, 2008
    Publication date: June 18, 2009
    Applicant: FUJITSU LIMITED
    Inventors: Masanori Tachibana, Masaya Kato, Takashi Ito, Hiroyuki Miyazawa