Patents by Inventor Masashi Ohtsuki

Masashi Ohtsuki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8609251
    Abstract: The rubber composite was fabricated by use of direct vulcanization adhesion method with a sulfenamide-based vulcanization accelerators, and the sulfenamide-based vulcanization accelerator is used for a rubber composite using a sulfenamide compound as a vulcanization accelerator, the adhesion properties of the steel cord/rubber adhesion boundary surface and the anti-scorch properties can be achieved simultaneously, the sulfenamide-based vulcanization accelerator being such that the bond order between an amine generated form the sulfenamide compound and a surface of a metal material is zero, and the distance of the S—N (amine moiety) bond of the sulfenamide compound is less than 1.67 ?, and the electric charge on N of the amine radical generated as a result of dissociation of the S—N bond is ?0.295 or less.
    Type: Grant
    Filed: September 11, 2009
    Date of Patent: December 17, 2013
    Assignee: Bridgestone Corporation
    Inventors: Masashi Ohtsuki, Yoshitaka Sato
  • Publication number: 20120141810
    Abstract: The rubber composite was fabricated by use of direct vulcanization adhesion method with a sulfenamide-based vulcanization accelerators, and the sulfenamide-based vulcanization accelerator is used for a rubber composite using a sulfenamide compound as a vulcanization accelerator, the adhesion properties of the steel cord/rubber adhesion boundary surface and the anti-scorch properties can be achieved simultaneously, the sulfenamide-based vulcanization accelerator being such that the bond order between an amine generated form the sulfenamide compound and a surface of a metal material is zero, and the distance of the S—N (amine moiety) bond of the sulfenamide compound is less than 1.67 ?, and the electric charge on N of the amine radical generated as a result of dissociation of the S—N bond is ?0.295 or less.
    Type: Application
    Filed: September 11, 2009
    Publication date: June 7, 2012
    Applicant: BRIDGESTONE CORPORATION
    Inventors: Masashi Ohtsuki, Yoshitaka Sato
  • Patent number: 7947399
    Abstract: This invention relates to a non-aqueous electrolyte for a battery having an excellent safety and a non-aqueous electrolyte battery comprising such a non-aqueous electrolyte and having a high safety, and more particularly to a non-aqueous electrolyte for a battery comprising a phosphine oxide compound having P—F bond and/or P—NH2 bond in its molecule and a support salt, as well as a non-aqueous electrolyte battery comprising such a non-aqueous electrolyte for the battery, a positive electrode and a negative electrode.
    Type: Grant
    Filed: March 29, 2005
    Date of Patent: May 24, 2011
    Assignee: Bridgestone Corporation
    Inventors: Yasuo Horikawa, Shinichi Eguchi, Masashi Ohtsuki
  • Patent number: 7820065
    Abstract: This invention relates to an additive for a non-aqueous electrolyte of an electric double layer capacitor comprising a combustion inhibiting substance releasing compound capable of releasing a combustion inhibiting substance having particularly excellent combustion inhibiting effect during combustion, and more particularly to an additive for a non-aqueous electrolyte of an electric double layer capacitor comprising a combustion inhibiting substance releasing compound which releases a combustion inhibiting substance during combustion, characterized in that the combustion inhibiting substance is a phosphine oxide compound having P—F bond and/or P—NH2 bond in its molecule.
    Type: Grant
    Filed: March 29, 2005
    Date of Patent: October 26, 2010
    Assignee: Bridgestone Corporation
    Inventor: Masashi Ohtsuki
  • Patent number: 7718008
    Abstract: The present invention provides a method for cleaning a photo mask without the need for removal of the pellicle mounted on the photo mask, without the large scale equipment for washing with a solution, with a small number of steps for cleaning and inspection, and without the increase of the production cost.
    Type: Grant
    Filed: August 16, 2007
    Date of Patent: May 18, 2010
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Shu Shimada, Noriyuki Takahashi, Hiroko Tanaka, Hiroyuki Ishii, Yusuke Shoji, Masashi Ohtsuki
  • Publication number: 20090213528
    Abstract: This invention relates to an additive for a non-aqueous electrolyte of an electric double layer capacitor comprising a combustion inhibiting substance releasing compound capable of releasing a combustion inhibiting substance having particularly excellent combustion inhibiting effect during combustion, and more particularly to an additive for a non-aqueous electrolyte of an electric double layer capacitor comprising a combustion inhibiting substance releasing compound which releases a combustion inhibiting substance during combustion, characterized in that the combustion inhibiting substance is a phosphine oxide compound having P—F bond and/or P—NH2 bond in its molecule.
    Type: Application
    Filed: March 29, 2005
    Publication date: August 27, 2009
    Inventor: Masashi Ohtsuki
  • Publication number: 20080251100
    Abstract: The present invention provides a method for cleaning a photo mask without the need for removal of the pellicle mounted on the photo mask, without the large scale equipment for washing with a solution, with a small number of steps for cleaning and inspection, and without the increase of the production cost.
    Type: Application
    Filed: August 16, 2007
    Publication date: October 16, 2008
    Inventors: Shu SHIMADA, Noriyuki TAKAHASHI, Hiroko TANAKA, Hiroyuki ISHII, Yusuke SHOJI, Masashi OHTSUKI
  • Publication number: 20070202417
    Abstract: This invention relates to a non-aqueous electrolyte for a battery having an excellent safety and a non-aqueous electrolyte battery comprising such a non-aqueous electrolyte and having a high safety, and more particularly to a non-aqueous electrolyte for a battery comprising a phosphine oxide compound having P—F bond and/or P—NH2 bond in its molecule and a support salt, as well as a non-aqueous electrolyte battery comprising such a non-aqueous electrolyte for the battery, a positive electrode and a negative electrode.
    Type: Application
    Filed: March 29, 2005
    Publication date: August 30, 2007
    Applicant: BRIDGESTONE CORPORATION
    Inventors: Yasuo Horikawa, Shinichi Eguchi, Masashi Ohtsuki
  • Publication number: 20070183954
    Abstract: This invention relates to an additive for a non-aqueous electrolyte in a battery having a sufficiently high boiling point and capable of ensuring a sufficient safety of an electrolyte even in an emergency such as the short-circuiting or the like without being vaporized in the use under high temperature and capable of giving excellent low-temperature characteristics, and more particularly to an additive for a non-aqueous electrolyte in a battery, which is composed of a phosphazene compound represented by the formula of (NPX2)n (wherein Xs are independently a halogen element, and n is an integer of 3-15) and containing at least two kinds of halogen elements.
    Type: Application
    Filed: March 2, 2005
    Publication date: August 9, 2007
    Inventors: Masashi Ohtsuki, Yasuo Horikawa, Shinichi Eguchi
  • Publication number: 20050106458
    Abstract: In a lithium primary cell comprising a positive electrode, a negative electrode and an electrolyte containing an aprotic organic solvent and a support salt, the discharge capacity and energy density of the cell are improved and the service life is prolonged by applying a paste body containing an active substance for positive electrode and a phosphazene derivative and/or an isomer of a phosphazene derivative to the positive electrode.
    Type: Application
    Filed: March 11, 2003
    Publication date: May 19, 2005
    Inventors: Shinichi Eguchi, Masashi Ohtsuki, Hiroshi Kanno
  • Patent number: 6869736
    Abstract: Disclosed is a blank for a halftone phase shift photomask comprising a transparent substrate and a halftone phase shift layer formed thereon, the halftone phase shift layer being provided with a layer containing molybdenum silicide as its major component and either one or both of oxygen and nitrogen and being formed of a multilayer film with two or more layers, wherein the multilayer film contains a layer whose major component is either one of chromium and tantalum or a chromium tantalum alloy and the layer whose major component is either one of chromium and tantalum or a chromium tantalum alloy is laminated on the side closer to the transparent substrate than the layer containing molybdenum silicide as its major component and either one or both of oxygen and nitrogen.
    Type: Grant
    Filed: September 3, 2001
    Date of Patent: March 22, 2005
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Hiro-o Nakagawa, Toshiaki Motonaga, Yoshinori Kinase, Satoshi Yusa, Shigeki Sumida, Toshifumi Yokoyama, Chiaki Hatsuta, Junji Fujikawa, Masashi Ohtsuki
  • Publication number: 20030186135
    Abstract: Disclosed is a blank for a halftone phase shift photomask comprising a transparent substrate and a halftone phase shift layer formed thereon, the halftone phase shift layer being provided with a layer containing molybdenum silicide as its major component and either one or both of oxygen and nitrogen and being formed of a multilayer film with two or more layers, wherein the multilayer film contains a layer whose major component is either one of chromium and tantalum or a chromium tantalum alloy and the layer whose major component is either one of chromium and tantalum or a chromium tantalum alloy is laminated on the side closer to the transparent substrate than the layer containing molybdenum silicide as its major component and either one or both of oxygen and nitrogen.
    Type: Application
    Filed: March 4, 2003
    Publication date: October 2, 2003
    Inventors: Hiro-o Nakagawa, Toshiaki Motonaga, Yoshinori Kinase, Satoshi Yusa, Shigeki Sumida, Toshifumi Yokoyama, Chiaki Hatsuta, Junji Fujikawa, Masashi Ohtsuki
  • Patent number: 6599667
    Abstract: A blank for halftone phase shift photomask is disclosed. The blank has a transparent substrate, a halftone phase shift layer and a light shielding film, the halftone phase shift layer and the light shielding film being layered in this order on the transparent substrate, and the l light shielding film is a single layered or multiple layered film which has a layer of tantalum.
    Type: Grant
    Filed: April 26, 2001
    Date of Patent: July 29, 2003
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Satoshi Yusa, Toshifumi Yokoyama, Shigeki Sumida, Toshiaki Motonaga, Yoshinori Kinase, Hiro-o Nakagawa, Chiaki Hatsuta, Junji Fujikawa, Masashi Ohtsuki
  • Patent number: 6458496
    Abstract: A blank for a halftone phase shift photomask in the present invention comprises a transparent substrate and a halftone phase shift film provided thereon, and said halftone phase shift film has a multilayer construction in which at least a first layer capable of being etched with a chlorinated gas and a second layer capable of being etched with a fluorinated gas are disposed in this order from the side near said transparent substrate. A film made of tantalum silicides is suitable to use as the second layer of the halftone phase shift film.
    Type: Grant
    Filed: December 14, 2000
    Date of Patent: October 1, 2002
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Toshiaki Motonaga, Toshifumi Yokoyama, Takafumi Okamura, Yoshinori Kinase, Hiroshi Mohri, Junji Fujikawa, Hiro-o Nakagawa, Shigeki Sumida, Satoshi Yusa, Masashi Ohtsuki
  • Publication number: 20020039689
    Abstract: A blank for halftone phase shift photomask is disclosed. The blank has a transparent substrate, a halftone phase shift layer and a light shielding film, the halftone phase shift layer and the light shielding film being layered in this order on the transparent substrate, and the l light shielding film is a single layered or multiple layered film which has a layer of tantalum.
    Type: Application
    Filed: April 26, 2001
    Publication date: April 4, 2002
    Inventors: Satoshi Yusa, Toshifumi Yokoyama, Shigeki Sumida, Toshiaki Motonaga, Yoshinori Kinase, Hiro-o Nakagawa, Chiaki Hatsuta, Junji Fujikawa, Masashi Ohtsuki
  • Publication number: 20010005564
    Abstract: A blank for a halftone phase shift photomask in the present invention comprises a transparent substrate and a halftone phase shift film provided thereon, and said halftone phase shift film has a multilayer construction in which at least a first layer capable of being etched with a chlorinated gas and a second layer capable of being etched with a fluorinated gas are disposed in this order from the side near said transparent substrate. A film made of tantalum silicides is suitable to use as the second layer of the halftone phase shift film.
    Type: Application
    Filed: December 14, 2000
    Publication date: June 28, 2001
    Inventors: Toshiaki Motonaga, Toshifumi Yokoyama, Takafumi Okamura, Yoshinori Kinase, Hiroshi Mohri, Junji Fujikawa, Hiro-o Nakagawa, Shigeki Sumida, Satoshi Yusa, Masashi Ohtsuki