Patents by Inventor Masaru Shida
Masaru Shida has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10208163Abstract: A method of producing a polyimide resin that produces a polyimide resin having excellent heat resistance and mechanical properties, and having a low dielectric constant even when heat-treated at a lower temperature. The method includes heating at 120° C. to 350° C. a polyamic acid resulting from the reaction of a tetracarboxylic acid dianhydride component and a diamine component in a solvent including at least a compound represented by the general formula (1), in which R1 represents a hydrogen atom or a hydroxyl group, R2 and R3 independently represent a hydrogen atom or a C1 to C3 alkyl group, and R4 and R5 independently represent a C1 to C3 alkyl group.Type: GrantFiled: February 18, 2015Date of Patent: February 19, 2019Assignee: TOKYO OHKA KOGYO CO., LTD.Inventors: Masaru Shida, Teruhiro Uematsu, Kunihiro Noda
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Patent number: 9890250Abstract: A method for producing a polybenzoxazole resin, in which even when a polybenzoxazole precursor is heat treated at a low temperature, a polybenzoxazole resin that is excellent in mechanical properties, such as tensile elongation, and in chemical resistance, is suppressed in terms of coloration, and is high in transparency can be produced. A polybenzoxazole resin is formed by heating a polybenzoxazole precursor which is obtained by allowing an aromatic diaminediol and a diformyl compound or a dicarboxylic acid dihalide, to react with each other in a solvent containing an amide compound or a urea compound each having a specified structure, at 120° C. to 350° C.Type: GrantFiled: May 19, 2015Date of Patent: February 13, 2018Assignee: TOKYO OHKA KOGYO CO., LTD.Inventors: Kunihiro Noda, Hiroki Chisaka, Dai Shiota, Masaru Shida
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Publication number: 20150337084Abstract: A method for producing a polybenzoxazole resin, in which even when a polybenzoxazole precursor is heat treated at a low temperature, a polybenzoxazole resin that is excellent in mechanical properties, such as tensile elongation, and in chemical resistance, is suppressed in terms of coloration, and is high in transparency can be produced. A polybenzoxazole resin is formed by heating a polybenzoxazole precursor which is obtained by allowing an aromatic diaminediol and a diformyl compound or a dicarboxylic acid dihalide, to react with each other in a solvent containing an amide compound or a urea compound each having a specified structure, at 120° C. to 350° C.Type: ApplicationFiled: May 19, 2015Publication date: November 26, 2015Inventors: Kunihiro Noda, Hiroki Chisaka, Dai Shiota, Masaru Shida
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Publication number: 20150232619Abstract: A method of producing a polyimide resin that produces a polyimide resin having excellent heat resistance and mechanical properties, and having a low dielectric constant even when heat-treated at a lower temperature. The method includes heating at 120° C. to 350° C. a polyamic acid resulting from the reaction of a tetracarboxylic acid dianhydride component and a diamine component in a solvent including at least a compound represented by the general formula (1), in which R1 represents a hydrogen atom or a hydroxyl group, R2 and R3 independently represent a hydrogen atom or a C1 to C3 alkyl group, and R4 and R5 independently represent a C1 to C3 alkyl group.Type: ApplicationFiled: February 18, 2015Publication date: August 20, 2015Inventors: Masaru Shida, Teruhiro Uematsu, Kunihiro Noda
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Patent number: 8744260Abstract: An aperture control device includes: an aperture first driving member that controls an aperture of a diaphragm through which light flux passes; an aperture second driving member that drives the aperture first driving member; a motor that drives the aperture second driving member; a detection device that detects start of movement of the aperture first driving member caused by the aperture second driving member driven by the motor; and a motor control device that controls an aperture value of the diaphragm by controlling a rotational amount of the motor after the detection device detects the start of movement of the aperture first driving member.Type: GrantFiled: March 26, 2013Date of Patent: June 3, 2014Assignee: Nikon CorporationInventor: Masaru Shida
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Publication number: 20120195582Abstract: An aperture control device includes: an aperture first driving member that controls an aperture of a diaphragm through which light flux passes; an aperture second driving member that drives the aperture first driving member; a motor that drives the aperture second driving member; a detection device that detects start of movement of the aperture first driving member caused by the aperture second driving member driven by the motor; and a motor control device that controls an aperture value of the diaphragm by controlling a rotational amount of the motor after the detection device detects the start of movement of the aperture first driving member.Type: ApplicationFiled: April 11, 2012Publication date: August 2, 2012Applicant: NIKON CORPORATIONInventor: Masaru SHIDA
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Publication number: 20110255852Abstract: An aperture control device includes: an aperture first driving member that controls an aperture of a diaphragm through which light flux passes; an aperture second driving member that drives the aperture first driving member; a motor that drives the aperture second driving member; a detection device that detects start of movement of the aperture first driving member caused by the aperture second driving member driven by the motor; and a motor control device that controls an aperture value of the diaphragm by controlling a rotational amount of the motor after the detection device detects the start of movement of the aperture first driving member.Type: ApplicationFiled: June 22, 2011Publication date: October 20, 2011Applicant: NIKON CORPORATIONInventor: Masaru Shida
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Publication number: 20110058803Abstract: An aperture control device includes: an aperture first driving member that controls an aperture of a diaphragm through which light flux passes; an aperture second driving member that drives the aperture first driving member; a motor that drives the aperture second driving member; a detection device that detects start of movement of the aperture first driving member caused by the aperture second driving member driven by the motor; and a motor control device that controls an aperture value of the diaphragm by controlling a rotational amount of the motor after the detection device detects the start of movement of the aperture first driving member.Type: ApplicationFiled: November 1, 2010Publication date: March 10, 2011Applicant: NIKON CORPORATIONInventor: Masaru Shida
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Patent number: 7858275Abstract: A positive photosensitive resin composition with favorable heat resistance and transparency is provided. The photosensitive resin composition contains a resin component (A1) having a structural unit (a1?) obtained by substituting at least a portion of hydrogen atoms of phenolic hydroxyl groups within a structural unit represented by a general formula (a1) shown below with a naphthoquinone-1,2-diazide-5-(and/or -4-) sulfonyl group. (In the above general formula, R0 represents a hydrogen atom or methyl group, R1 represents a single bond or an alkylene group of 1 to 5 carbon atoms, R2 represents an alkyl group of 1 to 5 carbon atoms, a represents an integer from 1 to 5, b represents either 0 or an integer from 1 to 4, and a+b is no greater than 5. If two or more R2 groups exist, then these R2 groups may be either the same or mutually different.Type: GrantFiled: March 10, 2006Date of Patent: December 28, 2010Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Hiroyuki Ohnishi, Yasuaki Sugimoto, Isao Tateno, Masaru Shida
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Publication number: 20090279882Abstract: An aperture control device includes: an aperture first driving member that controls an aperture of a diaphragm through which light flux passes; an aperture second driving member that drives the aperture first driving member; a motor that drives the aperture second driving member; a detection device that detects start of movement of the aperture first driving member caused by the aperture second driving member driven by the motor; and a motor control device that controls an aperture value of the diaphragm by controlling a rotational amount of the motor after the detection device detects the start of movement of the aperture first driving member.Type: ApplicationFiled: August 4, 2008Publication date: November 12, 2009Applicant: NIKON CORPORATIONInventor: Masaru Shida
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Publication number: 20090067076Abstract: A positive photosensitive resin composition with favorable heat resistance and transparency is provided. The photosensitive resin composition contains a resin component (A1) having a structural unit (a1?) obtained by substituting at least a portion of hydrogen atoms of phenolic hydroxyl groups within a structural unit represented by a general formula (a1) shown below with a naphthoquinone-1,2-diazide-5-(and/or -4-) sulfonyl group. (In the above general formula, R0 represents a hydrogen atom or methyl group, R1 represents a single bond or an alkylene group of 1 to 5 carbon atoms, R2 represents an alkyl group of 1 to 5 carbon atoms, a represents an integer from 1 to 5, b represents either 0 or an integer from 1 to 4, and a+b is no greater than 5. If two or more R2 groups exist, then these R2 groups may be either the same or mutually different.Type: ApplicationFiled: March 10, 2006Publication date: March 12, 2009Applicant: TOKYO OHKA KOGYO CO., LTD.Inventors: Hiroyuki Ohnishi, Yasuaki Sugimoto, Isao Tateno, Masaru Shida
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Patent number: 6376153Abstract: The present invention provides a photopolymerizable composition for a color filter containing an addition-polymerizable compound having at least one ethylenically unsaturated double bond, a photopolymerization initiator and the oxide of at least one metal selected from the group consisting of Cu, Fe, Mn, Cr, Co, Ni and Al and being substantially free from any halogen atom; and a process for producing a color filter. The photopolymerizable compositions for a color filter makes it possible to form a color filter having good heat resistance and high electrical insulation resistance and have high storage stability.Type: GrantFiled: March 1, 2001Date of Patent: April 23, 2002Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Kiyoshi Uchikawa, Masaru Shida, Hiroshi Komano
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Publication number: 20010036584Abstract: The present invention provides a photopolymerizable composition for a color filter containing an addition-polymerizable compound having at least one ethylenically unsaturated double bond, a photopolymerization initiator and the oxide of at least one metal selected from the group consisting of Cu, Fe, Mn, Cr, Co, Ni and Al and being substantially free from any halogen atom; and a process for producing a color filter. The photopolymerizable compositions for a color filter makes it possible to form a color filter having good heat resistance and high electrical insulation resistance and have high storage stability.Type: ApplicationFiled: March 1, 2001Publication date: November 1, 2001Inventors: Kiyoshi Uchikawa, Masaru Shida, Hiroshi Komano
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Patent number: 6265116Abstract: The present invention provides a photopolymerizable composition for a color filter containing an addition-polymerizable compound having at least one ethylenically unsaturated double bond, a photopolymerization initiator and the oxide of at least one metal selected from the group consisting of Cu, Fe, Mn, Cr, Co, Ni and Al and being substantially free from any halogen atom; and a process for producing a color filter. The photopolymerizable compositions for a color filter makes it possible to form a color filter having good heat resistance and high electrical insulation resistance and have high storage stability.Type: GrantFiled: September 10, 1998Date of Patent: July 24, 2001Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Kiyoshi Uchikawa, Masaru Shida, Hiroshi Komano
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Patent number: 6036378Abstract: A focal plane shutter unit includes two pairs of blade units consisting of a plurality of light shielding thin plates, a first plate having a first aperture, a second plate having a second aperture, disposed in a face-to-face relationship with the first plate, and having a part of a film passage path in a surface opposite to the surface on which the first plate is disposed, and a blade housing unit for housing the two pairs of blade units disposed in between the first plate and the second plate.Type: GrantFiled: January 23, 1997Date of Patent: March 14, 2000Assignee: Nikon CorporationInventors: Naoyuki Murakami, Masaru Shida
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Patent number: 5908720Abstract: A photosensitive resin composition for forming light shielding films comprising a mixture of; 10 to 60 parts by weight of a high molecular weight polymeric binder; 15 to 50 parts by weight of a photopolymerizable monomer; 0.1 to 30 parts by weight of a photopolymerization initiator; and at least 20 parts by weight of a light shielding pigment comprising carbon black coated with resin for forming black matrices such as CRT displays and liquid crystal panels; a black matrix made from by said photosensitive resin composition; and a method for producing said black matrix comprising the steps of coating said photosensitive resin composition comprising a high molecular weight polymeric binder, a photopolymerizable monomer, a photopolymerization initiator, and a light shielding pigment consisting of carbon black coated with resin on a substrate, selectively radiating an activated beam, and developing the coating using an alkaline aqueous solution to form a pattern.Type: GrantFiled: October 11, 1996Date of Patent: June 1, 1999Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Kiyoshi Uchikawa, Masaru Shida, Junichi Onodera, Hiroshi Komano
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Patent number: 5714286Abstract: A photosensitive resin composition for forming light shielding films is of particular utility in forming a black matrix for use in display elements such as of a CRT display, a liquid crystal panel, a plasma display and the like. The photosensitive resin composition is comprised of a photopolymerizable compound, a photopolymerization initiator, and light shielding materials composed of an oxide of copper and an oxide or oxides of at least one metal selected from iron, manganese, chromium, cobalt and nickel. The black matrix so obtained is conducive to high heat resistance, greatly light shielding and sharp image contrast as well as to excellent electrical insulation resistance. For use in the plasma display in particular, a black matrix is producible by coating of the photosensitive resin composition on a given substrate, followed by exposure of the coat to selective irradiation with active light rays to form a pattern therein and by subsequently burning of the pattern.Type: GrantFiled: December 6, 1996Date of Patent: February 3, 1998Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Kiyoshi Uchikawa, Masaru Shida, Hiroshi Komano
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Patent number: 5361119Abstract: There is disclosed a focus state display device, adapted for use in a camera which has plural focus detection areas in the phototaking image field and effects focusing in one area (focusing area) selected from such plural focus detection areas. The device has a display with two different display modes, and displays the focusing area in one display mode when the lens of the camera is in an infocus state to the object in the focusing area, and in the other display mode when the lens is in an out-of-focus state to the object in the focusing area. In another embodiment, the device has a display with three different display modes, and displays the focusing area by a display mode and other focus detection areas (namely nonfocusing areas) by two other display modes depending on whether the object in respective area is in focus or out of focus.Type: GrantFiled: November 3, 1993Date of Patent: November 1, 1994Assignee: Nikon CorporationInventors: Masaru Shida, Akira Ezawa, Tsutomu Wakabayashi, Kimio Uematsu, Keiji Ohsawa, Shinichi Tsukada, Toshihiro Sato