Patents by Inventor Masaomi Makino

Masaomi Makino has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • RESIST COMPOSITION AND PATTERN-FORMING METHOD USING THE SAME
    Publication number: 20080076062
    Abstract: A resist composition includes (A) a resin that includes a repeating unit represented by the following formula (1), and an acid-decomposable crosslinking group; and (B) a compound that generates an acid upon irradiation with an actinic ray or radiation: wherein AR represents a benzene ring or a naphthalene ring; Rn represents an alkyl group, a cycloalkyl group, or an aryl group; and A represents a hydrogen atom, an alkyl group, a cycloalkyl group, a halogen atom, a cyano group, or an alkyloxycarbonyl group.
    Type: Application
    Filed: September 21, 2007
    Publication date: March 27, 2008
    Applicant: FUJIFILM CORPORATION
    Inventor: Masaomi MAKINO
  • POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME
    Publication number: 20080050675
    Abstract: A positive resist composition comprising: (A) a resin having a repeating unit represented by a specific formula (I) and a repeating unit represented by a specific formula (A1); (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and (F) a surfactant represented by a specific formula (II); and a pattern forming method using the same.
    Type: Application
    Filed: August 24, 2007
    Publication date: February 28, 2008
    Applicant: FUJIFILM CORPORATION
    Inventors: Fumiyuki Nishiyama, Kazuyoshi Mizutani, Masaomi Makino
  • Positive resist composition and pattern forming method using the same
    Publication number: 20070218406
    Abstract: A resist composition, which comprises: (A) a resin containing a repeating unit represented by formula (I); and (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation: wherein AR represents an aryl group; Rn represents an alkyl group, a cycloalkyl group or an aryl group; and A represents an atom or group selected from the group consisting of a hydrogen atom, an alkyl group, a halogen atom, a cyano group and an alkyloxycarbonyl group, and a pattern forming method using the resist composition.
    Type: Application
    Filed: March 14, 2007
    Publication date: September 20, 2007
    Applicant: FUJIFILM Corporation
    Inventors: Kazuyoshi Mizutani, Kaoro Iwato, Kunihiko Kodama, Masaomi Makino, Toru Tsuchihashi
  • Positive resist composition and pattern forming method using the same
    Publication number: 20070218407
    Abstract: A resist composition, which comprises: (A) a resin containing a repeating unit represented by formula (I); and (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation: wherein AR represents a benzene ring or a naphthalene ring; R represents a hydrogen atom, an alkyl group, a cycloalkyl group or an aryl group; Z represents a linking group for forming a ring together with AR; and A represents an atom or group selected from the group consisting of a hydrogen atom, an alkyl group, a halogen atom, a cyano group and an alkyloxycarbonyl group, and a pattern forming method using the resist composition.
    Type: Application
    Filed: March 14, 2007
    Publication date: September 20, 2007
    Applicant: FUJIFILM Corporation
    Inventors: Kazuyoshi Mizutani, Kaoru Iwato, Kunihiko Kodama, Masaomi Makino