Patents by Inventor Masanori YASHIRO
Masanori YASHIRO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230187892Abstract: A line narrowing gas laser device includes a line narrowing device, an output coupling mirror, a laser chamber arranged on an optical path of an optical resonator, a first holder which supports the output coupling mirror, a second holder which supports the first holder to be rotatable about a rotation axis of the first holder, and an adjustment device supported by the second holder and being in contact with the first holder to rotate the first holder about the rotation axis. The line narrowing device has a characteristic of changing, into a first direction, beam pointing of laser light output toward the output coupling mirror when temperature inside the line narrowing device rises. The second holder and the adjustment device rotate the first holder in a direction in which a change in the first direction in the beam pointing of the laser light is suppressed by thermal expansion.Type: ApplicationFiled: February 2, 2023Publication date: June 15, 2023Applicant: Gigaphoton Inc.Inventors: Yusuke SAITO, Masanori YASHIRO, Hiroshi FURUSATO, Yosuke WATANABE, Tokinori TERAO
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Patent number: 11081850Abstract: A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the first control valve on a basis of a result of the calculation of the second amount.Type: GrantFiled: April 20, 2020Date of Patent: August 3, 2021Assignee: Gigaphoton Inc.Inventors: Natsushi Suzuki, Osamu Wakabayashi, Hiroaki Tsushima, Masanori Yashiro
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Patent number: 10971883Abstract: A gas purification system may include: a circulation gas pipe in which a second end is connected at a first position to a second pipe through which gas is supplied from a gas supply source; a booster pump; a gas purification unit; a first tank in the circulation gas pipe; a first valve positioned between the gas supply source and the first position, the first valve having an open position and a closed position; and a second valve positioned between the first tank and the second end, the second valve having an open position and a closed position, the second valve configured to be in the closed position when the first valve is in the open position.Type: GrantFiled: November 1, 2018Date of Patent: April 6, 2021Assignee: Gigaphoton Inc.Inventors: Natsushi Suzuki, Osamu Wakabayashi, Hiroaki Tsushima, Masanori Yashiro
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Patent number: 10892592Abstract: A laser gas purifying system to purify laser gas emitted from a laser apparatus and return purified gas to the laser apparatus may include a first pipe configured to pass the laser gas emitted from the laser apparatus, a purifying apparatus connected to the first pipe and configured to purify the laser gas emitted from the laser apparatus, a second pipe connected to the purifying apparatus and configured to return the purified gas purified by the purifying apparatus to the laser apparatus, and an exhausting device provided in at least one of the first pipe, the purifying apparatus, and the second pipe.Type: GrantFiled: April 16, 2018Date of Patent: January 12, 2021Assignee: Gigaphoton Inc.Inventors: Natsushi Suzuki, Masanori Yashiro, Osamu Wakabayashi
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Patent number: 10879664Abstract: A laser gas regeneration system for an excimer laser includes a first pipe capable of supplying a laser chamber with a first laser gas, a second pipe capable of supplying the laser chamber with a second laser gas having a halogen gas concentration higher than that of the first laser gas, a third pipe allowing a gas exhausted from the laser chamber to pass therethrough, a gas refiner that refines the gas having passed through the third pipe, a branch that causes the refined gas to divide and flow into a fourth pipe and a fifth pipe, a first regenerated gas supplier that supplies the first pipe with a gas having divided and flowed into the fourth pipe, and a second regenerated gas supplier that adds a halogen gas to a gas having divided and flowed into the fifth pipe and supplies the second pipe with the halogen-added gas.Type: GrantFiled: April 4, 2019Date of Patent: December 29, 2020Assignee: Gigaphoton Inc.Inventors: Masanori Yashiro, Hiroaki Tsushima, Osamu Wakabayashi
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Publication number: 20200244029Abstract: A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the first control valve on a basis of a result of the calculation of the second amount.Type: ApplicationFiled: April 20, 2020Publication date: July 30, 2020Applicant: Gigaphoton Inc.Inventors: Natsushi SUZUKI, Osamu WAKABAYASHI, Hiroaki TSUSHIMA, Masanori YASHIRO
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Patent number: 10666008Abstract: A gas supply system may include a first gas supply line, a second gas supply line, a circulation gas pipe, a gas purification unit, a first valve, and a second valve. The first gas supply line may include a first branching point at which the first gas supply line branches into a first branch connected to a first chamber and a second branch connected to a second chamber and the second gas supply line may include a second branching point at which the second gas supply line branches into a third branch connected to the first chamber and a fourth branch connected to the second chamber. A first portion of the first gas supply line upstream from the first branching point and a second portion of the second gas supply line upstream from the second branching point may be constituted by separate pipes from each other.Type: GrantFiled: November 1, 2018Date of Patent: May 26, 2020Assignee: Gigaphoton Inc.Inventors: Natsushi Suzuki, Osamu Wakabayashi, Hiroaki Tsushima, Masanori Yashiro
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Publication number: 20190237928Abstract: A laser gas regeneration system for an excimer laser includes a first pipe capable of supplying a laser chamber with a first laser gas, a second pipe capable of supplying the laser chamber with a second laser gas having a halogen gas concentration higher than that of the first laser gas, a third pipe allowing a gas exhausted from the laser chamber to pass therethrough, a gas refiner that refines the gas having passed through the third pipe, a branch that causes the refined gas to divide and flow into a fourth pipe and a fifth pipe, a first regenerated gas supplier that supplies the first pipe with a gas having divided and flowed into the fourth pipe, and a second regenerated gas supplier that adds a halogen gas to a gas having divided and flowed into the fifth pipe and supplies the second pipe with the halogen-added gas.Type: ApplicationFiled: April 4, 2019Publication date: August 1, 2019Applicant: Gigaphoton Inc.Inventors: Masanori YASHIRO, Hiroaki TSUSHIMA, Osamu WAKABAYASHI
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Publication number: 20190081449Abstract: A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas and connected through a second control valve to a second laser gas supply source that supplies a second laser gas having a lower halogen gas concentration than the first laser gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump, connected through a third control valve to the laser chamber, which raises a pressure of a gas having passed through the purification column to a gas pressure that is higher than an operating gas pressure of the laser chamber; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump through the third control valve to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the firType: ApplicationFiled: November 1, 2018Publication date: March 14, 2019Applicant: Gigaphoton Inc.Inventors: Natsushi SUZUKI, Osamu WAKABAYASHI, Hiroaki TSUSHIMA, Masanori YASHIRO
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Publication number: 20190081451Abstract: There may be provided a laser unit including a display configured to display one or both of electric power consumed by the laser unit and electric energy consumed by the laser unit.Type: ApplicationFiled: November 9, 2018Publication date: March 14, 2019Applicant: GIGAPHOTON INC.Inventors: Akihiko KUROSU, Takashi MATSUNAGA, Hiroyuki MASUDA, Osamu WAKABAYASHI, Hiroaki TSUSHIMA, Masanori YASHIRO, Takeshi OHTA
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Publication number: 20190081450Abstract: A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas and connected through a second control valve to a second laser gas supply source that supplies a second laser gas having a lower halogen gas concentration than the first laser gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump, connected through a third control valve to the laser chamber, which raises a pressure of a gas having passed through the purification column to a gas pressure that is higher than an operating gas pressure of the laser chamber; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump through the third control valve to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the firType: ApplicationFiled: November 1, 2018Publication date: March 14, 2019Applicant: Gigaphoton Inc.Inventors: Natsushi SUZUKI, Osamu WAKABAYASHI, Hiroaki TSUSHIMA, Masanori YASHIRO
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Publication number: 20190074654Abstract: A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas and connected through a second control valve to a second laser gas supply source that supplies a second laser gas having a lower halogen gas concentration than the first laser gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump, connected through a third control valve to the laser chamber, which raises a pressure of a gas having passed through the purification column to a gas pressure that is higher than an operating gas pressure of the laser chamber; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump through the third control valve to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the firType: ApplicationFiled: November 1, 2018Publication date: March 7, 2019Applicant: Gigaphoton Inc.Inventors: Natsushi SUZUKI, Osamu WAKABAYASHI, Hiroaki TSUSHIMA, Masanori YASHIRO
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Publication number: 20190074655Abstract: A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas and connected through a second control valve to a second laser gas supply source that supplies a second laser gas having a lower halogen gas concentration than the first laser gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump, connected through a third control valve to the laser chamber, which raises a pressure of a gas having passed through the purification column to a gas pressure that is higher than an operating gas pressure of the laser chamber; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump through the third control valve to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the firType: ApplicationFiled: November 1, 2018Publication date: March 7, 2019Applicant: Gigaphoton Inc.Inventors: Natsushi SUZUKI, Osamu WAKABAYASHI, Hiroaki TSUSHIMA, Masanori YASHIRO
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Publication number: 20190020167Abstract: A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas and connected through a second control valve to a second laser gas supply source that supplies a second laser gas having a lower halogen gas concentration than the first laser gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump, connected through a third control valve to the laser chamber, which raises a pressure of a gas having passed through the purification column to a gas pressure that is higher than an operating gas pressure of the laser chamber; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump through the third control valve to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the firType: ApplicationFiled: June 27, 2018Publication date: January 17, 2019Applicant: Gigaphoton Inc.Inventors: Natsushi SUZUKI, Osamu WAKABAYASHI, Hiroaki TSUSHIMA, Masanori YASHIRO
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Patent number: 10164396Abstract: There may be provided a laser unit including a display configured to display one or both of electric power consumed by the laser unit and electric energy consumed by the laser unit.Type: GrantFiled: September 29, 2017Date of Patent: December 25, 2018Assignee: Gigaphoton Inc.Inventors: Akihiko Kurosu, Takashi Matsunaga, Hiroyuki Masuda, Osamu Wakabayashi, Hiroaki Tsushima, Masanori Yashiro, Takeshi Ohta
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Publication number: 20180241170Abstract: A laser gas purifying system to purify laser gas emitted from a laser apparatus and return purified gas to the laser apparatus may include a first pipe configured to pass the laser gas emitted from the laser apparatus, a purifying apparatus connected to the first pipe and configured to purify the laser gas emitted from the laser apparatus, a second pipe connected to the purifying apparatus and configured to return the purified gas purified by the purifying apparatus to the laser apparatus, and an exhausting device provided in at least one of the first pipe, the purifying apparatus, and the second pipe.Type: ApplicationFiled: April 16, 2018Publication date: August 23, 2018Applicant: Gigaphoton Inc.Inventors: Natsushi SUZUKI, Masanori YASHIRO, Osamu WAKABAYASHI
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Patent number: 10038295Abstract: A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas and connected through a second control valve to a second laser gas supply source that supplies a second laser gas having a lower halogen gas concentration than the first laser gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump, connected through a third control valve to the laser chamber, which raises a pressure of a gas having passed through the purification column to a gas pressure that is higher than an operating gas pressure of the laser chamber; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump through the third control valve to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the firType: GrantFiled: June 23, 2017Date of Patent: July 31, 2018Assignee: Gigaphoton Inc.Inventors: Natsushi Suzuki, Osamu Wakabayashi, Hiroaki Tsushima, Masanori Yashiro
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Publication number: 20180191122Abstract: A laser gas purifying system is configured to purify emission gas emitted from an ArF excimer laser apparatus using laser gas including xenon gas and to supply the purified gas to the ArF excimer laser apparatus. The laser gas purifying system comprises a xenon trap configured to reduce xenon gas concentration in the emission gas, and a xenon-adding unit configured to add xenon gas to the emission gas passed through the xenon trap.Type: ApplicationFiled: March 2, 2018Publication date: July 5, 2018Applicant: Gigaphoton Inc.Inventors: Natsushi SUZUKI, Masanori YASHIRO, Osamu WAKABAYASHI
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Publication number: 20180026414Abstract: There may be provided a laser unit including a display configured to display one or both of electric power consumed by the laser unit and electric energy consumed by the laser unit.Type: ApplicationFiled: September 29, 2017Publication date: January 25, 2018Applicant: GIGAPHOTON INC.Inventors: Akihiko KUROSU, Takashi MATSUNAGA, Hiroyuki MASUDA, Osamu WAKABAYASHI, Hiroaki TSUSHIMA, Masanori YASHIRO, Takeshi OHTA
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Patent number: 9825417Abstract: There may be provided a laser unit including a display configured to display one or both of electric power consumed by the laser unit and electric energy consumed by the laser unit.Type: GrantFiled: May 2, 2016Date of Patent: November 21, 2017Assignee: Gigaphoton Inc.Inventors: Akihiko Kurosu, Takashi Matsunaga, Hiroyuki Masuda, Osamu Wakabayashi, Hiroaki Tsushima, Masanori Yashiro, Takeshi Ohta