Patents by Inventor Masaru Kanbe

Masaru Kanbe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4421846
    Abstract: A photographic element containing a nondiffusible metal complex capable of releasing a diffusible photographically useful group. The complex contains at least one poly-dentate ligand which contains the photographically useful group. The complex may be activated when reduced under alkaline conditions to release the photographically useful group.
    Type: Grant
    Filed: December 23, 1981
    Date of Patent: December 20, 1983
    Assignee: Konishiroku Photo Industry Co., Ltd.
    Inventors: Satoru Ikeuchi, Masaru Kanbe, Jiro Takahashi, Ryuichiro Kobayashi, Shunji Suginaka, Noboru Mizukura
  • Patent number: 4256831
    Abstract: A light-sensitive photographic element comprising a support and at least one light-sensitive silver halide emulsion layer coated thereon having associated therewith a magenta image dye-providing compound which releases a magenta dye or a precursor thereof corresponding to the imagewise exposure of said emulsion layer, said magenta dye-providing compound being a compound represented by formula [I]: ##STR1## wherein Car represents a carrier moiety which can be oxidized under alkaline conditions to release a diffusible dye or a precursor thereof from said compound;R.sup.1 and R.sup.2, which may be the same or different, independently represent a hydrogen atom or an alkyl group having 1 to 3 carbon atoms (provided that the total sum of carbon atoms in R.sup.1 and R.sup.2 does not exceed 5), or R.sup.1 and R.sup.
    Type: Grant
    Filed: August 22, 1979
    Date of Patent: March 17, 1981
    Assignee: Konishiroku Photo Industry Co., Ltd.
    Inventors: Masaru Kanbe, Kazumasa Watanabe, Morito Uemura, Jiro Takahashi, Ryuichiro Kobayashi, Tatsuhiko Kobayashi
  • Patent number: 4247629
    Abstract: A light-sensitive photographic element comprising a support and at least one light-sensitive silver halide emulsion layer coated thereon having associated therewith a cyan image dye-providing compound which releases a cyan dye or a precursor thereof corresponding to the imagewise exposure of said emulsion layer, said cyan image dye-providing compound being a compound represented by formula [I] or [II]: ##STR1## wherein Car, R.sup.1, R.sup.2, X, Y.sup.1, Y.sup.2, m, J.sup.1 and J.sup.2 are defined in the specification and claims.
    Type: Grant
    Filed: August 22, 1979
    Date of Patent: January 27, 1981
    Assignee: Konishiroku Photo Industry Co., Ltd.
    Inventors: Masaru Kanbe, Kazumasa Watanabe, Morito Uemura, Jiro Takahashi, Ryuichiro Kobayashi, Tatsuhiko Kobayashi
  • Patent number: 4229523
    Abstract: A method of undercoating a polyester film of a light sensitive photographic material is disclosed in which one side of the film is pretreated such that the contact angle with water is below 58.degree.. Additionally, a layer of an aqueous dispersion containing no organic solvent is applied to said side of said film, said dispersion containing a copolymer containing up to 60% by weight of glycidyl methacrylate and 25-60% by weight of ethyl acrylate.
    Type: Grant
    Filed: March 30, 1979
    Date of Patent: October 21, 1980
    Assignee: Konishiroku Photo Industry Co., Ltd.
    Inventors: Hideyasu Ohta, Jun Shirasaki, Masaru Kanbe, Naoto Abe, Takahiro Uozumi, Masayoshi Mayama
  • Patent number: 4225708
    Abstract: 2-Sulfamoyl-5-sulfamido-1-naphthols represented by the formula: ##STR1## wherein R.sup.1, R.sup.2, R.sup.3 and R.sup.4 can be the same or different and each represent a hydrogen atom, a straight-chain alkyl group, a branched alkyl group or a cycloalkyl group; or R.sup.1 and R.sup.
    Type: Grant
    Filed: August 22, 1979
    Date of Patent: September 30, 1980
    Assignee: Konishiroku Photo Industry Co., Ltd.
    Inventors: Masaru Kanbe, Kazumasa Watanabe, Morito Uemura, Jiro Takahashi, Ryuichiro Kobayashi, Tatsuhiko Kobayashi
  • Patent number: 4197129
    Abstract: A hydrophobic plastic support which has a layer thereon comprising a copolymer, said copolymer consisting essentially of an acrylic monomer selected from alkyl esters of acrylic acid and alkyl esters of methacrylic acid, and an ethylenically unsaturated monomer having a group of the formula--COXROHwherein X stands for an oxygen atom or ##STR1## in which R' stands for a hydrogen atom, a substituted or unsubstituted alkyl group or a hydroxy group, and R stands for a substituted or unsubstituted alkylene group.
    Type: Grant
    Filed: June 17, 1976
    Date of Patent: April 8, 1980
    Assignee: Konishiroku Photo Industry Co., Ltd.
    Inventors: Yasuji Muroi, Hideyasu Ohta, Masaru Kanbe, Jun Shirasaki
  • Patent number: 4192683
    Abstract: A photographic light-sensitive material comprising a layer which contains a compound represented by the following Formula I ##STR1## wherein R.sub.1 is an alkyl group having 1 to 18 carbon atoms, R.sub.2 is a hydrogen atom or an alkyl group having 1 to 18 carbon atoms with a proviso that when R.sub.2 is a hydrogen atom, R.sub.1 is an alkyl group having 1 to 7 carbon atoms, M is a cation and n is a number of 1 to 50.
    Type: Grant
    Filed: October 18, 1977
    Date of Patent: March 11, 1980
    Assignee: Konishiroku Photo Industry Co., Ltd.
    Inventors: Eiichi Sakamoto, Masao Ishihara, Kazuo Nakazato, Hiroshi Yamada, Sadatugu Terada, Kenichi Kitahara, Naoto Abe, Mamoru Komiya, Masaru Kanbe
  • Patent number: 4128426
    Abstract: The present application is directed to a process for subbing a photographic hydrophobic film which involves subjecting at least one surface of the film to a hydrophylizing pretreatment step, coating the pretreated surface with an aqueous dispersion containing a polymer which has particular comonomers in a combined amount of more than 76%, then coating the coated surface with a liquid containing colloidal silica.
    Type: Grant
    Filed: February 25, 1977
    Date of Patent: December 5, 1978
    Assignee: Konishiroku Photo Industry Co., Ltd.
    Inventors: Hideyasu Ohta, Takahiro Uozumi, Masaru Kanbe, Naoto Abe, Jun Shirasaki, Masayoshi Mayama
  • Patent number: 4113918
    Abstract: This invention provides an undercoat-applied plastic film comprising a plastic film substrate and an undercoat layer on at least one surface of the plastic film substrate, said undercoat layer being formed by treating the film surface with a soluble high molecule compound expressed by the following general formula: ##STR1## AND A SOLVENT OR SWELLING AGENT FOR SAID PLASTIC FILM SUBSTRATE. This undercoat-applied aplastic film has an excellent antistatic property on the treated surface and exhibits a good adherence to a material to be applied thereto.
    Type: Grant
    Filed: April 15, 1976
    Date of Patent: September 12, 1978
    Assignee: Konishiroku Photo Industry Co., Ltd.
    Inventors: Motoo Kogure, Mamoru Komiya, Masaharu Oishi, Masaru Kanbe
  • Patent number: 4010036
    Abstract: An improved silver halide photosensitive material of the lith-type is disclosed which is suitable for an infectious development in order to obtain high contrast images with high sensitivity. A method for developing the material is also disclosed. The material comprises silver halide grains containing at least 50 mole per cent of silver chloride, less than 40 mole per cent of silver bromide and less than 5 mole percent of silver iodide based on total silver halide, the average size of the grains being 0.05 to 0.5 microns in diameter. The material further comprises a compound represented by the following general formula I or II ##STR1## wherein R is alkyl, aryl, aralkyl or acyl; R' is hydrogen or --OR; and R" is hydrogen or acyl.
    Type: Grant
    Filed: May 22, 1975
    Date of Patent: March 1, 1977
    Assignee: Konishiroku Photo Industry Co., Ltd.
    Inventors: Tsuneo Suga, Ken-ichi Kishi, Shinobu Korematsu, Masaru Kanbe, Toshiaki Takahashi
  • Patent number: 4010034
    Abstract: An improved method for adjusting bromide ion concentration in a photographic processing solution is disclosed in which the processing solution is contacted with particles of an insoluble bismuth compound.
    Type: Grant
    Filed: July 8, 1975
    Date of Patent: March 1, 1977
    Assignee: Konishiroku Photo Industry Co., Ltd.
    Inventors: Tsuneo Suga, Masaru Kanbe, Shinobu Korematsu, Toshiaki Takahashi, Ken-ichi Kishi