Abstract: A high-frequency antenna of an embodiment is installed on a window of a chamber, and includes first and second antenna elements and first and second relaying portions. The first antenna element extends over a first angle range in a circumferential direction, and the second antenna element extends in the circumferential direction over a second angle range deviating from the first angle range. The second antenna element is arranged away from the window compared to the first antenna element, and is arranged on the outer peripheral side from the first antenna element. The first relaying portion extends toward the side away from the window from the first antenna element, and the second relaying portion extends toward the outer peripheral side, from the first relaying portion to the second antenna element.

Abstract: A high-frequency antenna of an embodiment is installed on a window of a chamber, and includes first and second antenna elements and first and second relaying portions. The first antenna element extends over a first angle range in a circumferential direction, and the second antenna element extends in the circumferential direction over a second angle range deviating from the first angle range. The second antenna element is arranged away from the window compared to the first antenna element, and is arranged on the outer peripheral side from the first antenna element. The first relaying portion extends toward the side away from the window from the first antenna element, and the second relaying portion extends toward the outer peripheral side, from the first relaying portion to the second antenna element.

Abstract: According to one embodiment, a shower head includes a head and a magnetic field generator. The head includes a first surface, a second surface opposite to the first surface, an internal compartment, and a plurality of holes. Each of the holes is open to the first surface and to the second surface that faces the compartment, and communicates with the compartment. The magnetic field generator generates a magnetic field inside the holes between the first surface and the second surface.

Abstract: According to one embodiment, a shower head includes a head and a magnetic field generator. The head includes a first surface, a second surface opposite to the first surface, an internal compartment, and a plurality of holes. Each of the holes is open to the first surface and to the second surface that faces the compartment, and communicates with the compartment. The magnetic field generator generates a magnetic field inside the holes between the first surface and the second surface.

Abstract: According to one embodiment, a transparent conductive material is used for a transparent conductive film. The transparent conductive material includes nanographene having a polar group at a surface of the nanographene.

Abstract: A plasma generating apparatus includes a coaxial convertor for coaxial-converting a microwave, a generally annular ring slot that passes the coaxial-converted microwave, and a dielectric window that propagates the microwave passed through the ring slot. A plasma is produced by the microwave propagated through the dielectric window. This enables stable formation of a plasma having a uniform distribution over a large area.

Abstract: According to one embodiment, a method of treating catalyst for nanocarbon production comprises, bringing a surface of a catalytic material into contact with a chemical, the catalytic material containing a metallic material and being used to produce nanocarbon, corroding the surface of the catalytic material, and drying the surface of the catalytic material.

Abstract: A supported catalyst includes: a catalyst; and a carbon body. The catalyst is supported on the carbon body, and the carbon body is linear.

Abstract: A plasma generating apparatus according to the invention includes coaxial conversion means for coaxial-converting a microwave, a generally annular ring slot for passing the coaxial-converted microwave, and a dielectric window for propagating the microwave passed through the ring slot, wherein a plasma can be produced by the microwave propagated through the dielectric window. This enables stable formation of a plasma having a uniform distribution over a large area.

Abstract: An electron emitting element includes a substrate, an electrically conductive layer located on the substrate and formed with a protrusion or a recess, and an electron emitting layer formed over the protrusion or the recess on the conductive layer and having a plurality of linear conductors, a height of the protrusion or a depth of the recess being greater than a thickness of the electron emitting layer.

Abstract: An electron emission element includes a substrate, a first conductive layer provided on the substrate, an electron emission part formed on the first conductive layer, an insulating layer formed on the first conductive layer and having a first opening part arranged such that the electron emission part is located within the first opening part, and a second conductive layer formed on the insulating layer and having a second opening part such that the electron emission part is located within the second opening part, wherein an electric-field concentration part which concentrates an electric field is provided within the second opening part.

Abstract: A plasma process end point determination method comprises the steps of measuring a physical quantity in a circuit for producing a plasma within a reaction chamber, and determining a plasma process end point on the basis of an inflection point of the measured physical quantity in relation to the passing of time.

Abstract: A plasma processing apparatus according to the present invention includes a microwave guide for introducing a microwave, an air-tight chamber for internally setting an object to be processed, for generating a plasma by introducing the microwave introduced by the microwave guide and by supplying a reaction gas, and for processing the object by an active species generated by the plasma, a dielectric window provided between the microwave guide and the air-tight chamber, for enclosing the air-tight chamber, a top plate provided with a microwave guide port arranged with a gap maintained from the dielectric window, and cooling means provided for the top plate, for cooling heat caused by generation of the plasma, e.g., a cooling means for causing a cooling gas to flow in the gap between the dielectric window and the top plate.

Abstract: A microwave excitation plasma processing apparatus comprises a vacuum container having a plasma generating chamber at an upper portion thereof and a processing chamber, a gas supply pipe for supplying a process gas into the plasma generating chamber, a dielectric window arranged in an opening of an upper wall portion of the vacuum container, a rectangular waveguide arranged on the upper wall portion of the vacuum container including the dielectric window and comprising a first wall having a first surface perpendicular to a direction of electric field of a microwave to oppose the dielectric window, second walls having second surfaces parallel to the direction of electric field of the microwave and extending in a direction perpendicular to the first surface, and a third wall having a third surface which is provided on a side opposite to a microwave introducing side perpendicular to the first and second surfaces to reflect the microwave, and a microwave oscillator for introducing the microwave into the waveguide