Abstract: A mask disposing system is configured in the following manner. A server receives a request to dispose of a mask to be discontinued from a client terminal through a network, provides instructions to take the mask out to a storage cabinet, provides instructions to dispose of the mask to a disposing unit, and provides a disposal verifying information from a disposal verifying unit to the client terminal. The storage cabinet stores the mask. The disposing unit disposes of the mask by crushing the mask pattern on the mask so that the mask pattern becomes unreadable. The disposal verifying unit verifies that the mask has been crushed and disposed of.

Abstract: FIB equipment, which irradiates a sample placed on a stage with a focused ion beam (FIB) to perform etching or deposition at the irradiation position, includes an alignment mark formation unit to form an alignment mark by irradiating a periphery of a processing position with the FIB; and a processing position detection unit to superpose an optical microscope image of the area of the processing position at which the alignment mark is formed, and a scanning ion microscope image (SIM image) acquired by FIB irradiation, based on the alignment mark image, and to detect the processing position on the superposed images.

Abstract: FIB equipment, which irradiates a sample placed on a stage with a focused ion beam (FIB) to perform etching or pattern formation at the irradiation position, comprises an alignment mark formation unit to form an alignment mark by irradiating a periphery of a processing position with the FIB; and a processing position detection unit to superpose an optical microscope image of the area of the processing position at which the alignment mark is formed, and a scanning ion microscope image (SIM image) acquired by FIB irradiation, based on the alignment mark image, and to detect the processing position according to the superposed images.