Patents by Inventor Masao Oda

Masao Oda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8563854
    Abstract: A dye-sensitized photoelectric conversion apparatus having enhanced energy conversion efficiency and a production method thereof are provided. The dye-sensitized photoelectric conversion apparatus which has semiconductor layer (13) containing a photosensitizing dye (14) and is constituted such that a charge carrier generated by allowing light to incident in the photosensitizing dye (14) is drawn out through the semiconductor layer (13), in which the semiconductor layer (13) is constituted by a plurality of regions (13A to 13D) having different energy levels from one another of a passage through which the charge carrier is transferred. Further, the plurality of regions (13A to 13D) are arranged such that the energy levels are reduced stepwise and/or continuously in the direction of drawing the charge carrier out.
    Type: Grant
    Filed: August 19, 2003
    Date of Patent: October 22, 2013
    Assignee: Sony Corporation
    Inventors: Tsutomu Imoto, Masao Oda
  • Patent number: 7196364
    Abstract: A rectifier device, based on a novel operation principle completely different from that of conventional molecular electronic devices, is made by coupling two or more molecules or molecule arrays (11) at certain joints. By making use of the phenomenon that transfer of an excited state or exciton from one molecule or molecule array to another molecule or molecule array coupled thereto progresses asymmetrically due to spatial asymmetry at the joint, a rectifying function related to the transfer of the excited state of exciton is obtained. Additionally, by controlling the rectification property in addition to the rectification function, an ion sensor device or a switching device is made. A resistor device may be inserted in the rectifier device.
    Type: Grant
    Filed: April 6, 2005
    Date of Patent: March 27, 2007
    Assignee: Sony Corporation
    Inventor: Masao Oda
  • Patent number: 7148523
    Abstract: A rectifier device, based on a novel operation principle completely different from that of conventional molecular electronic devices, is made by coupling two or more molecules or molecule arrays (11) at certain joints. By making use of the phenomenon that transfer of an excited state or exciton from one molecule or molecule array to another molecule or molecule array coupled thereto progresses asymmetrically due to spatial asymmetry at the joint, a rectifying function related to the transfer of the excited state of exciton is obtained. Additionally, by controlling the rectification property in addition to the rectification function, an ion sensor device or a switching device is made. A resistor device may be inserted in the rectifier device.
    Type: Grant
    Filed: April 6, 2005
    Date of Patent: December 12, 2006
    Assignee: Sony Corporation
    Inventors: Masao Oda, Hajime Matsumura
  • Publication number: 20060137739
    Abstract: A dye-sensitized photoelectric conversion apparatus having enhanced energy conversion efficiency and a production method thereof are provided. The dye-sensitized photoelectric conversion apparatus which has semiconductor layer (13) containing a photosensitizing dye (14) and is constituted such that a charge carrier generated by allowing light to incident in the photosensitizing dye (14) is drawn out through the semiconductor layer (13), in which the semiconductor layer (13) is constituted by a plurality of regions (13A to 13D) having different energy levels from one another of a passage through which the charge carrier is transferred. Further, the plurality of regions (13A to 13D) are arranged such that the energy levels are reduced stepwise and/or continuously in the direction of drawing the charge carrier out.
    Type: Application
    Filed: August 19, 2003
    Publication date: June 29, 2006
    Inventors: Tsutomu Imoto, Masao Oda
  • Publication number: 20050205895
    Abstract: A rectifier device, based on a novel operation principle completely different from that of conventional molecular electronic devices, is made by coupling two or more molecules or molecule arrays (11) at certain joints. By making use of the phenomenon that transfer of an excited state or exciton from one molecule or molecule array to another molecule or molecule array coupled thereto progresses asymmetrically due to spatial asymmetry at the joint, a rectifying function related to the transfer of the excited state of exciton is obtained. Additionally, by controlling the rectification property in addition to the rectification function, an ion sensor device or a switching device is made. A resistor device may be inserted in the rectifier device.
    Type: Application
    Filed: April 6, 2005
    Publication date: September 22, 2005
    Applicant: Sony Corporation
    Inventors: Masao Oda, Hajime Matsumura
  • Publication number: 20050175984
    Abstract: A rectifier device, based on a novel operation principle completely different from that of conventional molecular electronic devices, is made by coupling two or more molecules or molecule arrays (11) at certain joints. By making use of the phenomenon that transfer of an excited state or exciton from one molecule or molecule array to another molecule or molecule array coupled thereto progresses asymmetrically due to spatial asymmetry at the joint, a rectifying function related to the transfer of the excited state of exciton is obtained. Additionally, by controlling the rectification property in addition to the rectification function, an ion sensor device or a switching device is made. A resistor device may be inserted in the rectifier device.
    Type: Application
    Filed: April 6, 2005
    Publication date: August 11, 2005
    Applicant: Sony Corporation
    Inventor: Masao Oda
  • Patent number: 6914276
    Abstract: A rectifier device, based on a novel operation principle completely different from that of conventional molecular electronic devices, is made by coupling two or more molecules or molecule arrays (11) at certain joints. By making use of the phenomenon that transfer of an excited state or exciton from one molecule or molecule array to another molecule or molecule array coupled thereto progresses asymmetrically due to spatial asymmetry at the joint, a rectifying function related to the transfer of the excited state of exciton is obtained. Additionally, by controlling the rectification property in addition to the rectification function, an ion sensor device or a switching device is made. A resistor device may be inserted in the rectifier device.
    Type: Grant
    Filed: September 11, 2003
    Date of Patent: July 5, 2005
    Assignee: Sony Corporation
    Inventors: Masao Oda, Hajime Matsumura
  • Publication number: 20040094818
    Abstract: A rectifier device, based on a novel operation principle completely different from that of conventional molecular electronic devices, is made by coupling two or more molecules or molecule arrays (11) at certain joints. By making use of the phenomenon that transfer of an excited state or exciton from one molecule or molecule array to another molecule or molecule array coupled thereto progresses asymmetrically due to spatial asymmetry at the joint, a rectifying function related to the transfer of the excited state of exciton is obtained. Additionally, by controlling the rectification property in addition to the rectification function, an ion sensor device or a switching device is made. A resistor device may be inserted in the rectifier device.
    Type: Application
    Filed: September 11, 2003
    Publication date: May 20, 2004
    Applicant: Sony Corporation
    Inventors: Masao Oda, Hajime Matsumura
  • Patent number: 5787910
    Abstract: A washing apparatus is compact as well as easy to handle, with which a user can wash down dirt effectively in a short time. Washing liquid supplied from the washing liquid supplying means is made in the form of high-speed jet liquid by a high-speed jet stream spouting means. The high-speed jet liquid is spouted from the aperture of the first cover to wash down dirt by the impact given by the high-speed jet liquid. A washing object is dewatered by gas spouted from the aperture by a blowing means. The high-speed jet stream spouting means is comprised of a rotating object having a plurality of radial shape flow paths extending from a center portion to a circumference of the rotating object, and a liquid supplying portion for supplying washing liquid to a central portion of the radial shape flow paths. A rotating means rotates the rotating object so that washing liquid supplied in the radial shape flow paths is accelerated in the direction of a circumference as well as a radius of the rotating object by rotation.
    Type: Grant
    Filed: May 24, 1996
    Date of Patent: August 4, 1998
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Masao Oda, Michio Fujiwara, Tomoyuki Kanda, Hideho Taguchi, Yasunori Kurahashi, Takao Morisaki, Takasuke Umemoto, Takayuki Inoue, Fusako Tanaka
  • Patent number: 5252132
    Abstract: A semiconductor film production apparatus includes a reaction vessel for containing a substrate and including a gas supply port for supplying a reaction gas to the vessel, a gas discharge port for discharging the reaction gas from the vessel after reaction, and a light-transmitting glass window; a light source disposed outside the reaction vessel for irradiating a substrate in the reaction vessel through the light-transmitting glass window to heat the substrate; a cylindrical substrate holder disposed in the reaction vessel for holding the substrate with a first surface facing the light source and a second surface, opposed to the first surface, exposed to the reaction gas; a ring plate having a central opening with an area smaller than the substrate and an outside diameter dividing the reaction vessel into two compartments, the ring plate contacting the first surface of the substrate; a carrier gas supply port for introducing a carrier gas between the substrate and the light-transmitting glass window; and a r
    Type: Grant
    Filed: November 22, 1991
    Date of Patent: October 12, 1993
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Masao Oda, Yoshiyuki Goto, Toyomi Osige, Tatsuya Iwasa, Yoshimi Kinoshita, Katsuhisa Kitano, Kazuo Yoshida
  • Patent number: 5192370
    Abstract: Method of forming a thin film on a substrate by CVD (Chemical Vapor Deposition) method and an apparatus therefor, wherein a first gas is supplied from a reaction gas supply port in a reaction chamber, and an active species produced by exciting a second gas are supplied from an active species supply port in the reaction chamber, and a thin film is formed on the substrate by reaction of the first reaction gas and the active species, since a metal porous plate having a number of small holes is installed close to the substrate between the active species supply port and a heater so as to enclose at least the substrate and the active species supply port, the precursor forming reaction is limited to position on the surface of the substrate and diffusion of the precursor to the outer circumferential portion and the inner wall of the reaction chamber is prevented, thereby the low dust producing process to advance the thin film forming reaction is obtained without generating the reaction product of fine particle form w
    Type: Grant
    Filed: June 22, 1990
    Date of Patent: March 9, 1993
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Masao Oda, Tatsuya Iwasa
  • Patent number: 5024182
    Abstract: An apparatus for forming a thin film on a substrate by bringing a first gas and a second gas into reaction with each other in a reaction chamber near the surface of the substrate in the reaction chamber. The apparatus has a plasma generating chamber disposed adjacent to the reaction chamber for generating a plasma of the first gas in a predetermined direction. A first gas inlet is provided at the boundary between the plasma generating chamber and the reaction chamber and formed to extend in the predetermined direction, while a second gas inlet is provided in the vicinity of the first gas inlet and extended in the predetermined direction.
    Type: Grant
    Filed: July 6, 1989
    Date of Patent: June 18, 1991
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Toshiyuki Kobayashi, Masao Koshinaka, Yoshimi Kinoshita, Masao Oda, Kenji Yoshizawa
  • Patent number: 5010842
    Abstract: Apparatus for forming a thin film on a substrate surface by a CVD (Chemical Vapor Deposition) method which includes diffusing pipes for diffusing and supplying a first reactive gas, and uniformizing plates for supplying uniformly an active species formed through excitation of a second reactive gas. The first reactive gas and the active species are mixed uniformly with each other, and the resultant uniform mixture is supplied uniformly to the substrate surface, whereby a uniform film deposition rate is obtained in a reaction zone in which the thin film is formed, and a uniform thin film is formed over the entire substrate surface even when the area of the substrate surface is large.
    Type: Grant
    Filed: June 7, 1989
    Date of Patent: April 30, 1991
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Masao Oda, Yoshimi Kinoshita, Masahiro Hayama
  • Patent number: 4919077
    Abstract: A semiconductor producing apparatus for use in photochemical vapor deposition for forming various types of film on a substrate at a low temperature as a first reaction gas excited and decomposed by a laser beam and a second reaction gas converted into a plasma state by a plasma generator react with each other in a reaction chamber in which a substrate is mounted. Two kinds of electrodes are provided in upper and lower positions in the reaction chamber opposing each other. The upper electrode is connected to a high-frequency power source and the lower electrode is used as a common electrode on which the substrate is mounted to control film forming speed, while an ultraviolet light source for irradiating the interior of the reaction chamber with ultraviolet rays is provided to obtain a dense film.
    Type: Grant
    Filed: August 23, 1988
    Date of Patent: April 24, 1990
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Masao Oda, Toshiyuki Kobayashi, Yoshimi Kinoshita