Abstract: A plasma processing apparatus includes a processing chamber in which plasma processing is performed on a wafer, a DP that reduces a pressure in the processing chamber via an evacuating pipe connected to the processing chamber, a TMP that performs evacuation such that a degree of vacuum of the processing chamber becomes a high degree of vacuum, and a stage on which the wafer is placed. Further, the plasma processing apparatus includes a He evacuating pipe that is a flow channel of a heat-transfer gas that transfers heat of the stage subjected to temperature adjustment to the wafer, a first gas supplying mechanism that supplies a gas to a portion of the evacuating pipe which is exposed to atmosphere, during venting a processing chamber to atmosphere, and a control device that controls the first gas supplying mechanism. The control device is provided to communicate with the evacuating pipe.

Abstract: A plasma processing apparatus includes a processing chamber in which plasma processing is performed on a wafer, a DP that reduces a pressure in the processing chamber via an evacuating pipe connected to the processing chamber, a TMP that performs evacuation such that a degree of vacuum of the processing chamber becomes a high degree of vacuum, and a stage on which the wafer is placed. Further, the plasma processing apparatus includes a He evacuating pipe that is a flow channel of a heat-transfer gas that transfers heat of the stage subjected to temperature adjustment to the wafer, a first gas supplying mechanism that supplies a gas to a portion of the evacuating pipe which is exposed to atmosphere, during venting a processing chamber to atmosphere, and a control device that controls the first gas supplying mechanism. The control device is provided to communicate with the evacuating pipe.

Abstract: Provided is a measurement device including: an irradiation optical system which emits a primary charged quantum beam to a sample for scanning; a detector which detects secondary charged particles generated from the sample; and a signal processing unit which processes an output signal from the secondary charged particle detector which has detected the secondary charged particles, in which the signal processing unit includes a measurement unit which measures widths of a first pattern group calibrated with a well-known first dimension and a second pattern group calibrated with a well-known second dimension, and an operation unit which defines a relationship between the well-known dimensions of the first and second pattern groups and length measurement values of the first and second pattern groups as a function.

Abstract: A plasma processing apparatus includes a processing chamber in which plasma processing is performed on a wafer, a DP that reduces a pressure in the processing chamber via an evacuating pipe connected to the processing chamber, a TMP that performs evacuation such that a degree of vacuum of the processing chamber becomes a high degree of vacuum, and a stage on which the wafer is placed. Further, the plasma processing apparatus includes a He evacuating pipe that is a flow channel of a heat-transfer gas that transfers heat of the stage subjected to temperature adjustment to the wafer, a first gas supplying mechanism that supplies a gas to a portion of the evacuating pipe which is exposed to atmosphere, during venting a processing chamber to atmosphere, and a control device that controls the first gas supplying mechanism. The control device is provided to communicate with the evacuating pipe.

Abstract: Provided is a measurement device including: an irradiation optical system which emits a primary charged quantum beam to a sample for scanning; a detector which detects secondary charged particles generated from the sample; and a signal processing unit which processes an output signal from the secondary charged particle detector which has detected the secondary charged particles, in which the signal processing unit includes a measurement unit which measures widths of a first pattern group calibrated with a well-known first dimension and a second pattern group calibrated with a well-known second dimension, and an operation unit which defines a relationship between the well-known dimensions of the first and second pattern groups and length measurement values of the first and second pattern groups as a function.

Abstract: A rubber stopper for a vial comprising a body member 1 and a sheet of polyethylene 3 having an average molecular weight of 1,300,000 to 8,000,000, a surface being contacted with an inner surface of a mouth and a liquid medicine, or a top surface 1b of which is covered. The molecular chains of polyethylene are partially ramified by heat to be branched and partially crosslinked with a rubber of the body. Therefore, adhesion of them is high and a smoothness of the surface of the sheet portion is improved.

Abstract: A method for producing a rubber stopper for a vial, a leg portion side of which is covered with a synthetic resin film. The producing method comprises (i) a primary forming step of piling a synthetic resin film 1 resistant to medicines or medical chemicals onto an unvulcanized rubber sheet 2, and forming by pressing and heating them between the molds (A, B), (ii) a secondary forming step of covering the primary formed article from the leg side of the primary formed article with a half-vulcanized rubber sheet having a hole 10 of which diameter is the same as that of a root portion of the leg portion 4 of the primary formed article and forming by pressing and heating it by means of a pair of molds, and (iii) a step of cutting and removing a flash around the resulting secondary formed article. A rubber stopper and a synthetic resin sheet being laminated can be formed at one time.

Abstract: Method for preparation of milk shake beverage contained in can, bottle, paper carton or the like with a sufficient head space so that when shaking the container desirable volume of foam is obtained. Guar gum, kappa carrageenan and xanthan gum, which are well known as stabilizer for such beverage, are added to liquid mixture in the respectively specified amount ratio so as to make it possible to sterilize at a temperature of 135.degree. to 150.degree. C. for 2 to 5 seconds for long shelf life without causing undesirable coagulation and decreasing volume of foam.