Abstract: This disclosure makes vehicle passage at a tollbooth on a vehicle road smoother. A plurality of candidate lanes are selected based on whether or not a first vehicle scheduled to pass through a tollbooth is an ETC vehicle, and the type of each lane at the tollbooth. Moreover, a predicted value in correlation with a required time predicted to be required for passing through the tollbooth is calculated for each candidate lane. Further, a recommended lane that is recommended for the first vehicle to travel is determined from the plurality of candidate lanes based on the predicted value for each candidate lane.

Abstract: An alighting point guide system includes an acquisition portion configured to acquire an alighting point guide request from an occupant of a vehicle, and a guide portion configured to provide a guide to an alighting point. When the number of occupants of the vehicle as a transmission source of the alighting point guide request is larger than a reference number set in advance, the guide portion selects, as the alighting point, a point where at least either one value of a statistic value about a door-open time detected previously and a statistic value about the number of times of door opening that is detected previously is equal to or more than a threshold with preference to a point where the at least either one value is less than the threshold.

Abstract: A server apparatus includes a communication interface, a memory configured to store information on an area in which a terminal apparatus mounted in a vehicle can connect to a predetermined communication network, and a controller configured to transmit and receive information to and from the terminal apparatus via the communication interface. Upon receiving, from the terminal apparatus, information on a departure point and a destination of the vehicle and designation information designating a connection to the predetermined communication network, the controller is configured to transmit, to the terminal apparatus, information necessary for the terminal apparatus to output information on a first route from the departure point through the area to the destination.

Abstract: This disclosure makes vehicle passage at a tollbooth on a vehicle road smoother. A plurality of candidate lanes are selected based on whether or not a first vehicle scheduled to pass through a tollbooth is an ETC vehicle, and the type of each lane at the tollbooth. Moreover, a predicted value in correlation with a required time predicted to be required for passing through the tollbooth is calculated for each candidate lane. Further, a recommended lane that is recommended for the first vehicle to travel is determined from the plurality of candidate lanes based on the predicted value for each candidate lane.

Abstract: A server includes a control unit configured to: determine based on probe data acquired by a first vehicle whether the first vehicle is parked or stopped on a road; determine based on probe data acquired by one or more second vehicles located near the first vehicle whether the first vehicle is affecting traffic flow on the road, when the control unit determines that the first vehicle is parked or stopped; and output an alert when the control unit determines that the first vehicle is affecting the traffic flow on the road.

Abstract: A low reflectance film with a second reflectance (50% or lower) lower than a first reflectance is formed between an optical directional coupler and a first-layer wiring with the first reflectance. Thus, even when the first-layer wiring is formed above the optical directional coupler, the influence of the light reflected by the first-layer wiring on the optical signal propagating through the first optical waveguide and the second optical waveguide of the optical directional coupler can be reduced. Accordingly, the first-layer wiring can be arranged above the optical directional coupler, and the restriction on the layout of the first-layer wiring is relaxed.

Abstract: In a semiconductor device connected to a first optical waveguide, a phase modulation unit, and a second optical waveguide in this order and having an optical modulator guiding light in a first direction, the phase modulation unit includes: a semiconductor layer whose length in the first direction is larger than a width in a second direction orthogonal to the first direction and which is made of monocrystalline silicon; a core part serving as an optical waveguide region formed on the semiconductor layer, and extending in the first direction; a pair of slab parts arranged on both sides of the core part in the second direction; a first electrode coupled with one of the slab parts; and a second electrode coupled with the other of the slab parts. The core part has a p type semiconductor region and an n type semiconductor region extending in the first direction, and the second direction coincides with a crystal orientation <100> of the semiconductor layer.

Abstract: Disclosed is an optical semiconductor device which can be improved in light shift precision and restrained from undergoing a loss in light transmission. In this device, an inner side-surface of a first optical coupling portion of an optical coupling region and an inner side-surface of a second optical coupling portion of the region are increased in line edge roughness. This manner makes light coupling ease from a first to second optical waveguide. By contrast, the following are decreased in line edge roughness: an outer side-surface of the first optical coupling portion of the optical coupling region; an outer side-surface of the second optical coupling portion of the region; two opposed side-surfaces of a portion of the first optical waveguide, the portion being any portion other than the region; and two opposed side-surfaces of a portion of the second optical waveguide, the portion being any portion other than the region.

Abstract: A semiconductor device is provided with an insulating layer formed on a base substrate, an optical waveguide composed of a semiconductor layer formed on the insulating layer, and an insulating film formed along an upper surface of the insulating layer and a front surface of the optical waveguide. A peripheral edge portion of a lower surface of the optical waveguide is separated from the insulating layer, and the insulating film is buried between the peripheral edge portion and the insulating layer.

Abstract: In a semiconductor device connected to a first optical waveguide, a phase modulation unit, and a second optical waveguide in this order and having an optical modulator guiding light in a first direction, the phase modulation unit includes: a semiconductor layer whose length in the first direction is larger than a width in a second direction orthogonal to the first direction and which is made of monocrystalline silicon; a core part serving as an optical waveguide region formed on the semiconductor layer, and extending in the first direction; a pair of slab parts arranged on both sides of the core part in the second direction; a first electrode coupled with one of the slab parts; and a second electrode coupled with the other of the slab parts. The core part has a p type semiconductor region and an n type semiconductor region extending in the first direction, and the second direction coincides with a crystal orientation <100> of the semiconductor layer.

Abstract: A low reflectance film with a second reflectance (50% or lower) lower than a first reflectance is formed between an optical directional coupler and a first-layer wiring with the first reflectance. Thus, even when the first-layer wiring is formed above the optical directional coupler, the influence of the light reflected by the first-layer wiring on the optical signal propagating through the first optical waveguide and the second optical waveguide of the optical directional coupler can be reduced. Accordingly, the first-layer wiring can be arranged above the optical directional coupler, and the restriction on the layout of the first-layer wiring is relaxed.

Abstract: A low reflectance film with a second reflectance (50% or lower) lower than a first reflectance is formed between an optical directional coupler and a first-layer wiring with the first reflectance. Thus, even when the first-layer wiring is formed above the optical directional coupler, the influence of the light reflected by the first-layer wiring on the optical signal propagating through the first optical waveguide and the second optical waveguide of the optical directional coupler can be reduced. Accordingly, the first-layer wiring can be arranged above the optical directional coupler, and the restriction on the layout of the first-layer wiring is relaxed.

Abstract: A semiconductor device is provided with an insulating layer formed on a base substrate, an optical waveguide composed of a semiconductor layer formed on the insulating layer, and an insulating film formed along an upper surface of the insulating layer and a front surface of the optical waveguide. A peripheral edge portion of a lower surface of the optical waveguide is separated from the insulating layer, and the insulating film is buried between the peripheral edge portion and the insulating layer.

Abstract: A technique is provided which can prevent the quality of an electrical signal from degrading in an optical semiconductor device. In a cross-section perpendicular to an extending direction of an electrical signal transmission line, the electrical signal transmission line is surrounded by a shielding portion including a first noise cut wiring, second plugs, a first layer wiring, first plugs, a shielding semiconductor layer, first plugs, a first layer wiring, second plugs, and a second noise cut wiring, and the shielding portion is fixed to a reference potential. Thereby, the shielding portion blocks noise due to effects of a magnetic field or an electric field from the semiconductor substrate, which affects the electrical signal transmission line.

Abstract: A low reflectance film with a second reflectance (50% or lower) lower than a first reflectance is formed between an optical directional coupler and a first-layer wiring with the first reflectance. Thus, even when the first-layer wiring is formed above the optical directional coupler, the influence of the light reflected by the first-layer wiring on the optical signal propagating through the first optical waveguide and the second optical waveguide of the optical directional coupler can be reduced. Accordingly, the first-layer wiring can be arranged above the optical directional coupler, and the restriction on the layout of the first-layer wiring is relaxed.

Abstract: Disclosed is an optical semiconductor device which can be improved in light shift precision and restrained from undergoing a loss in light transmission. In this device, an inner side-surface of a first optical coupling portion of an optical coupling region and an inner side-surface of a second optical coupling portion of the region are increased in line edge roughness. This manner makes light coupling ease from a first to second optical waveguide. By contrast, the following are decreased in line edge roughness: an outer side-surface of the first optical coupling portion of the optical coupling region; an outer side-surface of the second optical coupling portion of the region; two opposed side-surfaces of a portion of the first optical waveguide, the portion being any portion other than the region; and two opposed side-surfaces of a portion of the second optical waveguide, the portion being any portion other than the region.

Abstract: A technique is provided which can prevent the quality of an electrical signal from degrading in an optical semiconductor device. In a cross-section perpendicular to an extending direction of an electrical signal transmission line, the electrical signal transmission line is surrounded by a shielding portion including a first noise cut wiring, second plugs, a first layer wiring, first plugs, a shielding semiconductor layer, first plugs, a first layer wiring, second plugs, and a second noise cut wiring, and the shielding portion is fixed to a reference potential. Thereby, the shielding portion blocks noise due to effects of a magnetic field or an electric field from the semiconductor substrate, which affects the electrical signal transmission line.

Abstract: A first conductive layer of metal silicide, a silicon layer, an insulating layer, and a second conductive layer of metal or metal silicide are deposited in the order named on a surface of a a semiconductor substrate. Thereafter, the second conductive layer and the insulating layer are patterned to expose the silicon layer. The exposed silicon layer and the first conductive layer are patterned, thereby forming an MIM capacitance circuit.

Abstract: The present invention aims to suppress certainly the single-crystallizing in polycrystalline silicon that is to compose an emitter electrode, as well as to prevent the interface oxide film from remaining, when a heat treatment is conducted to diffuse dopants, and thereby it is also aimed to regulate the emitter dopant concentrations according to the design as well as to lower the emitter electrode resistance, which will provide a stable hFE; and further, the present invention aims to prevent anomalous bodies such as water-marks to be accidentally produced in a cleaning step following dry etching step to form an emitter electrode, and thereby to achieve an increase in yield as well as an enhancement of device reliability; in the process of the present invention, after an insulating film 4 and a first polycrystalline silicon film 5 are selectively dry etched to form a contact hole, a substrate is cleaned with such a cleansing agent as that composed of ammonia, hydrogen peroxide and water.

Abstract: The present invention aims to suppress certainly the single-crystallization in polycrystalline silicon that is to compose an emitter electrode, as well as to prevent the interface oxide film from remaining, when a heat treatment is conducted to diffuse dopants, and thereby it is also aimed to regulate the emitter dopant concentrations according to the design as well as to lower the emitter electrode resistance, which will provide a stable hFE; and further, the present invention aims to prevent anomalous bodies such as water-marks to be accidentally produced in a cleaning step following dry etching step to form an emitter electrode, and thereby to achieve an increase in yield as well as an enhancement of device reliability; in the process of the present invention, after an insulating film 4 and a first polycrystalline silicon film 5 are selectively dry etched to form a contact hole, a substrate is cleaned with such a cleansing agent as that composed of ammonia, hydrogen peroxide and water.