Abstract: An inspection method of transparent articles wherein presence or absence of optical inhomogeneities within the transparent articles can be accurately inspected is provided. In an inspection method of transparent articles used in photolithography, for inspecting whether or not there are inhomogeneities within transparent articles (4) formed of transparent material wherein optical properties regionally or locally change with regard to exposure light (specifically, interior defects 16), inspection light having a wavelength of 200 nm or shorter is introduced to the transparent article, and light (15) having a longer wavelength than the inspection light which is regionally or locally emitted is sensed on the optical path over which the inspection light is propagated within the transparent article, thereby detecting presence or absence of optical inhomogeneities within the transparent article.

Abstract: There are provided a manufacturing method of a transparent substrate for a mask blank, a mask blank, or an exposure mask adapted to prevent occurrence of a transfer pattern defect or a mask pattern defect, by correcting a recessed defect existing on the surface of the transparent substrate, and a defect correction method of an exposure mask. With respect to an exposure mask having a transparent substrate 1 formed thereon with a mask pattern 2 which becomes a transfer pattern, correction is performed by removing, by the use of a needle-shaped member 4, a peripheral portion of a recessed defect 3 formed on a surface 1a of the substrate, where the mask pattern 2 is not formed, so as to induce a reduction in transmission light quantity which causes a transfer pattern defect, thereby reducing a level difference between the surface of the substrate and the depth of the recessed defect.

Abstract: On inspecting a glass substrate for a mask blank which substrate has surfaces including one end face, the glass substrate is prepared to have the one end face which has a chamfered surface and a remaining surface serving as a side surface. The chamfered surface of the one end face is smaller in width than a chamfered surface of an opposite end face of the glass substrate. A short-wavelength light having a wavelength of 200 nm or less is introduced into the side surface of the one end face. From either the one end face or a different surface of the surfaces of the glass substrate, a long-wavelength light is received which is longer in wavelength than the short-wavelength light and which is generated by an internal defect of the glass substrate in response to the short-wavelength light. The internal defect is detected with reference to the long-wavelength light.

Abstract: A method includes a preparation step of preparing a transparent substrate having a precision-polished main surface, a surface shape information obtaining step of obtaining, as surface shape information, height information at a plurality of measurement points on the main surface of the transparent substrate that contacts a mask stage of an exposure apparatus, a simulation step of obtaining, based on the surface shape information and shape information of the mask stage, height information at the plurality of measurement points by simulating the state where the transparent substrate is set in the exposure apparatus, a flatness calculation step of calculating, based on the height information obtained through the simulation, a flatness of the transparent substrate when it is set in the exposure apparatus, a judging step of judging whether or not the calculated flatness satisfies a specification, and a thin film forming step of forming a thin film as serving as a mask pattern, on the main surface of the transparent

Abstract: A mask blank manufacturing department manufactures a mask blank by forming a thin film to be a mask pattern on a mask blank transparent substrate. When providing the mask blank to a mask manufacturing department, the mask blank manufacturing department provides optical characteristic information (transmittance variation) of the mask blank transparent substrate and optical characteristic information (transmittance variation and/or phase difference variation) of the mask blank to the mask manufacturing department. The optical characteristic information of the mask blank transparent substrate is provided to the mask blank manufacturing department from a materials processing department that manufactures mask blank transparent substrates.

Abstract: In a mask blank substrate to be chucked by a mask stage of an exposure system, the flatness of a rectangular flatness measurement area excluding an area of 2 mm inward from an outer peripheral end surface on a main surface of the mask blank substrate on its side to be chucked by the mask stage is 0.6 ?m or less, and at least three of four corner portions of the flatness measurement area each have a shape that rises toward the outer peripheral side.

Abstract: A laser beam L from a laser 2 is introduced from an introducing surface into a transparent substrate 1 by using mirrors 31 and 32. The laser beam introduced through the transparent substrate 1 repeats a total reflection on the surfaces (main surfaces and end surfaces) of the transparent substrate 1 and enters a state in which the laser beam is almost confined in the substrate 1. When an ununiform portion such as a scratch exists on the surface of the transparent substrate 1, however, total reflecting conditions are not satisfied and the light leaks out of the ununiform portion. The leaked light is formed as an image on a CCD 6 by a lens system 7 and an image process is executed by an image processing apparatus 12. In a detected image, the ununiform portion in which the scratch or the like exists is brightly seen in a linear or a dot form in a black background, so that the ununiform portion such as a very fine scratch can be detected.

Abstract: An object of the invention is to provide a sidelight type backlighting apparatus having high brightness, which is yet reduced in uneven brightness, and to provide a reflector substrate having a surface profile necessary for obtaining such apparatus and a reflector having high brightness and long durability in which the reflector substrate is implemented. A buffer against strain is formed by providing space by protrusions or the like between a light guiding plate of a planar light source apparatus and a reflecting surface of a reflection sheet provided on one main surface of the light guiding plate. Further, a base layer, a metallic layer mainly containing silver, and a light transmitting oxide layer are laminated on the substrate in this order to form a reflection layer.

Abstract: A laser beam L from a laser 2 is introduced from an introducing surface into a transparent substrate 1 by using mirrors 31 and 32. The laser beam introduced through the transparent substrate 1 repeats a total reflection on the surfaces (main surfaces and end surfaces) of the transparent substrate 1 and enters a state in which the laser beam is almost confined in the substrate 1. When an ununiform portion such as a scratch exists on the surface of the transparent substrate 1, however, total reflecting conditions are not satisfied and the light leaks out of the ununiform portion. The leaked light is formed as an image on a CCD 6 by a lens system 7 and an image process is executed by an image processing apparatus 12. In is a detected image, the ununiform portion in which the scratch or the like exists is brightly seen in a linear or a dot form in a black background, so that the ununiform portion such as a very fine scratch can be detected.

Abstract: A laser beam L from a laser 2 is introduced from an introducing surface into a transparent substrate 1 by using mirrors 31 and 32. The laser beam introduced through the transparent substrate 1 repeats a total reflection on the surfaces (main surfaces and end surfaces) of the transparent substrate 1 and enters a state in which the laser beam is almost confined in the substrate 1. When an ununiform portion such as a scratch exists on the surface of the transparent substrate 1, however, total reflecting conditions are not satisfied and the light leaks out of the ununiform portion. The leaked light is formed as an image on a CCD 6 by a lens system 7 and an image process is executed by an image processing apparatus 12. In a detected image, the ununiform portion in which the scratch or the like exists is brightly seen in a linear or a dot form in a black background, so that the ununiform portion such as a very fine scratch can be detected.

Abstract: An object of the invention is to provide a sidelight type backlighting apparatus having high brightness, which is yet reduced in uneven brightness, and to provide a reflector substrate having a surface profile necessary for obtaining such apparatus and a reflector having high brightness and long durability in which the reflector substrate is implemented. A buffer against strain is formed by providing space by protrusions or the like between a light guiding plate of a planar light source apparatus and a reflecting surface of a reflection sheet provided on one main surface of the light guiding plate. Further, a base layer, a metallic layer mainly containing silver, and a light transmitting oxide layer are laminated on the substrate in this order to form a reflection layer.

Abstract: An organic polymer/inorganic fine particle-dispersed aqueous solution having excellent dispersion stability comprising a water-slightly soluble inorganic fine particle (B) having a particle diameter of 500 nm or less obtained by reacting (a) a compound of a second group element in the periodic table with (b) at least one compound selected from organic acids, inorganic acids and salts thereof in the presence of a water-soluble or water-dispersible synthetic high molecular compound (A) having a carboxyl group in a proportion of (A):(B)=10:90 to 99.99:0.01 (weight ratio). The above dispersed aqueous solution can be used as a paper-making chemical, an ink jet recording chemical, medical materials and cosmetic raw materials.

Abstract: In a glass substrate for an electron device which is selected based upon a predetermined reference set value using a method for detecting a defect for the glass substrate in accordance with optical change of an inspecting light beam, the defect for the glass substrate has no dependency for a moving direction of the inspecting light beam.

Abstract: An amphipathic compound represented by any of the following Formulas: (R1 is a linear or branched, saturated hydrocarbon group having 6 to 48 carbon atoms, or a linear or branched, unsaturated hydrocarbon group containing 1 to 12 unsaturated double bond and having 6 to 48 carbon atoms; Y is NH, N—(CH2—CH═CH2), or O; Q is —CH2—C(R2)═CH2 or —R4—O—CO—C(R2)═CH2; and M is alkali metal, an ammonium group, or —(CH2CH2O)mH), a copolymer of the amphipatic compound with a copolymerizable ethylenically unsaturated compound and, a paper making additive containing a water soluble or dispersible high molecular compound as an active ingredient and processes for producing these high molecular compounds.

Abstract: In a glass substrate for an electron device which is selected based upon a predetermined reference set value using a method for detecting a defect for the glass substrate in accordance with optical change of an inspecting light beam, the defect for the glass substrate has no dependency for a moving direction of the inspecting light beam.

Abstract: An amphipathic compound represented by any of the following Formulas: ##STR1## (R.sub.1 is a linear or branched, saturated hydrocarbon group having 6 to 48 carbon atoms, or a linear or branched, unsaturated hydrocarbon group containing 1 to 12 unsaturated double bond and having 6 to 48 carbon atoms; Y is NH, N--(CH.sub.2 --CH.dbd.CH.sub.2), or O; Q is --CH.sub.2 --C(R.sub.2).dbd.CH.sub.2 or --R.sub.4 --O--CO--C(R.sub.2).dbd.CH.sub.2 ; and M is alkali metal, an ammonium group, or --(CH.sub.2 CH.sub.2 O).sub.m H), a copolymer of the amphipatic compound with a copolymerizable ethylenically unsaturated compound and, a paper making additive containing a water soluble or dispersible high molecular compound as an active ingredient and processes for producing these high molecular compounds.

Abstract: Provided are an amphipathic compound represented by any of the following Formulas: ##STR1## (R.sub.1 is a linear or branched, saturated hydrocarbon group having 6 to 48 carbon atoms, or a linear or branched, unsaturated hydrocarbon group containing 1 to 12 unsaturated double bond and having 6 to 48 carbon atoms; Y is NH, N--(CH.sub.2 --CH.dbd.CH.sub.2), or O; Q is --CH.sub.2 --C(R.sub.2).dbd.CH.sub.2 or --R.sub.4 --O--CO--C(R.sub.2).dbd.CH.sub.2 ; and M is alkali metal, an ammonium group, or --(CH.sub.2 CH.sub.2 O).sub.m H), a copolymer of the amphipatic compound with a copolymerizable ethylenically unsaturated compound and, a paper making additive containing a water soluble or dispersible high molecular compound as an active ingredient and processes for producing these high molecular compounds.

Abstract: An apparatus is disclosed for automatically starting the winding of a web or strip of paper material onto a rotating take-up spool. Triangular-shaped guide members projecting from opposing sides of the take-up spool guide the free end of the moving web to a position between oppositely-aligned guide members and the hub of the take-up spool allowing the free end of the web to be gripped by other guide members positioned downstream of the engaged guide members for winding the web onto the hub of the take-up spool. The oppositely-aligned guide members have a web supporting surface which is inclined towards the hub and are spaced slightly less than the width of the web allowing the free end of the web to slide to a position beneath the guide members in which the web is gripped by adjacent guide members as the spool rotates resulting in the web being wound onto the spool.