Patents by Inventor Masanori Yatsuda

Masanori Yatsuda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • HALOGEN COMPOUND ABSORBENT AND METHOD OF PRODUCING SYNGAS USING SAME
    Publication number: 20170246613
    Abstract: There is provided an absorbent for decreasing the leakage of halogen compound gases in subsequent processes, at high temperatures and in the presence of high concentrations of water vapor in the process of heating and gasifying a fuel, such as coal, to produce a synthesis gas. The adsorbent includes a halogen compound absorbent containing 30 to 90% by mass of a basic calcium compound and 10 to 70% by mass of a metal compound other than basic calcium compounds and/or of a clay mineral. A method for producing synthesis gas using the absorbent is also disclosed.
    Type: Application
    Filed: January 22, 2015
    Publication date: August 31, 2017
    Inventors: Xin Chen, Hery Jon, Yukihiro Okano, Nobutaka Kishi, Masanori Yatsuda
  • Treating agent for exhaust gas containing metal hydride compound and method for treating exhaust gas containing metal hydride compound
    Patent number: 7476373
    Abstract: The present invention provides a treating agent for a metal hydride-containing exhaust gas, wherein the treating agent is low in exothermic property and further high in performance in a treatment of harm-elimination for the metal hydride-containing exhaust gas, comprises at least one among metal hydroxide, metal carbonate, basic metal carbonate, and further supports at least one metal among group-VIII noble metals on periodic table and silver. Therefore, the performance of harm-elimination for the metal hydride-containing exhaust gas is prominently improved. The treating agent in the present invention is high in performance and further low in exothermic property, thereby that is useful in the treatment for the metal hydride-containing exhaust gas generated in semiconductor manufacturing industry and the like.
    Type: Grant
    Filed: April 8, 2002
    Date of Patent: January 13, 2009
    Assignee: Sued-Chemie Catalysts Japan, Inc.
    Inventors: Yasushi Shioya, Masanori Yatsuda, Minoru Takachi, Hiroshi Wada
  • Treating agent for exhaust gas containing metal hydride compound and method for treating exhaust gas containing metal hydride compound
    Publication number: 20050175520
    Abstract: The present invention provides a treating agent for a metal hydride-containing exhaust gas, wherein the treating agent is low in exothermic property and further high in performance in a treatment of harm-elimination for the metal hydride-containing exhaust gas, comprises at least one among metal hydroxide, metal carbonate, basic metal carbonate, and further supports at least one metal among group-VIII noble metals on periodic table and silver. Therefore, the performance of harm-elimination for the metal hydride-containing exhaust gas is prominently improved. The treating agent in the present invention is high in performance and further low in exothermic property, thereby that is useful in the treatment for the metal hydride-containing exhaust gas generated in semiconductor manufacturing industry and the like.
    Type: Application
    Filed: April 8, 2002
    Publication date: August 11, 2005
    Inventors: Yasushi Shioya, Masanori Yatsuda, Minoru Takachi, Hiroshi Wada