Patents by Inventor Masashi Shimoyama

Masashi Shimoyama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20050009340
    Abstract: A capping film serving as an interconnect protective film formed on a surface of interconnect metal on a semiconductor substrate is formed after forming a catalyst layer for electroless plating under low oxygen concentration condition. A method for forming a capping film for protecting a surface of interconnect metal includes preparing a metal catalyst solution containing a metal element nobler than interconnect metal and having dissolved oxygen concentration of 7 ppm or less, bringing said metal catalyst solution into contact with a surface of interconnect metal to form a metal catalyst layer on the surface of the interconnect metal, and performing electroless plating to form a capping film on the surface of the interconnect metal.
    Type: Application
    Filed: July 7, 2004
    Publication date: January 13, 2005
    Inventors: Yasuhiko Saijo, Masashi Shimoyama, Hiroshi Yokota, Akihiko Tashiro, Xinming Wang, Daisuke Takagi
  • Publication number: 20040219775
    Abstract: The present invention relates to a lead-free bump with suppressed formation of voids, obtained by reflowing a plated film of Sn—Ag solder alloy having an adjusted Ag content, and a method of forming the lead-free bump. The lead-free bump of the present invention is obtained by forming an Sn—Ag alloy film having a lower Ag content than that of an Sn—Ag eutectic composition by plating and reflowing the plated alloy film.
    Type: Application
    Filed: December 24, 2003
    Publication date: November 4, 2004
    Inventors: Masashi Shimoyama, Hiroshi Yokota, Rei Kiumi, Fumio Kuriyama, Nobutoshi Saito
  • Patent number: 5723029
    Abstract: A photo-electric chemical apparatus comprising an electrolyte, a first electrode having an n-type semiconductor member disposed to be in touch with the electrolyte and a second electrode having a carbon cluster member disposed to be in touch with the electrolyte. The first and second electrodes are short-circuited and irradiated with a light beam to thereby generate oxygen and hydrogen. The first electrode is a laminated member consisting of a light transmitting glass, a transparent conducting layer and an n-type semiconductor layer. The second electrode is a laminated member consisting of a light transmitting glass, a transparent conducting layer and a carbon cluster thin film.
    Type: Grant
    Filed: March 28, 1997
    Date of Patent: March 3, 1998
    Assignee: Ebara Research Co., Ltd.
    Inventor: Masashi Shimoyama
  • Patent number: 5276761
    Abstract: A hollow waveguide for ultraviolet wavelength region laser beams incorporates a glass tube composed of a glass material exhibiting a high transmissivity with respect to ultraviolet rays and an excellent environment resistant property, and a metal film exhibiting a high reflectivity with respect to the ultraviolet rays and formed outside the glass tube. The glass tube serves as an inner surface of the waveguide. The ultraviolet wavelength region laser beams are transmitted while being reflected by the inner surface of the glass tube and by an interface between the glass tube and the metal film.
    Type: Grant
    Filed: September 16, 1991
    Date of Patent: January 4, 1994
    Assignee: Ebara Corporation
    Inventors: Masashi Shimoyama, Kazuo Kinoshita, Naoki Tsuchiya, Tohru Fukatsu
  • Patent number: 5266244
    Abstract: A thin electroconductive film is formed by irradiating a shaped article of chlorinated vinyl polymer with a pulsive light having a pulse duration of not greater than 100 nsec., a fluence of above about 15 mJ/cm.sup.2 /pulse and below that at which the polymer is subject to ablation, a laser wavelength of from about 190 to about 300 nm, and repetition frequency of above about 1 Hz and below that at which the polymer is subject to deformation and/or decomposition by a regenerative function of irradiation, under vacuum or in an oxygen-free atmosphere, thereby irradiating the article with total photon numbers of at least 1.times.10.sup.18 /cm.sup.2 without causing photocrosslinking, oxidation or cleavage of the backbone chain. The invention does not use materials other than the starting polymer such as solvents or strong bases that can contaminate the thin film during a dehydrochlorination, so there is no need to remove solvents after reaction and no residual salts will be formed in the dehydrochlorination.
    Type: Grant
    Filed: June 30, 1992
    Date of Patent: November 30, 1993
    Assignees: Ebara Corporation, Japan as Represented by Director General of Agency of Industrial Science and Technology
    Inventors: Akira Yabe, Hiroyuki Niino, Masashi Shimoyama