Abstract: In a medium for electrophoresis comprising a polyacrylamide gel formed by crosslinking polymerization of an acrylamide compound and a crosslinking agent in the presence of water, and a modifier, the improvement in which the medium contains a water-soluble polymer.

Abstract: A medium for electrophoresis which is substantially free from smiling effect or is reduced in the smiling effect, in which both side portions along the direction of electrophoresis are made thicker than the center portion. A support preferably employed for the preparation of the medium is also disclosed.

Abstract: A process for electrophoresis employing a medium wherein the potential gradient along the direction of electrophoresis is made larger at both side portions of the medium than at the center portion thereof. A medium for employable for said process in that the length of the both side portions along the direction of electrophoresis is made shorter than that of the center portion is disclosed. Also disclosed is a support for the medium.

Abstract: An element for electrophoresis comprising the following three-layer structure laminated in the order:(I) a support layer;(II) an adhesive layer comprising a polymer having at least one specifically selected repeating unit; and(III) a medium layer for electrophoresis comprising an aqueous polyacrylamide gel formed by crosslinking polymerization of an acrylamide compound and a crosslinking agent in the presence of water.

Abstract: A medium for electrophoresis in the form of an aqueous gel comprising an acrylamide copolymer having at least one specifically selected repeating unit; and a compound containing at least one carbamoyl group such as urea or formamide which serves as modifier.

Abstract: An element for electrophoresis comprising the following three-layer structure laminated in the order:(I) a support layer;(II) an adhesive layer comprising a copolymer having at least one specifically selected repeating unit; and(III) a medium layer for electrophoresis comprising an aqueous polyacrylamide gel formed by crosslinking polymerization of an acrylamide compound and a crosslinking agent in the presence of water, and a compound containing at least one carbamoyl group (modifier).

Abstract: A silver halide photographic light-sensitive material for photo-mechanical process comprising a support having thereon at least one light-sensitive silver halide emulsion layer and at least one light-insensitive upper layer which is positioned above the light-sensitive silver halide emulsion layer, wherein at least one of the light-insensitive upper layers has a melting time longer than a melting time of the light-sensitive silver halide emulsion layer and the light-insensitive upper layer contains a polymer latex.The silver halide photographic light-sensitive material has excellent aptitude for reduction treatment without increasing the amount of silver per unit area. The occurrence of reticulation is prevented with the silver halide photographic light-sensitive material.

Abstract: An element for electrophoresis comprising the following three-layer structure laminated in the order:(I) a support layer;(II) an adhesive layer comprising a polymer having at least one specifically selected repeating unit; and(III) a medium layer for electrophoresis comprising an aqueous polyacrylamide gel formed by crosslinking polymerization of an acrylamide compound and a crosslinking agent in the presence of water, and a compound containing at least one carbamoyl group (modifier).

Abstract: An element for electrophoresis comprising the following three-layer structure laminated in the order:(I) a support layer;(II) an adhesive layer comprising a polymer having at least one specifically selected repeating unit;and(III) a medium layer for electrophoresis comprising an aqueous polyacrylamide gel formed by crosslinking polymerization of an acrylamide compound and a crosslinking agent in the presence of water.

Abstract: A silver halide photographic light-sensitive material for plate making is disclosed. The material is comprised of a support base having thereon a sensitive silver halide emulsion layer and at least one upper insensitive layer having a melting time longer than the melting time of the sensitive silver halide emulsion layer. A method of reduction treatment for such silver halide light-sensitive material is also disclosed. The sensitive materials have excellent aptitude for reduction treatment and do not deteriorate even if the amount of silver per unit area is relatively small.

Abstract: A silver halide photographic sensitive material is disclosed. The material is comprised of a support base which has a sensitive silver halide emulsion layer on the surface of the base. On the silver halide emulsion layer is a first and a second insensitive layer. The second insensitive layer has a melting time which is higher than that of the first insensitive layer. The first insensitive layer has a melting time which is equal to or higher than the melting time of the silver halide emulsion layer. The resulting material can be advantageously utilize within an automatic developing apparatus. The material has improved mechanical properties and results in a reduced amount of scum being formed within the developing solution.

Abstract: A silver halide photographic light-sensitive material is disclosed, comprising a support having thereon at least one light-sensitive silver halide emulsion layer and a light-insensitive uppermost layer. The light-insensitive uppermost layer has a melting time longer than that of the light-sensitive silver halide emulsion layer and a thickness of the light-insensitive uppermost layer is from 0.3 .mu.m to 0.8 .mu.m. The silver halide photographic light-sensitive material causes a remarkably lower degree of reticulation, can reduce the amount of scum formed in the processing solution, and has an improved covering power.

Abstract: A silver halide photographic light-sensitive material is described, which comprises a support, and at least one light-sensitive silver halide emulsion layer and an uppermost layer provided on at least one surface of the support, wherein the melting time of the uppermost layer is made greater than that of the light-sensitive silver halide emulsion layer. The material has good strength and produces a reduced amount of scum which normally occurs in the processing liquid during development processing.

Abstract: A silver halide photographic light-sensitive material comprising a support having thereon at least one light-sensitive silver halide emulsion layer and a light-insensitive uppermost layer is disclosed. The light-insensitive uppermost layer has a melting time longer than that of the light-sensitive silver halide emulsion layer and the thickness of the light-insensitive uppermost layer is from 1.3 .mu.m to 5.0 .mu.m. The silver halide photographic light-sensitive material has an improved covering power and results in remarkably low degree of reticulation. Furthermore, when the material is used it results in a reduced amount of scum being formed in the processing solution.

Abstract: A photographic light-sensitive material having at least one antistatic layer which contains gelatin and an antistatic agent. The antistatic agent being a polymer which is prepared by copolymerization of carboxylic acid group-containing monomers and monomers having such a functional group which reacts with gelatin resulting in the characteristic of greatly improved diffusion resistance.