Patents by Inventor Masashi OKANIWA

Masashi OKANIWA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11935803
    Abstract: A resin composition that has excellent flux activity, flexibility and storage stability and that is suitable for a pre-applied underfill material is provided. The resin composition contains a compound (A) having a phenolic hydroxy group, a metal ion trapping agent (B) and a radical polymerizable compound (C).
    Type: Grant
    Filed: April 24, 2019
    Date of Patent: March 19, 2024
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Masashi Okaniwa, Takenori Takiguchi, Kohei Higashiguchi, Tsuyoshi Kida
  • Patent number: 11924979
    Abstract: A resin composition that has both excellent flux activity and high insulation reliability, that possesses good storage stability, and that further has flexibility with good operability upon being used as a laminate is provided. The resin composition contains a chelating flux agent (A), a thermal radical polymerization initiator (B) and a radical polymerizable compound (C).
    Type: Grant
    Filed: April 24, 2019
    Date of Patent: March 5, 2024
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Masashi Okaniwa, Takenori Takiguchi, Kohei Higashiguchi, Tsuyoshi Kida
  • Publication number: 20220389130
    Abstract: The present application provides a film containing: a compound (A) containing at least one selected from the group consisting of a maleimide compound and a citraconimide compound; an organic peroxide (B) containing at least one selected from the group consisting of organic peroxides represented by specific formulae; and an imidazole compound (C) represented by a specific formula.
    Type: Application
    Filed: June 26, 2020
    Publication date: December 8, 2022
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Masashi OKANIWA, Kohei HIGASHIGUCHI, Takahito SEKIDO, Kentaro TAKANO, Tsuyoshi KIDA
  • Publication number: 20220380508
    Abstract: A resin composition containing a bismaleimide compound (A) containing a constituent unit represented by the following formula (1) and maleimide groups at both ends of the molecular chain, a radical polymerizable resin or compound (B) other than the bismaleimide compound (A), and a curing accelerator (C), wherein the radical polymerizable resin or compound (B) contains at least one selected from the group consisting of a citraconimide group, a vinyl group, a maleimide group, a (meth)acryloyl group and an allyl group.
    Type: Application
    Filed: June 26, 2020
    Publication date: December 1, 2022
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Masashi OKANIWA, Kentaro TAKANO, Tsuyoshi KIDA
  • Publication number: 20220344227
    Abstract: The present application provides a film containing: a compound (A) containing at least one selected from the group consisting of a maleimide compound and a citraconimide compound; an organic peroxide (B) containing at least one selected from the group consisting of organic peroxides represented by specific formulae; and a hydroperoxide (C).
    Type: Application
    Filed: June 26, 2020
    Publication date: October 27, 2022
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Masashi OKANIWA, Kohei HIGASHIGUCHI, Takahito SEKIDO, Kentaro TAKANO, Tsuyoshi KIDA
  • Publication number: 20220332868
    Abstract: A film containing: a propenyl group-containing resin (A) including, at an end of a molecule, a constituent unit represented by the following formula (1); a radical polymerizable resin or compound (B) other than the propenyl group-containing resin (A); and a curing accelerator (C), wherein the radical polymerizable resin or compound (B) includes at least one selected from the group consisting of a maleimide group and a citraconimide group. In the formula (1), —* represents a bonding hand.
    Type: Application
    Filed: June 26, 2020
    Publication date: October 20, 2022
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Takahito SEKIDO, Masashi OKANIWA, Genki SUGIYAMA, Kentaro TAKANO, Tsuyoshi KIDA
  • Publication number: 20210277221
    Abstract: A resin composition that has excellent flux activity, flexibility and storage stability and that is suitable for a pre-applied underfill material is provided. The resin composition contains a compound (A) having a phenolic hydroxy group, a metal ion trapping agent (B) and a radical polymerizable compound (C).
    Type: Application
    Filed: April 24, 2019
    Publication date: September 9, 2021
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Masashi OKANIWA, Takenori TAKIGUCHI, Kohei HIGASHIGUCHI, Tsuyoshi KIDA
  • Publication number: 20210147680
    Abstract: A resin composition that has excellent adhesiveness to chips and substrates such as printed wiring boards and excellent flux activity is provided. The present application provides a resin composition containing: a benzoxazine compound (A); an organic compound (B) having a flux function; and at least one thermosetting component (C) selected from a phenolic resin and a radical polymerizable thermosetting resin, wherein the radical polymerizable thermosetting resin is a resin or a compound having at least one or more functional groups selected from the group consisting of an alkenyl group, a maleimide group and a (meth)acryloyl group, and wherein a mass ratio between the benzoxazine compound (A) and the thermosetting component (C) ((A)/(C)) is 20/80 to 90/10.
    Type: Application
    Filed: April 24, 2019
    Publication date: May 20, 2021
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Kohei HIGASHIGUCHI, Takenori TAKIGUCHI, Masashi OKANIWA, Tsuyoshi KIDA
  • Publication number: 20210147629
    Abstract: A resin composition that has both excellent flux activity and high insulation reliability, that possesses good storage stability, and that further has flexibility with good operability upon being used as a laminate is provided. The resin composition contains a chelating flux agent (A), a thermal radical polymerization initiator (B) and a radical polymerizable compound (C).
    Type: Application
    Filed: April 24, 2019
    Publication date: May 20, 2021
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Masashi OKANIWA, Takenori TAKIGUCHI, Kohei HIGASHIGUCHI, Tsuyoshi KIDA