Patents by Inventor Masaru Konya

Masaru Konya has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8337956
    Abstract: A wafer has a rare earth oxide layer disposed, typically sprayed, on a substrate. It is useful as a dummy wafer in a plasma etching or deposition system.
    Type: Grant
    Filed: December 20, 2011
    Date of Patent: December 25, 2012
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Toshihiko Tsukatani, Takao Maeda, Junichi Nakayama, Hirofumi Kawazoe, Masaru Konya, Noriaki Hamaya, Hajime Nakano
  • Publication number: 20120088034
    Abstract: A wafer has a rare earth oxide layer disposed, typically sprayed, on a substrate. It is useful as a dummy wafer in a plasma etching or deposition system.
    Type: Application
    Filed: December 20, 2011
    Publication date: April 12, 2012
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Toshihiko Tsukatani, Takao Maeda, Junichi Nakayama, Hirofumi Kawazoe, Masaru Konya, Noriaki Hamaya, Hajime Nakano
  • Patent number: 8138060
    Abstract: A wafer has a rare earth oxide layer disposed, typically sprayed, on a substrate. It is useful as a dummy wafer in a plasma etching or deposition system.
    Type: Grant
    Filed: October 27, 2008
    Date of Patent: March 20, 2012
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Toshihiko Tsukatani, Takao Maeda, Junichi Nakayama, Hirofumi Kawazoe, Masaru Konya, Noriaki Hamaya, Hajime Nakano
  • Patent number: 7816013
    Abstract: A wafer has a rare earth fluoride coating disposed, typically sprayed on a substrate as an outermost layer, the rare earth fluoride being selected from lanthanoid fluorides, yttrium fluoride, and scandium fluoride. It is useful as a dummy wafer in a plasma etching or deposition system.
    Type: Grant
    Filed: December 2, 2008
    Date of Patent: October 19, 2010
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Toshihiko Tsukatani, Masaru Konya, Noriaki Hamaya, Hajime Nakano, Takao Maeda
  • Publication number: 20090142605
    Abstract: A wafer has a rare earth fluoride coating disposed, typically sprayed on a substrate as an outermost layer, the rare earth fluoride being selected from lanthanoid fluorides, yttrium fluoride, and scandium fluoride. It is useful as a dummy wafer in a plasma etching or deposition system.
    Type: Application
    Filed: December 2, 2008
    Publication date: June 4, 2009
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Toshihiko TSUKATANI, Masaru KONYA, Noriaki HAMAYA, Hajime NAKANO, Takao MAEDA
  • Publication number: 20090108414
    Abstract: A wafer has a rare earth oxide layer disposed, typically sprayed, on a substrate. It is useful as a dummy wafer in a plasma etching or deposition system.
    Type: Application
    Filed: October 27, 2008
    Publication date: April 30, 2009
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Toshihiko TSUKATANI, Takao MAEDA, Junichi NAKAYAMA, Hirofumi KAWAZOE, Masaru KONYA, Noriaki HAMAYA, Hajime NAKANO
  • Patent number: 7507481
    Abstract: A coated member comprising a substrate of Mo, Ta, W, Zr or carbon and a coating of rare earth-containing oxide including a surface layer having a Vickers hardness of at least 50; or a coated member comprising a substrate having a coefficient of linear expansion of at least 4×10?6 (1/K) and a coating of rare earth-containing oxide thereon is heat resistant and useful as a jig for use in the sintering of powder metallurgical metal, cermet and ceramic materials.
    Type: Grant
    Filed: November 19, 2003
    Date of Patent: March 24, 2009
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Noriaki Hamaya, Masaru Konya, Noboru Yamamoto
  • Publication number: 20040110016
    Abstract: A coated member comprising a substrate of Mo, Ta, W, Zr or carbon and a coating of rare earth-containing oxide including a surface layer having a Vickers hardness of at least 50; or a coated member comprising a substrate having a coefficient of linear expansion of at least 4×10−6 (1/K) and a coating of rare earth-containing oxide thereon is heat resistant and useful as a jig for use in the sintering of powder metallurgical metal, cermet and ceramic materials.
    Type: Application
    Filed: November 19, 2003
    Publication date: June 10, 2004
    Inventors: Noriaki Hamaya, Masaru Konya, Noboru Yamamoto