Abstract: The present invention relates to an exposure device for transferring circuit patterns of a mask to a roll-film-shaped object. The exposure device includes a supply reel rotation section that is constituted by a supply reel around which the object is wound and that feeds the object by rotating the supply reel, at least one guide roller for guiding the object fed from the supply reel rotation section, an exposure stage on which the circuit patterns are transferred to the object guided by the guide roller, and an alignment mark forming section which forms, on the object, alignment marks that are used to align the mask with the object and which is positioned between the guide roller and the exposure stage.

Abstract: The present invention relates to an exposure device for transferring circuit patterns of a mask to a roll-film-shaped object. The exposure device includes a supply reel rotation section that is constituted by a supply reel around which the object is wound and that feeds the object by rotating the supply reel, at least one guide roller for guiding the object fed from the supply reel rotation section, an exposure stage on which the circuit patterns are transferred to the object guided by the guide roller, and an alignment mark forming section which forms, on the object, alignment marks that are used to align the mask with the object and which is positioned between the guide roller and the exposure stage.

Abstract: The present invention relates to a projection exposure apparatus that forms predetermined patterns onto a substrate. The projection exposure apparatus for forming patterns onto a substrate, which includes a mask-stage for holding a photo-mask having predetermined patterns thereon, a light source for emitting a light ray containing spectral lines including g, h, i and j-lines, a wavelength selector for selecting a light ray containing predetermined spectral lines from the light ray emitted from the light source, an illumination optical system for irradiating the photo-mask with the selected light ray, an Offner type projection system for projecting the light having passed through the photo-mask onto the substrate, a substrate stage including a vacuum portion for holding the substrate, the substrate stage for positioning the substrate, and a light-shielding body for partially blocking the light irradiated to the substrate.

Abstract: An apparatus for projection exposure which projects a pattern of a mask onto a work is provided. The apparatus has a base, a source of light, an optical system, a mask support mechanism, a work support mechanism and an alignment mechanism. The optical system constitutes light rays into projection light rays carrying image information of the mask, guiding the projection light rays through a predetermined optical path so that the projection light rays can be projected onto an exposure surface of the work. The optical system includes a projection optical system and an illumination optical system. The projection optical system is adapted to be disposed vertical relative to the base. The mask and work support mechanisms vertically support the mask and work relative to the base, respectively. In this way, the exposure surface of the work can coincide with an image forming plane in the optical path.

Abstract: An apparatus for projection exposure which projects a pattern of a mask onto a work is provided. The apparatus has a base, a source of light, an optical system, a mask support mechanism, a work support mechanism and an alignment mechanism. The optical system constitutes light rays into projection light rays carrying image information of the mask, guiding the projection light rays through a predetermined optical path so that the projection light rays can be projected onto an exposure surface of the work. The optical system includes a projection optical system and an illumination optical system. The projection optical system is adapted to be disposed vertical relative to the base. The mask and work support mechanisms vertically support the mask and work relative to the base, respectively. In this way, the exposure surface of the work can coincide with an image forming plane in the optical path.