Abstract: Disclosed are a carbonaceous material dispersion, which is a carbonaceous material dispersion with carbonaceous materials and dispersing agents dispersed in a dispersion medium for an all-solid lithium-ion rechargeable battery. The dispersion medium contains at least an ester solvent, and the dispersing agent contains at least polyvinyl butyral; in the dispersion the carbonaceous material accounts for 10 to 25% of the total mass of the dispersion, and the dispersing agent is 5 to 40% of the carbonaceous material by mass; and the carbonaceous material dispersion has a viscosity of not more than 500 mPa·s at 25° C.

Abstract: A method for efficiently removing non-magnetic foreign material, from a carbonaceous material dispersion in which carbonaceous material particles are dispersed in a dispersing medium, includes applying the dispersion to a primary filter a specified number of times in circulation, the primary filter including at least one filter device; and applying the dispersion treated with the primary filter to a secondary filter a single time, the secondary filter including at least two filter devices arranged in series. Each respective filter device to be used satisfying following conditions: (a) a variation of cumulative undersize distribution Q [%] with respect to a reference particle diameter and a variation of non-volatile content, before and after passing the carbonaceous material dispersion, being not more than 0.1%, respectively; and (b) a removal rate of particles with a threshold particle diameter being not less than 20%.

Abstract: The disclosed is a method for producing a dispersion of carbonaceous material in a nonaqueous solvent comprising a nitrogen-containing heterocyclic amide compound with a solvent purity of 99.9% or higher, which comprises: confirming an amine-controlled concentration, in which the concentration of amine components in the nonaqueous solvent is confirmed to be less than 3×10?6 in mass fraction; confirming a moisture-controlled concentration, in which the concentration of the moisture concentration in the nonaqueous solvent is confirmed to be less than 5×10?4 in mass fraction; and dispersing a carbonaceous material added to the nonaqueous solvent that satisfies the conditions in the amine-controlled concentration confirmation and the moisture-controlled concentration confirmation so that the carbonaceous material concentration is 15 to 30% by mass based on the total mass of the dispersion, by stirring and mixing.

Abstract: The disclosed is a method for producing a carbon material dispersion which removes efficiently and reliably metallic components from carbon materials, and that provides a carbon material dispersion of a high product quality and stable electrical properties. The method comprises a first magnetic separation step in which the powdered and/or granulated carbon material C is applied to the surface of a rotating magnetic roll 130 to remove the metallic component M from the carbon material in the dry state of the powdered and granulated carbon material C; and a second magnetic separation step in which a magnet element 310 is placed in a carbon material dispersion D, in which the carbon material from which the metallic component has been removed in the first magnetic separation step is dispersed in a dispersing medium, in advance of the second magnetic separation step.

Abstract: A polishing composition for semiconductor wafer polishing comprising, colloidal silica prepared from an active silicic acid aqueous solution obtained by removal of alkali from alkali silicate and at least one nitrogen containing basic compound selected from a group consisting of ethylenediamine, diethylenediamine, imidazole, methylimidazole, piperidine, morpholine, arginine, and hydrazine, wherein pH of the colloidal silica is of 8.5 to 11.0 at 25° C. by containing quaternary ammonium hydroxide.

Abstract: Colloidal silica forming nonspherical particles cluster, whose long axis/short axis ratio of silica particles is of 1.2 to 20, and average long axis/short axis ratio of 3 to 15. This colloidal silica can be produced by forming particles by adding basic nitrogen compounds to an active silicic acid aqueous solution, the solution which produced by hydrolysis of tetraalkoxysilane, while heating, then growing particles by using a build up method.

Abstract: A colloidal silica comprising, silica particles inside of which or on the surface of which a nitrogen containing alkaline compound is fixed, wherein said silica particles are prepared by forming and growing colloid particles using the nitrogen containing alkaline compound. Said colloidal silica can be prepared by preparing active silicic acid aqueous solution contacting silicate alkali aqueous solution with cation exchange resin, adding the nitrogen containing alkaline compound and heating, and then growing up particles by build-up method.

Abstract: The polishing compound for semiconductor wafer of the present invention contains colloidal silica composed of silica particles to which tetraethylammonium is fixed, and concentration of silica particles dispersed in water is between 0.5 to 50 weight %. Concentration of tetraethylammonium contained in silica particles to which tetraethylammonium is fixed is desirable to be in the range from 5×10?4 to 2.5×10?2 as indicated by molar ratio of tetraethylammonium/silica.

Abstract: A composition for polishing a semiconductor wafer contains fumed silica particles that are produced by wet grinding using a grinding medium and that have characteristics (A) to (C): (A) a specific surface area in the range of 50 to 200 m2/g measured by a BET method; (B) an average particle diameter in the range of 10 to 50 nm measured by a laser light-scattering method; and (C) an average ratio A/B of the major axis A to the minor axis B of the fumed silica particles in the range of 1.2 to 2.0 measured by TEM observation, wherein the concentration of silica particles containing the fumed silica particles is in the range of 0.5 to 50 weight percent relative to the total weight of an aqueous dispersion.

Abstract: A sheet shaped key top wherein molded resin key tops are arranged on a sheet, wherein the resin key top is fixed so as to cover the core upper part passing through the sheet, allowing to vary easily the key top design, and permitting a high manufacturing yielding, and a manufacturing method thereof.

Abstract: A sheet shaped key top wherein molded resin key tops are arranged on a sheet, wherein the resin key top is fixed so as to cover the core upper part passing through the sheet, allowing to vary easily the key top design, and permitting a high manufacturing yielding, and a manufacturing method thereof.

Abstract: A high-yield, high-quality sheet-like key top wherein a protective film is laminated to the backside of a display layer during the forming of a key top consisting of thermoplastic resin to preclude the pressure and the heat of the molten resin from directly affecting the display layer, thereby preventing the display portion from being distorted and the display layer from being cracked.

Abstract: To make spherical shape of the terminal end of extruding part of a push-button switch to press a curved contact portion composed of a metal belleville spring and a resin film dome. In addition, the gate injecting mouth 4 for thermoplastic material 3 is opened in the side surface of the extruding part 2 or in the side projection made in a mold to inject the resin material in order to make molding of spherical shape of the terminal end of extruding part 2 of a push-button switch possible. By this structure, the present invention can provide a sheet-like key top having improved clicking touch and preventing break of a contact portion by residual stress.

Abstract: A manufacturing method for key tops includes the steps of molding a light-shielding film on a to-be-peeled shield by a plane printing, effecting colored printing to provide a readout part at a predetermined position on it in the state of a plane sheet prior to the 3-D molding, then sucking a printed light-shield film sheet on a metal mold with an evacuation system, adsorbing said light-shield film sheet onto the wall face in the metal mold. A push mold may be used with a suction system so as to be positioned in the female mold. Materials such as silicone are put into this metal mold for one-piece molding. A laser processing is effected on the surface of a key top prepared in a 3-D shape to form a desired pattern.