Patents by Inventor Masao Ishioka

Masao Ishioka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10724859
    Abstract: A distance-measuring device includes first and second stereoscopic cameras each to be used to measure the distance to an object included in an imaging range. The first stereoscopic camera includes two imaging elements arranged side by side in a first direction, and the second stereoscopic camera includes two imaging elements arranged side by side in a second direction. The second direction is defined as a direction which intersects a plane containing the first direction and an imaging direction of the first stereoscopic camera.
    Type: Grant
    Filed: August 1, 2016
    Date of Patent: July 28, 2020
    Assignee: SONY INTERACTIVE ENTERTAINMENT INC.
    Inventors: Akira Suzuki, Manabu Ishioka, Hidehiko Ogasawara, Yasuhiro Watari, Masao Shimizu, Takayuki Ishida, Toshihiro Kusunoki, Yuichiro Nakamura
  • Patent number: 10431617
    Abstract: There is provided a photoelectric conversion device in which a distance from a main surface to an inner surface of a first part of a dielectric film is smaller than a distance from the main surface to a top surface of a light shielding member, a distance from the main surface to an outer surface of the first part is smaller than a distance from the main surface to an outer surface of a second part of the dielectric film, an outer surface of a third part inclines to the top surface, a surface of a dielectric member inclines to the top surface, between the dielectric film and the top surface in a normal direction, and the dielectric member has a refractive index lower than a refractive index of the dielectric film.
    Type: Grant
    Filed: February 26, 2018
    Date of Patent: October 1, 2019
    Assignee: Canon Kabushiki Kaisha
    Inventors: Akihiro Kawano, Yoshiyuki Nakagawa, Masao Ishioka, Takashi Okagawa
  • Patent number: 10178286
    Abstract: A method for forming a color filter array includes a step of exposing a photosensitive color filter film, a step of forming a color filter array from the color filter film by developing the color filter film using a developer, and a step of cleaning the color filter array while rotating the color filter array and moving a nozzle for spraying fluid containing liquid and gas above the color filter array in a direction intersecting with an axis of the rotation. The method reduces variation in thickness of a color filter that is generated in the cleaning step.
    Type: Grant
    Filed: August 27, 2015
    Date of Patent: January 8, 2019
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Masao Ishioka, Daisuke Shimoyama, Takayuki Sumida, Kei Aoki, Yasuhiro Kawabata, Naoki Inatani, Tomoyuki Tezuka, Jun Iwata, Masaki Kurihara
  • Patent number: 10096545
    Abstract: There is provided an image capturing apparatus including a pixel circuit that generates a pixel signal based on an electric charge generated by photoelectric conversion and a logic circuit that outputs a signal based on the pixel signal. The image capturing apparatus includes a first contact plug connected to a source or a drain of a first transistor constituting the pixel circuit and a second contact plug connected to a source or a drain of a second transistor constituting the logic circuit. A diameter of the first contact plug is smaller than a diameter of the second contact plug.
    Type: Grant
    Filed: September 28, 2016
    Date of Patent: October 9, 2018
    Assignee: Canon Kabushiki Kaisha
    Inventors: Akihiro Kawano, Tsutomu Tange, Masao Ishioka, Koichi Tazoe
  • Publication number: 20180247967
    Abstract: There is provided a photoelectric conversion device in which a distance from a main surface to an inner surface of a first part of a dielectric film is smaller than a distance from the main surface to a top surface of a light shielding member, a distance from the main surface to an outer surface of the first part is smaller than a distance from the main surface to an outer surface of a second part of the dielectric film, an outer surface of a third part inclines to the top surface, a surface of a dielectric member inclines to the top surface, between the dielectric film and the top surface in a normal direction, and the dielectric member has a refractive index lower than a refractive index of the dielectric film.
    Type: Application
    Filed: February 26, 2018
    Publication date: August 30, 2018
    Inventors: Akihiro Kawano, Yoshiyuki Nakagawa, Masao Ishioka, Takashi Okagawa
  • Patent number: 9893110
    Abstract: A method of manufacturing a solid-state image sensor is provided. The method comprises preparing a structure which is covered by a protective film, depositing a first material by using a first color filter material on the protective film, forming a first color filter from the first material, depositing a second material by using a second color filter material after the forming the first color filter and forming a second color filter from the second material. An upper surface of the protective film has a concave portion. A part of the first material enters the concave portion in the depositing the first material, the first material is patterned so as to form a member in the concave portion from the first material in the forming the first color filter and the second material covers the member in the depositing the second material.
    Type: Grant
    Filed: March 23, 2016
    Date of Patent: February 13, 2018
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Takayuki Sumida, Masao Ishioka, Kei Aoki, Yasuhiro Kawabata, Naoki Inatani, Masaki Kurihara
  • Publication number: 20170092582
    Abstract: There is provided an image capturing apparatus including a pixel circuit that generates a pixel signal based on an electric charge generated by photoelectric conversion and a logic circuit that outputs a signal based on the pixel signal. The image capturing apparatus includes a first contact plug connected to a source or a drain of a first transistor constituting the pixel circuit and a second contact plug connected to a source or a drain of a second transistor constituting the logic circuit. A diameter of the first contact plug is smaller than a diameter of the second contact plug.
    Type: Application
    Filed: September 28, 2016
    Publication date: March 30, 2017
    Inventors: Akihiro Kawano, Tsutomu Tange, Masao Ishioka, Koichi Tazoe
  • Patent number: 9553217
    Abstract: A method of manufacturing a semiconductor device is provided. The method includes forming a passivation film on a substrate including a first element region, a second element region adjacent to the first element region in a first direction, a third element region adjacent to the first region in a second direction, and a first scribe region extending to the first direction between the first element region and the third element region, forming a first trench in the passivation film between the first scribe region and the first element region, forming a second trench in the passivation film between the third element region and the first scribe region, and forming a film on the passivation film where the trenches have been formed by coating. The each of trenches is formed continuously along the first and the second element region.
    Type: Grant
    Filed: June 9, 2015
    Date of Patent: January 24, 2017
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Masao Ishioka, Nobutaka Ukigaya
  • Patent number: 9508654
    Abstract: A method of manufacturing a semiconductor device is provided. The method includes forming a passivation film on a substrate including a plurality of element regions and a scribe region, forming a trench in the passivation film in a region of the scribe region along an outer edge of each of the element regions, and forming a film on the passivation film in which the trench has been formed by coating. A depth of a first section in a first position of the trench is shallower than a depth of a second section in a second position of the trench. A width of the first section is wider than a width of the second section.
    Type: Grant
    Filed: June 8, 2015
    Date of Patent: November 29, 2016
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Nobutaka Ukigaya, Masao Ishioka
  • Publication number: 20160293657
    Abstract: A method of manufacturing a solid-state image sensor is provided. The method comprises preparing a structure which is covered by a protective film, depositing a first material by using a first color filter material on the protective film, forming a first color filter from the first material, depositing a second material by using a second color filter material after the forming the first color filter and forming a second color filter from the second material. An upper surface of the protective film has a concave portion. A part of the first material enters the concave portion in the depositing the first material, the first material is patterned so as to form a member in the concave portion from the first material in the forming the first color filter and the second material covers the member in the depositing the second material.
    Type: Application
    Filed: March 23, 2016
    Publication date: October 6, 2016
    Inventors: Takayuki Sumida, Masao Ishioka, Kei Aoki, Yasuhiro Kawabata, Naoki Inatani, Masaki Kurihara
  • Publication number: 20160065916
    Abstract: A method for forming a color filter array includes a step of exposing a photosensitive color filter film, a step of forming a color filter array from the color filter film by developing the color filter film using a developer, and a step of cleaning the color filter array while rotating the color filter array and moving a nozzle for spraying fluid containing liquid and gas above the color filter array in a direction intersecting with an axis of the rotation. The method reduces variation in thickness of a color filter that is generated in the cleaning step.
    Type: Application
    Filed: August 27, 2015
    Publication date: March 3, 2016
    Inventors: Masao Ishioka, Daisuke Shimoyama, Takayuki Sumida, Kei Aoki, Yasuhiro Kawabata, Naoki Inatani, Tomoyuki Tezuka, Jun Iwata, Masaki Kurihara
  • Publication number: 20150364514
    Abstract: A method of manufacturing a semiconductor device is provided. The method includes forming a passivation film on a substrate including a plurality of element regions and a scribe region, forming a trench in the passivation film in a region of the scribe region along an outer edge of each of the element regions, and forming a film on the passivation film in which the trench has been formed by coating. A depth of a first section in a first position of the trench is shallower than a depth of a second section in a second position of the trench. A width of the first section is wider than a width of the second section.
    Type: Application
    Filed: June 8, 2015
    Publication date: December 17, 2015
    Inventors: Nobutaka Ukigaya, Masao Ishioka
  • Publication number: 20150364510
    Abstract: A method of manufacturing a semiconductor device is provided. The method includes forming a passivation film on a substrate including a first element region, a second element region adjacent to the first element region in a first direction, a third element region adjacent to the first region in a second direction, and a first scribe region extending to the first direction between the first element region and the third element region, forming a first trench in the passivation film between the first scribe region and the first element region, forming a second trench in the passivation film between the third element region and the first scribe region, and forming a film on the passivation film where the trenches have been formed by coating. The each of trenches is formed continuously along the first and the second element region.
    Type: Application
    Filed: June 9, 2015
    Publication date: December 17, 2015
    Inventors: Masao Ishioka, Nobutaka Ukigaya
  • Patent number: 8748213
    Abstract: A method of forming a light transmission member includes a plurality of processes to form a plurality of sections of the light transmission member. Notably, after a first class process to form light transmission portions having narrow-band light transmission properties in a first class section group, a second class process is performed to form light transmission portions in a second class section group, and a fourth class process is performed to form light transmission portions having wide-band light transmission properties in a first section.
    Type: Grant
    Filed: February 21, 2013
    Date of Patent: June 10, 2014
    Assignee: Canon Kabushiki Kaisha
    Inventor: Masao Ishioka