Patents by Inventor Masao Morita

Masao Morita has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6064403
    Abstract: Described herein is an apparatus for and a method of performing image-drawing processing on image-drawn objects such as at least characters or graphics with the image-drawn objects as an input.
    Type: Grant
    Filed: April 24, 1998
    Date of Patent: May 16, 2000
    Assignee: Fuji Photo Co., Ltd.
    Inventors: Kazuto Hayashi, Masao Morita
  • Patent number: 6005586
    Abstract: A drawing processing apparatus has a drawing data input section 2 for receiving the drawing data to be drawn. A drawing data determination section 3 determines the drawing data type from the drawing data input to the drawing data input section 2 and passes the drawing data having an outline shape to a vector generation section 4 and a drawing attribute processing section 5 and the drawing data having no outline shape to the drawing attribute processing section 5 according to the drawing data type. The vector generation section 4 prepares a vector representing an outline shape from the drawing data received from the drawing data determination section 3. The drawing attribute processing section 5 gets different drawing attributes for each drawing data type from the drawing data passed from the drawing data determination section 3 and performs processing as required.
    Type: Grant
    Filed: December 12, 1997
    Date of Patent: December 21, 1999
    Assignee: Fuji Xerox Co., Ltd.
    Inventors: Masao Morita, Kazuto Hayashi
  • Patent number: 5926188
    Abstract: An overlap judgment device writes job sequence divided by a job sequencing device to map memory constituted at coarser resolution than the resolution of a final generated image. At this time, if an image element where a job sequence number is already written is overwritten, the dependence of the job sequence upon processing order is extracted and if an image element is not overwritten, the independence of the job sequence is extracted. A number allocated to job sequence is written to the map memory, if an image element is overwritten, the number of the preceding job sequence is allocated to the overwritten job sequence and referred to when a final image is generated.
    Type: Grant
    Filed: November 5, 1996
    Date of Patent: July 20, 1999
    Assignee: Fuji Xerox Co., Ltd.
    Inventors: Koushi Kawamoto, Shoji Sakamoto, Masao Morita, Kazuto Hayashi
  • Patent number: 5822509
    Abstract: An apparatus and method for creating a drawing program used by a printer to print a document calculates the load on the printer for printing portions of the document, and embeds the calculated loads in the drawing program. Document data is converted into page description language commands that are used by a printer to print the document. Load parameters indicating the time and/or the memory capacity required by the printer to process each command of the page description language are stored in a memory unit. The load of the printer for each of the converted commands is calculated for each process unit of the document, which corresponds to a command string, based on the load parameters. A drawing program to be processed by the printer is then created from commands and the calculated loads.
    Type: Grant
    Filed: October 17, 1996
    Date of Patent: October 13, 1998
    Assignee: Fuji Xerox Co., Ltd.
    Inventors: Masao Morita, Ichiro Yamashita, Kazuto Hayashi
  • Patent number: 5389215
    Abstract: In an electrochemical detection method using an apparatus including a first vessel and a second vessel, a reference electrolytic solution in the second vessel, first and second closely spaced working electrodes immersed in a sample solution for measurement in the first vessel, a stripping electrode immersed in the reference electrolytic solution, and an ionic conductor arranged between the first vessel and the second vessel, the reference electrolytic solution contains an electrolyte which can be deposited and dissolved by an electrochemical reaction by applying a potential to the stripping electrode. In a first stage, a pre-electrolysis potential is applied to the first working electrode with the stripping electrode being connected to the second working electrode to deposit the electrolyte in the reference electrolytic solution on the stripping electrode.
    Type: Grant
    Filed: April 27, 1993
    Date of Patent: February 14, 1995
    Assignee: Nippon Telegraph and Telephone Corporation
    Inventors: Tsutomu Horiuchi, Osamu Niwa, Hisao Tabei, Masao Morita
  • Patent number: 5304533
    Abstract: A process for producing a superconductor of an oxide system, which comprises uniformly mixing metal elements for constituting the oxide system at least partly in the form of alkoxides having CN.sup.--, X.sup.-- wherein A is a halogen atom and/or an amine, with the rest, if any, being in the form of acetylacetonates, carboxylates and/or water-soluble inorganic compounds to obtain a homogeneous mixture, and sintering the mixture.
    Type: Grant
    Filed: August 24, 1988
    Date of Patent: April 19, 1994
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Toshio Kobayashi, Fusaoki Uchikawa, Kenji Nomura, Fumio Fujiwara, Sigeru Matsuno, Masao Morita, Shouichi Yokoyama
  • Patent number: 5305174
    Abstract: An electrical power system protection device includes a circuit breaker and a switch connected in series to a power line. The protection device also has a current limiting element connected in parallel to the circuit breaker. When the level of electrical current flowing in the power line, detected by a current detector, has exceeded a predetermined first set level, a first over-current detector delivers immediately a trip command to the circuit breaker. As a consequence, fault current is commutated to the current limiting element so that any drop of voltage in the power line upstream of the circuit breaker is greatly suppressed. When a state in which a predetermined second set level is exceeded by the detected current level is continued beyond a predetermined period, a second over-current detector delivers an off command to the switch, thus protecting the upstream portion of the power line against the fault in this power line.
    Type: Grant
    Filed: September 3, 1991
    Date of Patent: April 19, 1994
    Assignees: Hitachi, Ltd., Chubu Electric Power Co., Ltd.
    Inventors: Masao Morita, Toshiaki Ueda, Yukio Kurosawa, Hiroshi Arita, Tokio Yamagiwa
  • Patent number: 5247271
    Abstract: A superconducting apparatus including a superconducting solenoid coil made of a superconducting wire wound around a bobbin. The superconducting wire has a superconductor having a rectangular cross-section of a narrow width, and the superconductor of the superconducting wire has a larger sectional area at the end region of the superconducting solenoid coil than at the central region. The superconductor at the end region of the superconducting solenoid coil may comprise a plurality of superconducting wires with superconductors having a large sectional area, or may comprise a plurality of superconductors connected in parallel to each other, thereby increasing the effective sectional area of the superconductor in the end region.
    Type: Grant
    Filed: January 28, 1993
    Date of Patent: September 21, 1993
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Toshimi Kawamura, Masao Morita
  • Patent number: 5004720
    Abstract: A process for producing a superconductor of an oxide system, which comprises uniformly mixing metal elements for constituting the oxide system at least partly in the form of acetylacetonates in a solvent with the rest, if any, being in the form of alkoxides, carboxylates and/or inorganic salts, hydroxides and/or oxides to obtain a homogeneous mixture, and sintering the mixture.
    Type: Grant
    Filed: August 24, 1988
    Date of Patent: April 2, 1991
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Toshio Kobayashi, Fusaoki Uchikawa, Kenji Nomura, Masao Morita, Shouichi Yokoyama
  • Patent number: 4816962
    Abstract: A uniform magnetic field coil assembly having a plurality of pairs of coil elements each included in circuit comprising the parallel connection of a permanent current switch and its protecting means and an individual exciting power source, wherein the plurality of pairs of coil elements are symmetrically disposed against a plane perpendicular to the central axis of the uniform magnetic field coil assembly in the longitudinal direction and the plurality of pairs of coil elements are connected in series, thereby regulating the current flowing to each of the plurality of pairs of coil assembly elements for forming the uniform magnetic field coil as predetermined.
    Type: Grant
    Filed: November 20, 1987
    Date of Patent: March 28, 1989
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Tadatoshi Yamada, Masao Morita, Shunji Yamamoto, Tetsuya Matsuda, Masatami Iwamoto
  • Patent number: 4702990
    Abstract: The present invention provides a photosensitive resin composition used to form a top resist layer of a multilayer resist system, the composition comprising a photosensitive polyphenylsilsesquioxane represented by the following general formula (I) of: ##STR1## wherein X is selected from the group consisting of acryloyloxymethyl, methacryloyloxymethyl, and cinnamoyloxymethyl; and l, m and n are zero or positive integers but l and m do not take the value of zero simultaneously; and a bisazide compound added to act as a cross-linking agent.The photosensitive resin composition has high sensitivity to UV light and excellent resistance to reactive ion etching under oxygen gas (O.sub.2 RIE).
    Type: Grant
    Filed: May 10, 1985
    Date of Patent: October 27, 1987
    Assignee: Nippon Telegraph and Telephone Corporation
    Inventors: Akinobu Tanaka, Masao Morita, Saburo Imamura, Toshiaki Tamamura, Osamu Kogure
  • Patent number: 4652826
    Abstract: A process and apparatus for correcting a crude magnetic field of a main field generator having correcting magnetic field generators associated therewith to produce a substantially homogeneous corrected field. The process comprises the steps of measuring the distribution of said crude magnetic field at a plurality of points, expressing the crude magnetic field at each of the plurality of different measured points by a polynomial equation which contains a main homogeneous magnetic field component, successively higher order inhomogeneous magnetic field components, and a residual, determining the magnetic field output for the correcting generators such that the successively higher order inhomogeneous magnetic field components of the crude magnetic field are completely cancelled by the magnetic field outputs, respectively, of the correcting generators, and producing and superpositioning on the crude magnetic field the determined magnetic field output from the correcting generators.
    Type: Grant
    Filed: March 11, 1985
    Date of Patent: March 24, 1987
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Syunji Yamamoto, Tadatoshi Yamada, Masao Morita, Tetsuya Matsuda
  • Patent number: 4574156
    Abstract: A compound of the formula: ##STR1## (R=H, CH.sub.3 O; n=2 to 5) is effective for improving blood circulation system.
    Type: Grant
    Filed: December 7, 1984
    Date of Patent: March 4, 1986
    Assignee: Wako Pure Chemical Industries, Ltd.
    Inventors: Masao Morita, Jiro Sugimoto, Komei Mizuno, Motoaki Tanaka, Fumiyoshi Urano
  • Patent number: 4564579
    Abstract: A pattern forming material contains a siloxane polymer having the general formula: ##STR1## [wherein R, R' and R" are the same or different and are respectively one member selected from hydrogen, an alkyl group or a phenyl group; X is one member selected from fluorine, chlorine, bromine, iodine and a --CH.sub.2 Y group (wherein Y is one member selected from chlorine, fluorine, bromine, iodine, an acryloyloxy group, a methacryloyloxy group, and a cinnamoyloxy group); and l, m and n are respectively 0 or a positive integer, l and m not being simultaneously 0]. The material has a high sensitivity to high-energy radiation, a high contrast, and an excellent resistance to reactive ion etching under oxygen gas. The material is conveniently used as a negative resist for forming a submicron pattern having a high aspect ratio.
    Type: Grant
    Filed: December 12, 1984
    Date of Patent: January 14, 1986
    Assignee: Nippon Telegraph & Telephone Public Corporation
    Inventors: Masao Morita, Akinobu Tanaka, Saburo Imamura, Toshiaki Tamamura, Osamu Kogure
  • Patent number: 4537530
    Abstract: The present invention aims at providing a method and a device therefor which can effectively as well as accurately bury a cable under marine beds not only when a cable is newly laid and buried but also when a cable has to be reburied. The method and the device according to the present invention are characterized in that a burying device is guided to approach the cable by using a travelling member provided on said burying device, a travelling control mechanism thereof being controlled by a receiving output from a transmitter which is mounted on the cable in advance by a receiver provided on the burying device, that the cable is caught and held by a cable engaging member of said burying device while the burying device is detecting the buried cable track and travelling therealong, and that at the same time an excavation member of said burying device digs and forms a groove while the burying device guides and buries the cable within the excavated groove.
    Type: Grant
    Filed: March 7, 1984
    Date of Patent: August 27, 1985
    Assignee: Kokusai Denshin Denwa Co., Ltd.
    Inventors: Kazuomi Yamamura, Hideo Ishihara, Yoshinao Iwamoto, Hifumi Sakaguchi, Masao Morita, Toshio Izawa
  • Patent number: 4507384
    Abstract: A pattern forming material contains a siloxane polymer having the general formula: ##STR1## [wherein R, R' and R" are the same or different and are respectively one member selected from hydrogen, an alkyl group or a phenyl group; X is one member selected from fluorine, chlorine, bromine, iodine and a --CH.sub.2 Y group (wherein Y is one member selected from chlorine, fluorine, bromine, iodine, an acryloyloxy group, a methacryloyloxy group, and a cinnamoyloxy group); and l, m and n are respectively 0 or a positive integer, l and m not being simultaneously 0]. The material has a high sensitivity to high-energy radiation, a high contrast, and an excellent resistance to reactive ion etching under oxygen gas. The material is conveniently used as a negative resist for forming a submicron pattern having a high aspect ratio.
    Type: Grant
    Filed: February 15, 1984
    Date of Patent: March 26, 1985
    Assignee: Nippon Telegraph & Telephone Public Corporation
    Inventors: Masao Morita, Akinobu Tanaka, Saburo Imamura, Toshiaki Tamamura, Osamu Kogure
  • Patent number: 4426247
    Abstract: A method for forming a micropattern, comprises the steps of forming an organic polymeric material layer on a substrate, forming a silicone layer on the organic polymeric material layer, selectively irradiating a surface of the silicone layer with a high-energy beam, exposing the surface of the silicone layer to a radical addition polymerizable monomer gas so as to form a graft polymer film on an irradiated portion of the surface of the silicone layer, performing reactive ion etching using the graft polymer film as a mask so as to form a silicone pattern, and performing reactive ion etching using the silicone pattern as a mask so as to form an organic polymeric material pattern. The method allows formation of a resist pattern with a high precision and a high aspect ratio.
    Type: Grant
    Filed: April 6, 1983
    Date of Patent: January 17, 1984
    Assignee: Nippon Telegraph & Telephone Public Corporation
    Inventors: Toshiaki Tamamura, Saburo Imamura, Masao Morita, Osamu Kogure